Glass compositions include niobia (Nb.sub.2O.sub.5), phosphorus oxide (P.sub.2O.sub.5) and titania (TiO.sub.2) as essential components and may optionally include calcium oxide (CaO), potassium oxide (K.sub.2O), barium oxide (BaO), sodium oxide (Na.sub.2O), lithium oxide (Li.sub.2O), magnesia (MgO), zinc oxide (ZnO) and other components. The glasses may be characterized by high refractive index at 587.56 nm at comparably low density at room temperature.

An optical component with improved degradation resistance is provided. The optical component includes an optical material and a coating. The optical material has a native surface that is susceptible to degradation processes. The coating is a layer of an inorganic material and is applied so as to be substantially contiguous so that there are no continuous paths between fluid surrounding the optical component and the optical material.

An optical component with improved degradation resistance is provided. The optical component includes an optical material and a coating. The optical material has a native surface that is susceptible to degradation processes. The coating is a layer of an inorganic material and is applied so as to be substantially contiguous so that there are no continuous paths between fluid surrounding the optical component and the optical material.

A low melting point tin phosphate-based glass frit contains, in mol %, 15-75% of SnO, 0-40% of SnF2, 10-50% of P2O5, 0-30% of ZnO, 0-5% of Al2O3, 0-30% of B2O3, 0-5% of In203, 0-5% of BaO, and 0-5% of SiO2, does not contain Pb, and exhibits a temperature difference of 50° C. or less between the glass transition point to the glass softening point. The glass frit has a low softening point temperature and a conventional glass transition point temperature without using a substance that places a burden on the environment such as lead.

An optical glass contains: a P.sub.2O.sub.5 component of 30 to 60 mass % (exclusive of 30); an Al.sub.2O.sub.3 component of 2 to 10 mass % (exclusive of 2); a TiO.sub.2 component of 10 to 36 mass % (exclusive of 36); an Nb.sub.2O.sub.5 component of 0 to 5 mass %; a Ta.sub.2O.sub.5 component of 0 to 15 mass %; a Bi.sub.2O.sub.3 component of 0 to 5 mass % (exclusive of 5); and an Sb.sub.2O.sub.3 component of 0 to 1 mass %; and a BaO component of 1 to 20 mass %.

An optical glass contains: a P.sub.2O.sub.5 component of 30 to 60 mass % (exclusive of 30); an Al.sub.2O.sub.3 component of 2 to 10 mass % (exclusive of 2); a TiO.sub.2 component of 10 to 36 mass % (exclusive of 36); an Nb.sub.2O.sub.5 component of 0 to 5 mass %; a Ta.sub.2O.sub.5 component of 0 to 15 mass %; a Bi.sub.2O.sub.3 component of 0 to 5 mass % (exclusive of 5); and an Sb.sub.2O.sub.3 component of 0 to 1 mass %; and a BaO component of 1 to 20 mass %.

The present disclosure relates to a method for producing a solid electrolyte comprising lithium-ion conductive glass-ceramics. The method includes the steps of: providing at least one lithium ion conductor having a ceramic phase content and amorphous phase content; providing a powder of said at least one lithium ion conductor, the powder having a polydispersity index between 0.5 and 1.5, more preferably between 0.8 and 1.3, and most preferably between 0.85 and 1.15; and at least one of a) incorporating the powder into a polymer electrolyte or a polyelectrolyte and b) forming an element using the powder.

Provided is an etching method for a glass, including an etching step (S2) of immersing a glass (G) in an etching liquid (E) to subject the glass (G) to etching treatment. The etching step (S2) includes causing the etching liquid (E) to relatively flow with respect to a surface (MS) of the glass (G), to thereby subject the glass (G) to the etching treatment.

Provided is an etching method for a glass, including an etching step (S2) of immersing a glass (G) in an etching liquid (E) to subject the glass (G) to etching treatment. The etching step (S2) includes causing the etching liquid (E) to relatively flow with respect to a surface (MS) of the glass (G), to thereby subject the glass (G) to the etching treatment.

The near-infrared absorbing glass, which contains at least four kinds of main cations selected from the group consisting of P ions, Li ions, Cu ions, Al ions, Ba ions, Sr ions, Ca ions, Mg ions, Zn ions, K ions, Na ions, La ions, Gd ions, and Y ions, contains P ions, Li ions, and Cu ions as essential cations, and contains at least O ions as anions, wherein a ratio (O ion/P ion) of a content of O ions relative to a content of P ions is 3.15 or less; in a glass composition indicated by anion %, a content of O ions is 90.0 anion % or more; and in an oxide-based glass composition on a molar basis, a total content of oxides of the main cations is 90.0% or more, and a total content (MgO+Al.sub.2O.sub.3) of MgO and Al.sub.2O.sub.3 is 8.0% or less.