C03C2201/26

PREPARATION OF QUARTZ GLASS BODIES WITH DEW POINT MONITORING IN THE MELTING OVEN

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing silicon dioxide particles, ii.) Making a glass melt out of the silicon dioxide particles in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0 C. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

REDUCING CARBON CONTENT OF SILICON DIOXIDE GRANULATE AND THE PREPARATION OF A QUARTZ GLASS BODY

One aspect is a process for the preparation of a quartz glass body including providing a silicon dioxide granulate wherein the provision includes providing silicon dioxide powder, and processing the silicon dioxide powder to obtain a silicon dioxide granulate. The silicon dioxide granulate has a larger particle diameter than the silicon dioxide powder. The processing includes processing the silicon dioxide powder to obtain a silicon dioxide granulate I, wherein the silicon dioxide granulate I has a first carbon content wC(1), treating the silicon dioxide granulate I with a reactant to obtain a silicon dioxide granulate II with a further carbon content wC(2), wherein the further carbon content wC(2) is less than the first carbon content wC(1), making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt.

PREPARATION OF A QUARTZ GLASS BODY IN A HANGING METAL SHEET CRUCIBLE

One aspect relates to a process for the provision of a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in an oven and making a quartz glass body from at least part of the glass melt. The oven includes a hanging metal sheet crucible. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect further relates to a light guide, an illuminant and a formed body which are obtainable by processing the quartz glass body further.

SPRAY GRANULATION OF SILICON DIOXIDE IN THE PREPARATION OF QUARTZ GLASS

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate, making a glass melt out of the silicon dioxide granulate, and making a quartz glass body out of at least a part of the glass melt. In one aspect, providing a silicon dioxide granulate includes providing of a silicon dioxide powder and processing of the powder to obtain a silicon dioxide granulate including the spray drying of a silicon dioxide slurry using a nozzle. The nozzle has a contact surface to the slurry made of glass, plastic or a combination thereof. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to the preparation of a silicon dioxide granulate. One aspect also relates to a light guide, an illuminant, and a formed body, made from processing of the quartz glass body.

PREPARATION OF A QUARTZ GLASS BODY IN A MULTI-CHAMBER OVEN

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m.sup.2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

STEAM TREATMENT OF SILICON DIOXIDE POWDER IN THE PREPARATION OF QUARTZ GLASS

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of the silicon dioxide granulate and iii) Making a quartz glass body out of at least part of the glass melt, wherein the provision comprises the steps I. Providing a silicon dioxide powder with at least two particles made from a silicon-chlorine compound, II. Bringing the silicon dioxide powder into contact with steam to obtain a treated silicon dioxide powder and III. Granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate, and wherein the chorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a process for providing a silicon dioxide granulate. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

AMMONIA TREATMENT OF SILICON DIOXIDE POWDER IN THE PREPARATION OF QUARTZ GLASS

One aspect relates to a process for the preparation of a quartz glass body, including provision of a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate and making a quartz glass body from at least part of the glass melt. The provision includes making a silicon dioxide powder with at least two particles prepared from a silicon-chlorine compound, bringing the silicon dioxide powder into contact with ammonia to obtain a treated silicon dioxide powder, and granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate. The chlorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. One aspect relates further to a quartz glass body which is obtainable by this process. One aspect also relates to a process for the preparation of a silicon dioxide granulate.

PREPARATION OF CARBON-DOPED SILICON DIOXIDE GRANULATE AS AN INTERMEDIATE IN THE PREPARATION OF QUARTZ GLASS

One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate I prepared from a pyrogenically produced silicon dioxide powder, treating the silicon dioxide granulate I with a reactant at a temperature in a range from 1000 to 1300 C., and making a glass melt out of the silicon dioxide granulate. A quartz glass body is made out of at least a part of the glass melt. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to a light guide, an illuminant, and a formed body, each of which is obtainable by further processing of the quartz glass body. One aspect additionally relates to a process for the preparation of a silicon dioxide granulate II.

Method for producing a composite body of a material with a high silicic acid content

A low cost method for producing a mechanically and thermally stable composite body containing a first layer of a material with a high silicic acid content and an additional component connected to a second layer of a material with a high silicic acid content and an additional component in a second concentration differing from the first concentration is provided. The method involves (a) preparing a first slurry layer having a free surface using a first shirt mass containing SiO.sub.2 particles and an additional component dispersed in a first dispersing agent, (b) providing a second slurry mass containing SiO.sub.2 particles and an additional component in a second concentration dispersed in a second dispersing agent, (c) forming a composite-body intermediate product by applying the second slurry mass to the free surface of the first slurry layer, and (d) heating the composite-body intermediate product while forming the composite body.

METHOD FOR PRODUCING A COMPOSITE BODY OF A MATERIAL WITH A HIGH SILICIC ACID CONTENT
20170144916 · 2017-05-25 ·

A low cost method for producing a mechanically and thermally stable composite body containing a first layer of a material with a high silicic acid content and an additional component connected to a second layer of a material with a high silicic acid content and an additional component in a second concentration differina from the first concentration is provided. The method involves (a) preparing a first slurry layer having a free surface using a first shirt mass containing SiO.sub.2 particles and an additional component dispersed in a first dispersing agent, (b) providing a second slurry mass containing SiO.sub.2 particles and an additional component in a second concentration dispersed in a second dispersing agent, (c) forming a composite-body intermediate product by applying the second slurry mass to the free surface of the first slurry layer, and (d) heating the composite-body intermediate product while forming the composite body.