Glass-based articles having sections of different thicknesses where a maximum central tension in a thinner section is less than that of a thicker section. The articles comprise an alkali metal oxide having a independent nonzero concentrations that vary along at least a portion of the thickness of each section. Consumer electronic products may comprise the glass-based articles having sections of different thicknesses.

Doped quartz glass components for use in a plasma-assisted manufacturing process contain at least one dopant which is capable of reacting with fluorine to form a fluoride compound, and the fluoride compound has a boiling point higher than that of SiF.sub.4. The doped quartz glass component has high dry-etch resistance and low particle formation, and has uniform etch removal when used in a plasma-assisted manufacturing process. The doped quartz glass has a microhomogeneity defined by (a) a surface roughness with an R.sub.a value of less than 20 nm after the surface has been subjected to a dry-etching procedure as specified in the description, or (b) a dopant distribution with a lateral concentration profile in which maxima of the dopant concentration are at an average distance apart of less than 30 μm.

A laminate according to an embodiment of the present invention includes at least one glass sheet and at least one resin layer, a relative dielectric constant of the glass sheet at 25° C. and a frequency of 2.45 GHz being 5 or less, and a dielectric loss tangent of the glass sheet at 25° C. and a frequency of 2.45 GHz being 0.003 or less.

A copper-doped glass formed by placing a target glass in a container, surrounding the target glass with a powder mixture comprised of SiO.sub.2 powder and Cu.sub.2S powder, wherein the SiO.sub.2 powder and the Cu.sub.2S powder are mixed according to the formula (SiO.sub.2).sub.(1-x)(Cu.sub.2S).sub.x, where 0.01<x<0.1, and heated to a temperature of between 800° C. and 1150° C. for a duration of between 1 and 10 hours.

Phosphate glasses and glass-ceramics exhibit a positive percent kill as measured by United States EPA Test Method for Efficacy of Copper Alloy Surfaces as a Sanitizer and/or have a CIELAB L* value below 35, CIELAB a* and b* values within 5 of zero.

A tubular member for an exhaust gas treatment device according to at least one embodiment of the present invention includes: a tubular main body made of a metal; and an insulating layer formed at least on an inner peripheral surface of the tubular main body. The insulating layer contains glass containing a crystalline substance, and the glass contains silicon, boron, and magnesium.

Phosphate glasses and glass-ceramics exhibit a positive percent kill as measured by United States EPA Test Method for Efficacy of Copper Alloy Surfaces as a Sanitizer and/or have a CIELAB L* value below 35, CIELAB a* and b* values within 5 of zero.

Phosphate glasses and glass-ceramics exhibit a positive percent kill as measured by United States EPA Test Method for Efficacy of Copper Alloy Surfaces as a Sanitizer and/or have a CIELAB L* value below 35, CIELAB a* and b* values within 5 of zero.

A method of making a copper-doped glass comprising placing a target glass in a container, placing a target glass in a container, surrounding the target glass with a powder mixture comprised of fused silica (SiO.sub.2) powder and copper sulfide (Cu.sub.2S) powder, such that both the target glass and the surrounding powder are contained in the container, and heating the container and the target glass and the surrounding powder mixture to a temperature of between 800° C. and 1150° C.

A copper-doped glass formed by placing a target glass in a container, surrounding the target glass with a powder mixture comprised of SiO.sub.2 powder and Cu.sub.2S powder, wherein the SiO.sub.2 powder and the Cu.sub.2S powder are mixed according to the formula (SiO.sub.2).sub.(1-x)(Cu.sub.2S).sub.x, where 0.01<x<0.1, and heated to a temperature of between 800° C. and 1150° C. for a duration of between 1 and 10 hours.