The present invention provides a thick-film paste for printing the front side of a solar cell device having one or more insulating layers and a method for doing so. The thick-film paste comprises a source of an electrically conductive metal and a lead-tungsten-based oxide dispersed in an organic medium. The invention also provides a semiconductor device comprising an electrode formed from the thick-film paste.

The present invention provides a novel crystalline oxide, a process for producing the crystalline oxides, a conductive paste comprising the crystalline oxides and an article comprising a substrate and an abovementioned conductive paste applied on the substrate.

A glass material with high refractive index and radiation resistance, the method for preparing the same, and applications thereof, wherein the glass material, by mass percentage, includes 20-40% SiO.sub.2, 0-10% Al.sub.2O.sub.3, 0-5% CaO, 5-20% BaO, 40-50% PbO, 1-5% CeO.sub.2, 0-5% La.sub.2O.sub.3, 0-2% Nb.sub.2O.sub.5, 0-2% Ta.sub.2O.sub.5, 0-1% Bi.sub.2O.sub.3, and a content of 0-1% of an oxide selected from Na.sub.2O, K.sub.2O, Rb.sub.2O, and Cs.sub.2O. The glass material has a refractive index1.80, a glass transition temperature560 C., a yield point temperature650 C., and good thermal resistance. Its coefficient of thermal expansion is (85-90)10.sup.7/ C., indicating good thermal processability, suitable for forming large-sized devices. After irradiation with a 4700Gy dose of X-rays, a transmittance reduction is 2%, making it suitable for creating radiation-resistant optical components such as optical glass and fiber optic panels.

A glass material with high refractive index and radiation resistance, the method for preparing the same, and applications thereof, wherein the glass material, by mass percentage, includes 20-40% SiO.sub.2, 0-10% Al.sub.2O.sub.3, 0-5% CaO, 5-20% BaO, 40-50% PbO, 1-5% CeO.sub.2, 0-5% La.sub.2O.sub.3, 0-2% Nb.sub.2O.sub.5, 0-2% Ta.sub.2O.sub.5, 0-1% Bi.sub.2O.sub.3, and a content of 0-1% of an oxide selected from Na.sub.2O, K.sub.2O, Rb.sub.2O, and Cs.sub.2O. The glass material has a refractive index1.80, a glass transition temperature560 C., a yield point temperature650 C., and good thermal resistance. Its coefficient of thermal expansion is (85-90)10.sup.7/ C., indicating good thermal processability, suitable for forming large-sized devices. After irradiation with a 4700Gy dose of X-rays, a transmittance reduction is 2%, making it suitable for creating radiation-resistant optical components such as optical glass and fiber optic panels.

The invention relates to a coated glass substrate or glass ceramic substrate with resistant, multi-functional surface properties, including a combination of anti-microbial, anti-reflective and anti-fingerprint properties, or a combination of anti-microbial, anti-reflective and anti-fingerprint properties where the substrate is chemically pre-stressed, or a combination of anti-microbial and anti-reflective properties where the substrate is chemically pre-stressed. The coated glass substrate or glass ceramic substrate exhibits a unique combination of functions which are permanently present and do not exert a negative effect on each other.

The invention relates to a coated glass substrate or glass ceramic substrate with resistant, multi-functional surface properties, including a combination of anti-microbial, anti-reflective and anti-fingerprint properties, or a combination of anti-microbial, anti-reflective and anti-fingerprint properties where the substrate is chemically pre-stressed, or a combination of anti-microbial and anti-reflective properties where the substrate is chemically pre-stressed. The coated glass substrate or glass ceramic substrate exhibits a unique combination of functions which are permanently present and do not exert a negative effect on each other.