A low melting point tin phosphate-based glass frit contains, in mol %, 15-75% of SnO, 0-40% of SnF2, 10-50% of P2O5, 0-30% of ZnO, 0-5% of Al2O3, 0-30% of B2O3, 0-5% of In203, 0-5% of BaO, and 0-5% of SiO2, does not contain Pb, and exhibits a temperature difference of 50° C. or less between the glass transition point to the glass softening point. The glass frit has a low softening point temperature and a conventional glass transition point temperature without using a substance that places a burden on the environment such as lead.

Provided is an etching method for a glass, including an etching step (S2) of immersing a glass (G) in an etching liquid (E) to subject the glass (G) to etching treatment. The etching step (S2) includes causing the etching liquid (E) to relatively flow with respect to a surface (MS) of the glass (G), to thereby subject the glass (G) to the etching treatment.

Provided is an etching method for a glass, including an etching step (S2) of immersing a glass (G) in an etching liquid (E) to subject the glass (G) to etching treatment. The etching step (S2) includes causing the etching liquid (E) to relatively flow with respect to a surface (MS) of the glass (G), to thereby subject the glass (G) to the etching treatment.

Disclosed herein are sealed devices comprising a first substrate, a second substrate, an inorganic film between the first and second substrates, and at least one weld region comprising a bond between the first and second substrates. The weld region can comprise a chemical composition different from that of the inorganic film and the first or second substrates. The sealed devices may further comprise a stress region encompassing at least the weld region, in which a portion of the device is under a greater stress than the remaining portion of the device. Also disclosed herein are display and electronic components comprising such sealed devices.

Disclosed herein are sealed devices comprising a first substrate, a second substrate, an inorganic film between the first and second substrates, and at least one weld region comprising a bond between the first and second substrates. The weld region can comprise a chemical composition different from that of the inorganic film and the first or second substrates. The sealed devices may further comprise a stress region encompassing at least the weld region, in which a portion of the device is under a greater stress than the remaining portion of the device. Also disclosed herein are display and electronic components comprising such sealed devices.

A filter glass contains >1.1 to 6.0 wt % Li.sub.2O and at least one further component selected from Na.sub.2O and K.sub.2O, and includes the following composition (in wt % based on oxide): 55.0-75.0 P.sub.2O.sub.5, 4.1-8.0 Al.sub.2O.sub.3, 8.0-18.0 CuO, 0-<0.8 V.sub.2O.sub.5, ≤2.0 SiO.sub.2, ≤2.0 F, 0-11.0 Total R′O (R′=Mg, Ca, Sr, Ba, Zn), and 3.0-17.0 Total R.sub.2O (R=Li, Na, K).

Provided are nanophosphor-attached inorganic particles that can suppress the degradation of the nanophosphor when sealed in glass, and a wavelength conversion member using the nanophosphor-attached inorganic particles. The nanophosphor-attached inorganic particle 10 include: inorganic particles 1 having an average particle diameter of 1 μm or more; and a nanophosphor 2 attached to surfaces of the inorganic particles 1.

Provided are nanophosphor-attached inorganic particles that can suppress the degradation of the nanophosphor when sealed in glass, and a wavelength conversion member using the nanophosphor-attached inorganic particles. The nanophosphor-attached inorganic particle 10 include: inorganic particles 1 having an average particle diameter of 1 μm or more; and a nanophosphor 2 attached to surfaces of the inorganic particles 1.

The present disclosure provides a device and a method with which flat glasses with particularly uniform thickness can be obtained. The methods are drawing methods in which a glass ribbon is drawn. In the method an aperture is used which allows a defined very small slit between the glass ribbon and the aperture also in the case of a change of the position of the glass ribbon.

The present disclosure provides a device and a method with which flat glasses with particularly uniform thickness can be obtained. The methods are drawing methods in which a glass ribbon is drawn. In the method an aperture is used which allows a defined very small slit between the glass ribbon and the aperture also in the case of a change of the position of the glass ribbon.