Provided is a manufacturing apparatus for manufacturing a soot deposition body, including a main burner that deposits glass microparticles on a target rod while moving parallel to a longitudinal direction of the target rod; and a side burner that is positioned outside of a movement range of the main burner in a movement direction of the main burner, and fires an end portion of the soot deposition body formed on the target rod. The side burner includes a plurality of heating burners arranged distanced from each other in a circumferential direction of the target rod. In the manufacturing apparatus described above, the main burner may include a plurality of deposition burners that are arranged distanced from each other in the circumferential direction of the target rod.

A titania and silica glass body that includes a first glass section having a crossover temperature of about 10 C. to about 60 C. and a second glass section comprising an average striae height of about 10 microns or less, wherein the average striae height of the second glass section is less than an average striae height of the first glass section, and wherein the first glass section and the second glass section form a single, monolithic glass body.

A soot glass deposit body is manufactured by placing a starting rod and a burner 22 for producing glass particulates in a reaction container, introducing a source material gas to the burner 22 through a supplying pipe 26, producing glass particulates by a pyrolytic oxidation reaction of the source material gas in a flame formed by the burner 22, and depositing the produced glass particulates on the starting rod. At the time, the source material gas to be supplied to the burner 22 is a siloxane, the burner 22 is heated so that temperature of the burner 22 falls within the range of from 30 C. to +30 C. relative to the boiling point of the siloxane, and also temperature of the supplying pipe is controlled within the range of from the boiling point of the siloxane to the boiling point plus 30 C.

Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least of the maximum horizontally integrated luminous intensity of the flame.

On an EUV light-reflecting surface of titania-doped quartz glass, an angle () included between a straight line connecting an origin (O) at the center of the reflecting surface to a birefringence measurement point (A) and a fast axis of birefringence at the measurement point (A) has an average value of more than 45 degrees. Since fast axes of birefringence are distributed in a concentric fashion, a titania-doped quartz glass substrate having a high flatness is obtainable which is suited for use in the EUV lithography.

A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.

A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.