Embodiments of articles including a low-contrast anti-reflection coating are disclosed. The coated surface of such articles exhibits a reduced difference in reflectance between a pristine state and when a surface defect is present. In one or more embodiments, the coated surface of such articles exhbits a first average reflectance in the range from about 0.6% to about 6.0% in a pristine condition and a second avearge reflectance of about 8% or less after removal of a surface thickness of the anti-reflection coating. In other embodiments, the coated substrate exhibits a second average reflectance of about 10% or less, when the coated surface comprises a contaminant. In some embodiments, the coated substrate exhibits a first color coordinate (a*.sub.1, b*.sub.1) in a pristine condition and a second color coordinate (a*2, b*2) after the presence of a surface defect such that Aa*b* is about 6 or less.

A glazing includes a glass substrate on which is deposited a coating including at least one layer, the layer being formed from a material including metal nanoparticles dispersed in an inorganic matrix of an oxide, in which the metal nanoparticles are made of a metal chosen from the group formed by silver, gold, platinum, copper and nickel or of an alloy formed from at least two of these metals, in which the matrix including an oxide of at least one element chosen from the group of titanium, silicon and zirconium and in which the atomic ratio M/Me in the material is less than 1.5, M representing all atoms of the elements of the group of titanium, silicon and zirconium present in the layer and Me representing all of the atoms of the metals of the group formed by silver, gold, platinum, copper and nickel present in the layer.

The present invention provides a laminate that can eliminate adsorption defects of a substrate caused by warping of the substrate and enables electronic devices to be manufactured at high yield. The present invention pertains to a laminate that is provided with a support base material, an adhesion layer, and a substrate in said order. The substrate is provided with a dielectric multilayer film in which dielectric layers having different refractive indexes are alternately laminated on an outer surface of the substrate. The substrate provided with the dielectric multilayer film is disposed on the adhesion layer such that the dielectric multilayer film adheres in a peelable manner to the adhesion layer.

Various embodiments herein relate to electrochromic devices, methods of fabricating electrochromic devices, and apparatus for fabricating electrochromic devices. In a number of cases, the electrochromic device may be fabricated to include a particular counter electrode material. The counter electrode material may include a base anodically coloring material. The counter electrode material may further include one or more halogens. The counter electrode material may also include one or more additives.

Coated glass panes having a glass pane and a coating in at least one region of at least one side of the glass pane. The glass pane is composed of glass with SiO.sub.2 and B.sub.2O.sub.3. The coating includes first coating applied in at least one region of the at least one side. The first coating has a binder with SiO.sub.2 and a pigment. The glass pane, in the at least one region, has a flexural strength between at least 5 and at most 170 MPa.

The invention provides a method of making a coated glass article in which a gaseous mixture is formed including an aluminum-containing compound, a boron-containing compound, and an inert gas. This gaseous mixture is delivered to a location above a major surface of a glass substrate to deposit a coating comprising aluminum, boron, and oxygen over the major surface of the glass substrate.

A coated glass article provides a visible light reflecting, solar control glazing with a low emittance, a low solar heat gain coefficient, and a low shading coefficient that can significantly improve energy costs in buildings and homes while providing a desirable neutral color for, at least, film side reflection. The low emittance characteristic of the 5 glazing would minimize any indirect heat gain from absorption.

A coated glazing includes a transparent glass substrate and a coating located on the glass substrate. The coating is provided with at least the following layers in sequence starting from the glass substrate: a first layer having a refractive index of more than 1.6, an optional second layer having a refractive index that is less than the refractive index of the first layer, a third layer based on tin dioxide, a fourth layer based on an oxide of silicon, and a fifth layer based on titanium dioxide, wherein the fifth layer is photocatalytic.

Provided is an optical film (composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing an optical film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, characterized in that the optical film comprises cesium, tungsten, and oxygen, and a refractive index n and an extinction coefficient k of the optical film at each of wavelengths [300 nm, 350 nm, 400 nm, 450 nm, . . . , 1700 nm] specified at 50 nm intervals in a wavelength region from 300 nm to 1700 nm are set respectively within specified numerical ranges.

A transparent substrate provided with a multilayer film includes: a transparent substrate having two main surfaces; and a multilayer film obtained by laminating a metal oxide layer and a silicon oxide layer in order on at least one of the main surfaces of the transparent substrate. SiO.sub.x in at least one silicon oxide layer in the multilayer film satisfies a relationship 1.55≤x<2.00. The multilayer film has a luminous transmittance of 20% to 89% and a resistance value of 10.sup.4 Ω/sq or higher. x in SiO.sub.x is a value determined by depth direction composition analysis in X-ray photoelectron spectroscopy (XPS) using argon ion sputtering. When the silicon oxide layer is an outermost layer, the value of x is determined excluding a point where a sputtering time is 0 minute.