Disclosed herein are methods for forming low melting point glass fibers comprising providing a glass feedstock comprising a low melting point glass and melt-spinning the glass feedstock to produce glass fibers, wherein the glass transition temperature of the glass fibers is less than or equal to about 120% of the glass transition temperature of the glass feedstock. The disclosure also relates to method for forming low melting point glass frit further comprising jet-milling the glass fibers. Low melting point glass frit and fibers produced by the methods described above are also disclosed herein.

Disclosed herein are methods for forming low melting point glass fibers comprising providing a glass feedstock comprising a low melting point glass and melt-spinning the glass feedstock to produce glass fibers, wherein the glass transition temperature of the glass fibers is less than or equal to about 120% of the glass transition temperature of the glass feedstock. The disclosure also relates to method for forming low melting point glass frit further comprising jet-milling the glass fibers. Low melting point glass frit and fibers produced by the methods described above are also disclosed herein.

A laser glass doped with high concentration of mid-infrared fluoroindate and a preparation method thereof are provided in the present application, belonging to the technical field of luminescent glass. The laser glass doped with high concentration of mid-infrared fluoroindate includes the raw materials in parts by mole percentage: 27-38 parts of InF.sub.3, 13 parts of ZnF.sub.2, 10 parts of GdF.sub.3, 19 parts of BaF.sub.2, 5 parts of CaF.sub.2, 10 parts of SrF.sub.2, 5-15 parts of Al(PO.sub.3).sub.3 and 1-11 parts of ErF.sub.3.

A laser glass doped with high concentration of mid-infrared fluoroindate and a preparation method thereof are provided in the present application, belonging to the technical field of luminescent glass. The laser glass doped with high concentration of mid-infrared fluoroindate includes the raw materials in parts by mole percentage: 27-38 parts of InF.sub.3, 13 parts of ZnF.sub.2, 10 parts of GdF.sub.3, 19 parts of BaF.sub.2, 5 parts of CaF.sub.2, 10 parts of SrF.sub.2, 5-15 parts of Al(PO.sub.3).sub.3 and 1-11 parts of ErF.sub.3.

The present disclosure provides a device and a method with which flat glasses with particularly uniform thickness can be obtained. The methods are drawing methods in which a glass ribbon is drawn. In the method an aperture is used which allows a defined very small slit between the glass ribbon and the aperture also in the case of a change of the position of the glass ribbon.

The present disclosure provides a device and a method with which flat glasses with particularly uniform thickness can be obtained. The methods are drawing methods in which a glass ribbon is drawn. In the method an aperture is used which allows a defined very small slit between the glass ribbon and the aperture also in the case of a change of the position of the glass ribbon.

Provided is an optical filter, including an absorbing glass substrate composed of phosphate-based glass or fluorophosphate-based glass; a bonding layer with a single layer structure; and a resin layer, wherein the resin layer is provided on the absorbing glass substrate through the bonding layer, wherein the bonding layer includes a Si atom and one or more selected from a Ti atom, a Zr atom, and an Al atom; or an optical filter, including an absorbing glass substrate composed of phosphate-based glass or fluorophosphate-based glass; and a resin layer, wherein the resin layer includes a Si atom and one or more selected from a Ti atom, a Zr atom, and an Al atom, and is provided on the absorbing glass substrate.

Provided is an optical filter, including an absorbing glass substrate composed of phosphate-based glass or fluorophosphate-based glass; a bonding layer with a single layer structure; and a resin layer, wherein the resin layer is provided on the absorbing glass substrate through the bonding layer, wherein the bonding layer includes a Si atom and one or more selected from a Ti atom, a Zr atom, and an Al atom; or an optical filter, including an absorbing glass substrate composed of phosphate-based glass or fluorophosphate-based glass; and a resin layer, wherein the resin layer includes a Si atom and one or more selected from a Ti atom, a Zr atom, and an Al atom, and is provided on the absorbing glass substrate.

A method of forming a sealed device comprising providing a first substrate having a first surface, providing a second substrate adjacent the first substrate, and forming a weld between an interface of the first substrate and the adjacent second substrate, wherein the weld is characterized by ((.sub.tensile stress location)/(.sub.interface laser weld))<<1 or <1 and .sub.interface laser weld>10 MPa or >1 MPa where .sub.tensile stress location is the stress present in the first substrate and .sub.interface laser weld is the stress present at the interface. This method may be used to manufacture a variety of different sealed packages.

A method of forming a sealed device comprising providing a first substrate having a first surface, providing a second substrate adjacent the first substrate, and forming a weld between an interface of the first substrate and the adjacent second substrate, wherein the weld is characterized by ((.sub.tensile stress location)/(.sub.interface laser weld))<<1 or <1 and .sub.interface laser weld>10 MPa or >1 MPa where .sub.tensile stress location is the stress present in the first substrate and .sub.interface laser weld is the stress present at the interface. This method may be used to manufacture a variety of different sealed packages.