A glass laminate includes a glass substrate; and an anti-reflection layer laminated on the glass substrate and a minimum of absorbances of the glass laminate in wavelengths of 380 to 780 nm is 0.01 or more.

A method for preparing a laminate substrate for a light emitting device includes providing a glass substrate having a refraction index, at 550 nm, of between 1.45 and 1.65, coating a glass frit having a refractive index, at 550 nm, of at least 1.7 onto the glass substrate, firing the resulting frit coated glass substrate at a temperature above the Littleton temperature of the glass frit thereby forming a first high index enamel layer, coating a metal oxide layer onto the first high index enamel layer, and firing the resulting coated glass substrate at a temperature above the Littleton temperature of the glass frit, thereby making react the metal oxide with the underlying first high index enamel layer and forming a second high index enamel layer with a plurality of spherical voids embedded in the upper section of the second high index enamel layer near the interface with air.

A photocatalytic functional film has a structure of a substrate, a barrier layer and a photocatalytic layer stacked one on another. The barrier layer is a SiO.sub.2 film, the photocatalyst layer comprises an amorphous TiO.sub.2 film, and particles of visible light responsive photocatalytic material formed on the surface of the amorphous TiO.sub.2 film. A method for producing a photocatalytic functional film includes: adding an alcohol solvent and an acid to a silicate precursor to obtain a SiO.sub.2 sol by dehydration and de-alcoholization reaction; applying and drying the SiO.sub.2 sol on a substrate to form a barrier layer; adding an alcohol solvent and an acid to a titanium precursor to obtain a TiO.sub.2 amorphous sol by dehydration and de-alcoholization reaction; and applying and drying a composition formed by mixing particles of visible light responsive photocatalyst material with the TiO.sub.2 amorphous sol on the barrier layer, to form a photocatalyst layer.

The invention provides transparent conductive coatings based on indium tin oxide. The coating has an oxide overcoat, such as an alloy oxide overcoat. In some embodiments, the coating further includes one or more overcoat films comprising silicon nitride, silicon oxynitride, silicon dioxide, or titanium dioxide.

Insulated glazing units comprising first and second sheets of glazing material with a low pressure space there between are described. The major surface of the second sheet of glazing material not facing the low pressure space has a low emissivity coating comprising at least one layer of fluorine doped tin oxide thereon. There is a first anti-iridescence coating between the low emissivity coating and the second sheet of glazing material. Also described are insulated glazing units comprising three (first, second and third) sheets of glazing material with a low pressure space between first and second sheets of glazing material, and a second space between the first and third sheets of glazing material. There is a low emissivity coating on one or both major surfaces facing the low pressure space. The third sheet of glazing material has a low emissivity coating on both opposed major surfaces thereof.

A laminated window assembly has a first glass pane with a coating formed thereon, a second glass pane, and a polymeric interlayer provided between the first glass pane and the second glass pane. The coating includes a first layer deposited over a major surface of the glass pane, wherein the first layer has a refractive index of 1.6 or more and a thickness of 50 nm or less, a second layer deposited over the first layer, wherein the second layer has a refractive index that is less than the refractive index of the first layer and a thickness of 50 nm or less, a third layer deposited over the second layer, wherein the third layer has a refractive index that is greater than the refractive index of the second layer and a thickness of less than 500 nm, and a fourth layer deposited over the third layer, wherein the fourth layer has a refractive index that is less than the refractive index of the third layer and a thickness of 100 nm or less.

An electrochromic structure is disclosed, which includes a first transparent non-conductive (GLASS-I) layer, a first transparent conductor (CONDUCTOR-I) layer coupled to the GLASS-I layer, an ion storage layer coupled to the CONDUCTOR-I layer, an electrolyte layer coupled to the ion storage layer, an electrochromic layer coupled to the electrolyte layer, a second transparent conductor (CONDUCTOR-II) layer coupled to the electrochromic layer, and a second transparent non-conductive (GLASS-II) layer coupled to the CONDUCTOR-II layer, wherein the electrochromic layer includes perovskite nickelates thin films formed on a transparent conductive film substrate and which has crystalline grains of the size of about 5 nm to about 200 nm resulting in intergranular porosity of about 5% to about 25%.

Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.

A method for making a beam splitter with photocatalytic coating is disclosed. First, a TiO.sub.2—SiO.sub.2 sol, a SiO.sub.2 sol, and an anatase TiO.sub.2 preform sol are prepared. A glass substrate having two opposite surfaces is provided. The two opposite surfaces of the glass substrate is coated with the TiO.sub.2—SiO.sub.2 sol, the SiO.sub.2 sol, and the anatase TiO.sub.2 preform sol by dip-coating, thereby forming a coated glass substrate with a multi-layer optical coating on each of the two opposite surfaces. The multi-layer optical coating comprises a TiO.sub.2—SiO.sub.2 coating, a SiO.sub.2 coating, and an anatase TiO.sub.2 preform coating. The coated glass substrate is subjected to an anneal process. The coated glass substrate is cut, thereby forming the beam splitter with photocatalytic coating.

A method of reducing the emissivity of a coated glass article includes the following steps in sequence: (a) forming a coated glass article, the coated glass article comprising a glass substrate and a coating formed on the glass substrate, the coating having a first layer deposited over the glass substrate and a second layer, the second layer being provided between the first layer and the glass substrate, wherein the coated glass article exhibits a first emissivity; and (b) heating the coated glass article in an environment set to a predetermined temperature and for a predetermined period of time. After step (b), the coated glass article exhibits a second emissivity, the second emissivity being less than the first emissivity.