C03C2201/32

Method for developing a coating having a high light transmission and/or a low light reflection

A method for developing a coating having a high light transmission and/or a low light reflection is provided. The method relates to a process for developing a coating with a high light transmission and/or a low light reflection, where the coating is deposited on a substrate. The coating is deposited as a mixed coating comprising a material A and a material B, where the coating is developed to have a coating thickness profile in which the lowest proportion of the material B is on the substrate surface and the highest proportion of coating material is on the coating surface. The material B is at least partially removed from the coating after deposition of the coating on the substrate.

UV lamp and method for irradiating a surface, a liquid or a gas with UV radiation

A UV lamp including a filter material of doped quartz glass is provided that effects a transparency as high as possible for operating radiation in the ultraviolet spectral range above 210 nm together with low transparency in the wavelength range below about 190 nm. The filter material of doped quartz glass includes at least 99 wt. % of SiO.sub.2 and Al.sub.2O.sub.3, wherein the Al.sub.2O.sub.3 portion is in the range of 2 wt. % to 4 wt. The filter material has an edge wavelength at a wavelength below 190 nm and a spectral transmission of 80% mm.sup.1 or higher at a wavelength of 210 nm.

DOPING OPTIMIZED SINGLE-MODE OPTICAL FIBER WITH ULTRA LOW ATTENUATION
20180052280 · 2018-02-22 ·

A doping optimized single-mode optical fiber with ultra low attenuation includes a core layer and cladding layers. The cladding layers has an inner cladding layer surrounding the core layer, a trench cladding layer surrounding the inner cladding layer, an auxiliary outer cladding layer surrounding the trench cladding layer, and an outer cladding layer surrounding the auxiliary outer cladding layer. The content of fluorine in the core layer is 0.5 wt %, Ge0.12%, n.sub.10.12%. The content of fluorine in the inner cladding layer is 0.5-1.5 wt %, n.sub.20.14%. The content of fluorine in the trench cladding layer is 1-3 wt %, n.sub.30.25%. The content of fluorine in the auxiliary outer cladding layer is 0.5-2 wt %, n.sub.40.14%. The outer cladding layer is a pure silicon dioxide glass layer and/or a metal-doped silicon dioxide glass layer.

Method for heating molten glass and glass article

A glass article is designed at least in part in the form of a glass tube element including at least one shell which encloses at least one lumen. For at least one light transmission analysis of the glass article, a ratio of an average amplitude transmission factor and a specific amplitude transmission factor is greater than 1.00001.

Method for the manufacture of doped quartz glass

One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.

Method for manufacturing single crystal

Method for manufacturing a single crystal according to a CZ method, including: pre-examining a correlation between an Al/Li ratio in a quartz raw material powder used for producing the quartz crucible, a use time of the crucible, a devitrification ratio at the use time, and occurrence or nonoccurrence of melt leakage attributable to the devitrification part; setting a range of the devitrification ratio of the quartz crucible in order not to generate the melt leakage, and determining a maximum use time of the quartz crucible according to the Al/Li ratio so as to fall within the set range of the ratio, on the basis of the correlation; and growing the single crystal by using the quartz crucible in the range of the maximum use time. This provides a manufacturing method which can efficiently use a quartz crucible to grow a single crystal while preventing occurrence of melt leakage.

SEMICONDUCTOR HEAT TREATMENT MEMBER
20250002390 · 2025-01-02 ·

A semiconductor heat treatment member includes a plurality of quartz glass members fused to one another, a plurality of devitrified portions are formed in a fused portion at which the quartz glass members are fused, a maximum cross-sectional area of one devitrified portion among the plurality of devitrified portions is 1.76 mm.sup.2 or less, and an area occupancy ratio of a total area of the plurality of devitrified portions to an area of a cross section of the fused portion is 10% or less.

INORGANIC COMPOSITION AND FIBERS AND FLAKES THEREOF
20240400439 · 2024-12-05 · ·

[Object] Provided are inorganic fibers or inorganic flakes having excellent neutron shielding properties.

[Solution] When a formulation including: a base component containing SiO.sub.2 and Al.sub.2O.sub.3 as main components (provided that the mass ratio occupied by the sum total of SiO.sub.2 and Al.sub.2O.sub.3 in the base component is 0.60 or more); and a neutron shielding component composed of at least one of gadolinium, gadolinium oxide, samarium, samarium oxide, cadmium, or cadmium oxide, are blended at the proportions of 50 to 90 parts by mass of the base component and 10 to 50 parts by mass of the neutron shielding component and melted, satisfactory amorphous inorganic fibers and inorganic flakes were obtained.

UV LAMP AND METHOD FOR IRRADIATING A SURFACE, A LIQUID OR A GAS WITH UV RADIATION

A UV lamp including a filter material of doped quartz glass is provided that effects a transparency as high as possible for operating radiation in the ultraviolet spectral range above 210 nm together with low transparency in the wavelength range below about 190 nm. The filter material of doped quartz glass includes at least 99 wt. % of SiO.sub.2 and Al.sub.2O.sub.3, wherein the Al.sub.2O.sub.3 portion is in the range of 2 wt. % to 4 wt. The filter material has an edge wavelength at a wavelength below 190 nm and a spectral transmission of 80% mm.sup.1 or higher at a wavelength of 210 nm.

Doped ultra-low expansion glass and methods for making the same

A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/K.sup.2 at 20 C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.