C03C17/25

Method of mitigating defects on an optical surface and mirror formed by same
11520234 · 2022-12-06 · ·

A method of making a mirror for use with extreme ultraviolet (EUV) or X-ray radiation is disclosed. The method includes: a) providing an optical element having a curved mirror surface, wherein the curved mirror surface comprises localized defects that degrade performance of the curved mirror surface; b) spin-coating the curved mirror surface with a material to cover at least some of the defects; and c) curing the spin-coated material on the curved mirror surface to reduce the number of defects and improve the performance of the curved mirror surface. Also disclosed is a mirror made by the method.

Nanostructure coating materials and methods of use thereof
11592246 · 2023-02-28 · ·

Nanostructured coating materials, methods of their production, and methods of use in a variety of applications are described. The nanostructured materials described herein include one or more 2.sup.+ and/or 3.sup.+ metal ion(s), optionally in a ternary phase, on a substrate.

Nanostructure coating materials and methods of use thereof
11592246 · 2023-02-28 · ·

Nanostructured coating materials, methods of their production, and methods of use in a variety of applications are described. The nanostructured materials described herein include one or more 2.sup.+ and/or 3.sup.+ metal ion(s), optionally in a ternary phase, on a substrate.

HEAT-REFLECTING MEMBER, AND METHOD FOR MANUFACTURING GLASS MEMBER HAVING HEAT-REFLECTING LAYER INCLUDED THEREIN

Provided is a heat reflective member, which is prevented from braking even in a high-temperature environment. It generates no dust in use, and can be washed with a chemical liquid. The heat reflective member has a laminated structure in which quartz glass layers are formed on an upper surface and a lower surface of a siliceous sintered powder layer. The heat reflective member includes: an impermeable layer which is formed at a portion of the siliceous sintered powder layer at an end portion of the heat reflective member, which has a thickness at least larger than half of a thickness of the siliceous sintered powder layer, and through which a gas or a liquid is prevented from penetrating; and a buffer layer which is formed between the impermeable layer and the siliceous sintered powder layer, and which changes in density from the impermeable layer toward the sintered powder layer.

Low-reflection film-coated transparent substrate, photoelectric conversion device, coating liquid for forming low-reflection film of low-reflection film-coated transparent substrate, and method for producing low-reflection film-coated transparent substrate

A low-reflection film-coated transparent substrate of the present invention includes a transparent substrate and a low-reflection film formed on at least one principal surface of the transparent substrate. The low-reflection film is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound by the binder. The binder further contains an aluminum compound. The low-reflection film contains as components: 55 to 70 mass % of the fine silica particles; 25 to 40 mass % of the silica of the binder; 0.1 to 1.5 mass % of the aluminum compound in terms of Al.sub.2O.sub.3; and 0.25 to 3% of an organic component. The low-reflection film has a thickness of 80 to 800 nm. A transmittance gain is 2.5% or more, the transmittance gain being defined as an increase of average transmittance of the low-reflection film-coated transparent substrate in a wavelength range of 380 to 850 nm relative to average transmittance of the transparent substrate uncoated with the low-reflection film in the wavelength range. The organic component includes at least one selected from the group consisting of a ß-ketoester and a ß-diketone.

Low-reflection film-coated transparent substrate, photoelectric conversion device, coating liquid for forming low-reflection film of low-reflection film-coated transparent substrate, and method for producing low-reflection film-coated transparent substrate

A low-reflection film-coated transparent substrate of the present invention includes a transparent substrate and a low-reflection film formed on at least one principal surface of the transparent substrate. The low-reflection film is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound by the binder. The binder further contains an aluminum compound. The low-reflection film contains as components: 55 to 70 mass % of the fine silica particles; 25 to 40 mass % of the silica of the binder; 0.1 to 1.5 mass % of the aluminum compound in terms of Al.sub.2O.sub.3; and 0.25 to 3% of an organic component. The low-reflection film has a thickness of 80 to 800 nm. A transmittance gain is 2.5% or more, the transmittance gain being defined as an increase of average transmittance of the low-reflection film-coated transparent substrate in a wavelength range of 380 to 850 nm relative to average transmittance of the transparent substrate uncoated with the low-reflection film in the wavelength range. The organic component includes at least one selected from the group consisting of a ß-ketoester and a ß-diketone.

Process for obtaining a textured glass substrate coated with an antireflective coating of sol-gel type

A process for obtaining a material including a textured glass substrate coated, on at least one of its textured faces, with an antireflective coating of sol-gel type based on porous silica, includes a stage of application, to the at least one textured face of the substrate, of a solution containing at least one silica precursor and at least one pore-forming agent, then a heat treatment stage targeted at consolidating the antireflective coating. Before the application stage, the glass substrate is subjected to a preheating stage, so that the at least one textured face intended to be coated with the antireflective coating has a temperature within a range extending from 30° C. to 100° C. immediately before the application stage.

Process for obtaining a textured glass substrate coated with an antireflective coating of sol-gel type

A process for obtaining a material including a textured glass substrate coated, on at least one of its textured faces, with an antireflective coating of sol-gel type based on porous silica, includes a stage of application, to the at least one textured face of the substrate, of a solution containing at least one silica precursor and at least one pore-forming agent, then a heat treatment stage targeted at consolidating the antireflective coating. Before the application stage, the glass substrate is subjected to a preheating stage, so that the at least one textured face intended to be coated with the antireflective coating has a temperature within a range extending from 30° C. to 100° C. immediately before the application stage.

FUSED LAYER AND CORE
20230113081 · 2023-04-13 · ·

A robust coated core comprising a composite with a fused or sintered coating

GREENHOUSE AND GLASS SHEET WITH COATING FILM
20230149913 · 2023-05-18 ·

A greenhouse according to the present invention includes: a ceiling portion; and in at least a portion of the ceiling portion, a glass sheet with a coating film. The glass sheet with a coating film has a total light transmittance of 90% to 98%, a haze ratio of 20% to 80%, and a hemispherical transmittance of 80% to 90%. When a test is performed according to JIS R 1703-1: 2007 by applying oleic acid to a surface of a coating film and subsequently irradiating the surface with ultraviolet light at an intensity of 1.0 mW/cm.sup.2, a time period from start of irradiation with the ultraviolet light to a point at which a water contact angle on the surface reaches 5° is 24 hours or less.