C03C2201/23

GAS FLUSHING FOR MELTING OVENS AND PROCESS FOR PREPARATION OF QUARTZ GLASS

One aspect is an oven including a melting crucible with a crucible wall, a solids feed with an outlet, a gas inlet and a gas outlet, wherein in the melting crucible the gas inlet is arranged below the solids feed outlet and the gas outlet is arranged at the same height as or above the solids feed outlet. One aspect further relates to a process for making a quartz glass body, including providing and introducing a bulk material selected from silicon dioxide granulate and quartz glass grain into the oven and providing a gas, making a glass melt from the bulk material, and making a quartz glass body from at least a part of the glass melt. One aspect relates to a quartz glass body obtainable by this process and a light guide, an illuminant and a formed body which are each obtainable by processing the quartz glass body further.

PREPARATION OF QUARTZ GLASS BODIES WITH DEW POINT MONITORING IN THE MELTING OVEN

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing silicon dioxide particles, ii.) Making a glass melt out of the silicon dioxide particles in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0 C. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

SPRAY GRANULATION OF SILICON DIOXIDE IN THE PREPARATION OF QUARTZ GLASS

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate, making a glass melt out of the silicon dioxide granulate, and making a quartz glass body out of at least a part of the glass melt. In one aspect, providing a silicon dioxide granulate includes providing of a silicon dioxide powder and processing of the powder to obtain a silicon dioxide granulate including the spray drying of a silicon dioxide slurry using a nozzle. The nozzle has a contact surface to the slurry made of glass, plastic or a combination thereof. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to the preparation of a silicon dioxide granulate. One aspect also relates to a light guide, an illuminant, and a formed body, made from processing of the quartz glass body.

GLASS FIBRES AND PRE-FORMS MADE OF HOMOGENEOUS QUARTZ GLASS

One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index n.sub.K of each refractive index profile is greater than the refractive index n.sub.M1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

PREPARATION OF QUARTZ GLASS BODIES FROM SILICON DIOXIDE GRANULATE

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate obtainable from a silicon dioxide powder, wherein the silicon dioxide granulate has a larger particle size than the silicon dioxide powder, ii.) Making a glass melt out of silicon dioxide granulate and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the melting crucible has at least one inlet and at least one outlet, wherein at least part of the glass melt is removed via the melting crucible outlet. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

PREPARATION OF A QUARTZ GLASS BODY IN A MULTI-CHAMBER OVEN

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

STEAM TREATMENT OF SILICON DIOXIDE POWDER IN THE PREPARATION OF QUARTZ GLASS

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of the silicon dioxide granulate and iii) Making a quartz glass body out of at least part of the glass melt, wherein the provision comprises the steps I. Providing a silicon dioxide powder with at least two particles made from a silicon-chlorine compound, II. Bringing the silicon dioxide powder into contact with steam to obtain a treated silicon dioxide powder and III. Granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate, and wherein the chorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a process for providing a silicon dioxide granulate. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

HOMOGENEOUS QUARTZ GLASS FROM PYROGENIC SILICON DIOXIDE GRANULATE

One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate composed of a pyrogenic silicon dioxide powder, making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The quartz glass body has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm and an aluminium content of less than 200 ppb. One aspect also relates to a quartz glass body which is obtainable by this process. Furthermore, one aspect relates to a formed body and a structure, each of which is obtainable by further processing of the quartz glass body.

PREPARATION OF A QUARTZ GLASS BODY IN A STANDING SINTER CRUCIBLE

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven comprises a standing sinter crucible. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

DIFFUSER MATERIAL OF SYNTHETICALLY PRODUCED QUARTZ GLASS AND METHOD FOR THE MANUFACTURE OF A MOLDED BODY CONSISTING FULLY OR IN PART THEREOF

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO.sub.2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm.sup.3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 m.