Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.

A perforated quartz glass tube includes a jacket tube containing a quartz glass material, a plurality of cylindrical glass tubes which are inserted into a pore region of the jacket tube along an axial direction of the jacket tube, and contain a quartz glass material having a softening point higher than a softening point of the jacket tube, and a gap member which is inserted into a gap between the cylindrical glass tubes and a gap between the jacket tube and the cylindrical glass tube, and contains a quartz glass material having a softening point lower than a softening point of the cylindrical glass tube.

A glass fiber according to the present invention is suitable for preventing filament breakage and suitable for being stably produced for a long term, and has a β-OH value of 0.02 mm.sup.−1 or more and less than 0.55 mm.sup.−1. The preferred content of SO.sub.3 is more than 0 ppm and 70 ppm or less on a mass basis. The glass fiber is preferably substantially free of As and Sb. SO.sub.3 can be supplied to a glass raw material as, for example, a sulfuric acid salt of an alkali metal or an alkaline-earth metal.

To provide an opaque quartz glass having excellent heat insulating property, mechanical strength and surface smoothness, a silica powder water slurry of concentration of 45 to 75 wt % is subjected to wet pulverization with silicon nitride beads having a mean diameter of 0.1 mm to 3 mm. The silica powder and silicon nitride beads are subjected to abrasion and the silicon nitride powder works as foaming agent and independent spherical bubbles are formed for manufacturing opaque quartz glass which has air cells having a mean diameter of 2 to 30 m and are independent spherical, having a density of 1.90 to 2.20 g/cm.sup.3, a whiteness of 80 or more, a reflectance of 80% or more for light of a wavelength of 0.2 to 3 m at thickness of 3 mm, a bending strength of 70 MPa or more, a surface roughness Ra of the baked surface of 0.7 m or less.

One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. On aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

An apparatus and related process for producing a high-strength weld between two glass components. Chucks clamp and move respective first ends of the glass components toward each other inside an enclosure, where the second ends are heated, softened, and welded together in a weld zone. The enclosure has layers of stacked quartz glass bricks and allows the weld zone to cool slowly and avoid stress. A propane quartz melting torch directs a flame inside the enclosure and toward the second ends as the glass components move toward each other. The flame softens the second ends and creates substantially smooth polished surfaces in the weld zone having an increased hydroxide content. At least 80% of the weld zone has a hydroxide content greater than about 10 ppm average in a 10 m depth from the surface and the tensile strength of the weld zone is above about 10 MPa.

One aspect relates to a process for the preparation of a quartz glass body including: i.) providing a silicon dioxide granulate, ii.) making a first glass melt out of the silicon dioxide granulate, iii.) making a glass product out of at least one part of the glass melt, iv.) reducing the size of the glass product to obtain a quartz glass grain, v.) making a further glass melt from the quartz glass grain and vi.) making a quartz glass body out of at least one part of the further glass melt. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to a reactor, which is obtainable by further processing of the quartz glass body.

The present invention pertains to: a method for manufacturing an ultraviolet-resistant quartz glass, said method including melting a synthetic silica powder; and a method for manufacturing an ultraviolet-resistant quartz glass, said method including performing arc plasma melting of a silica powder. Provided is an ultraviolet-resistant quartz glass having an ultraviolet-resistance of 2500 seconds, wherein, taking the initial transmittance during irradiation of a quadruple higher harmonic (266 nm) of a YAG laser (irradiation performed at a YAG laser output of 180 mW, pulse width of 20 nsec, and frequency of 80 kHz) at an optical path length of 30 mm to be 100%, the irradiation period until the transmittance falls to 3% is defined as resistance to ultraviolet rays (referred to as ultraviolet-resistance). Also provided is an optical member for YAG-laser higher harmonics, said optical member comprising this quartz glass.

A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.

Provides is low scattering silica glass suitable as a material of an optical communication fiber. Silica glass has a fictive temperature of at least 1,000 C. and a void radius of at most 0.240 nm, as measured by positron annihilation lifetime spectroscopy. A method for heat-treating silica glass is also provided, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200 C. and at most 2,000 C. under a pressure of at least 30 MPa, and cooling the silica glass at an average temperature-decreasing rate of at least 40 C./min during cooling within a temperature range of from 1,200 C. to 900 C. A method for heat-treating silica glass also comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200 C. and at most 2,000 C. under a pressure of at least 140 MPa, and cooling the silica glass in an atmosphere under a pressure of at least 140 MPa during cooling within a temperature range of from 1,200 C. to 900 C.