C03C17/3417

GREENHOUSE AND GLASS SHEET WITH COATING FILM
20230149913 · 2023-05-18 ·

A greenhouse according to the present invention includes: a ceiling portion; and in at least a portion of the ceiling portion, a glass sheet with a coating film. The glass sheet with a coating film has a total light transmittance of 90% to 98%, a haze ratio of 20% to 80%, and a hemispherical transmittance of 80% to 90%. When a test is performed according to JIS R 1703-1: 2007 by applying oleic acid to a surface of a coating film and subsequently irradiating the surface with ultraviolet light at an intensity of 1.0 mW/cm.sup.2, a time period from start of irradiation with the ultraviolet light to a point at which a water contact angle on the surface reaches 5° is 24 hours or less.

ANTI-REFLECTIVE FILM-ATTACHED TRANSPARENT SUBSTRATE AND IMAGE DISPLAY DEVICE
20230150245 · 2023-05-18 · ·

An anti-reflective film-attached transparent substrate includes: a transparent substrate including two main surfaces; and a diffusion layer and an anti-reflective film on one main surface of the transparent substrate, which are provided in this order. The anti-reflective film-attached transparent substrate satisfies (A) a luminous transmittance is 20% to 90%, (B) a transmission color b* value under a D65 light source is 5 or less, (C) a luminous reflectance (SCI Y) of an outermost layer of the anti-reflective film is 0.4% or less, (D) a sheet resistance of the anti-reflective film is 10.sup.4 Ω/square or more, (E) the anti-reflective film has a laminated structure in which at least two dielectric layers having different refractive indices are laminated, and (F) a Diffusion value is 0.2 or more and a diffused light brightness (SCE L*) is 4 or less.

TRANSPARENT SUBSTRATE WITH ANTI-REFLECTIVE FILM
20230144879 · 2023-05-11 · ·

An anti-reflective film-attached transparent substrate includes a transparent substrate having two main surfaces and, on at least one of the main surfaces, a multilayer film in which at least two layers having different refractive indices are laminated. At least one silicon oxide layer among the layers in the multilayer film has a moisture permeability of 300 g/m.sup.2/day or less.

Method of increasing strength of glass substrate for optical filter and tempered-glass optical filter made thereby

The present invention provides a method of increasing the strength of a glass substrate for optical filters and a tempered-glass optical filter using a tempered glass substrate manufactured using the same, in which the glass substrate for optical filters is subjected to chemical tempering so that a compressive stress (CS) and a depth of layer (DOL) of the glass substrate are adjusted to increase the bending strength thereof.

Light reflection modification for fireplaces and other products

The present disclosure relates to products and methods for modifying the reflection of a light source in a fireplace and other products.

CONTROLLED DEPOSITION OF A FUNCTIONAL MATERIAL ONTO A TARGET SURFACE
20230136483 · 2023-05-04 ·

A plate including functional material to be deposited onto a target surface using monochromatic radiation having a wavelength is described. The plate further includes a substrate with a first surface directed towards the target surface and with a second surface to receive the monochromatic radiation. The first surface is patterned with recessed areas that have a dielectric coating and that are filled with the functional material. The dielectric coating includes a sequence of dielectric coating layers alternating in refractive index. The dielectric coating therewith has a relatively high reflectivity for said monochromatic radiation incident perpendicular to the dielectric coating in comparison to a reflectivity for said monochromatic radiation incident at an angle of 45 degrees to the dielectric coating. As such shear forces are mitigated without requiring a high alignment accuracy. The present application further describes a deposition device including the plate and a method involving the plate.

STACKS INCLUDING SOL-GEL LAYERS AND METHODS OF FORMING THEREOF

Provided are methods of forming stacks comprising a substrate and one or more sol-gel layers disposed on the substrate. Also provided are stacks formed by these methods. The sol-gel layers in these stacks, especially outer layers, may have a porosity of less than 1% or even less than 0.5%. In some embodiments, these layers may have a surface roughness (R.sub.a) of less than 1 nanometers. The sol-gel layers may be formed using radiative curing and/or thermal curing at temperatures of between 400° C. and 700° C. or higher. These temperatures allow application of sol-gel layers on new types of substrates. A sol-gel solution, used to form these layers, may have colloidal nanoparticles with a size of less than 20 Angstroms on average. This small size and narrow size distribution is believed to control the porosity of the resulting sol-gel layers.

COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES
20170371221 · 2017-12-28 ·

The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include nickel tungsten tantalum oxide (NiWTaO). This material is particularly beneficial in that it is very transparent in its clear state.

COUNTER ELECTRODE MATERIAL FOR ELECTROCHROMIC DEVICES

Various embodiments herein relate to electrochromic devices, methods of fabricating electrochromic devices, and apparatus for fabricating electrochromic devices. In a number of cases, the electrochromic device may be fabricated to include a particular counter electrode material. The counter electrode material may include a base anodically coloring material. The counter electrode material may further include one or more halogens. The counter electrode material may also include one or more additives.

IMPROVED PROCESS OF ULTRASONIC SPRAY PYROLYSIS DEPOSITION OF ONE OR MORE ELECTROCHROMIC AND/OR ELECTROLYTIC FILMS ON A SUBSTRATE

A process of making an electrochromic or an electrolytic film by Ultrasonic Spray Pyrolysis (USP) deposition on a substrate comprising: mixing a surfactant to an aqueous precursor solution comprising an electrochromic component or an electrolytic component to provide a spray solution; introducing the spray solution into an ultrasonic spray deposition nozzle at a constant flow rate between 0.1 mL/min and 2 mL/min and applying an ultrasonic frequency between 80 and 120 kHz to generate atomized droplets of the precursor solution; entraining the atomized droplets with a controlled jet of air as gas carrier at a pressure between 0.50 to 2.0 psi, onto a pre-heated substrate at a temperature of 200 to 450° C.; thermally converting the atomized droplets when depositing onto the pre-heated substrate to generate an electrochromic or an electrolytic film.