Patent classifications
C03C2203/54
Doped bismuth silicate crystals via devitrification of glass forming liquids
This technology is directed to the preparation of doped-bismuth-silicate seed crystals through controlled crystallization (e.g. dimensionality of growth and nucleation mechanism) and the method of forming high purity single seed (particle size ranges from micrometers to millimeters) for various uses. These seed crystals have a nominal stoichiometry of Bi.sub.2-xA.sub.xSiO.sub.5, Bi.sub.2-xA.sub.xSi.sub.3O.sub.9, Bi.sub.4-xA.sub.xSi.sub.3O.sub.9, and Bi.sub.12-xA.sub.xSiO.sub.20, where A is a rare earth dopant selected from La, Ce, Nd, Pr, and/or Sm.
Process of fabrication of Erbium and Ytterbium-co-doped multi-elements silica glass based cladding-pumped fiber
The present application provides a process of fabrication of erbium and ytterbium-co-doped multielements silica glass based cladding-pumped fiber for use as a highly efficient high power optical amplifier.
SILICA GLASS MEMBER FOR HERMETIC SEALING OF ULTRAVIOLET SMD LED ELEMENT AND METHOD FOR MANUFACTURING QUARTZ GLASS MEMBER FOR ULTRAVIOLET LED
Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.
SILICA GLASS MEMBER FOR HERMETIC SEALING OF ULTRAVIOLET SMD LED ELEMENT AND METHOD FOR MANUFACTURING QUARTZ GLASS MEMBER FOR ULTRAVIOLET LED
Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.
SUBSTRATE FOR A REFLECTIVE OPTICAL ELEMENT
In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates (51) or reflective optical elements (50), in particular for EUV lithography, with substrates (51) of this type, are proposed. These substrates (51), which have a surface region (511) with a reflective coating (54), are characterised in that, at least near to the surface region (511), the titanium-doped quartz glass has a proportion of Si—O—O—Si bonds of at least 1*10.sup.16/cm.sup.3 and/or a proportion of Si—Si bonds of at least 1*10.sup.16/cm.sup.3 or, along a notional line (513) perpendicular to the surface region (511), over a length (517) of 500 nm or more, a hydrogen content of more than 5×10.sup.18 molecules/cm.sup.3.
OPTICAL DEVICE PRODUCTION METHOD
A method for manufacturing an optical device includes a hydrogen-loading step, a laser irradiation step, and a light condensing point movement step. The laser irradiation step and the light condensing point movement step are alternately repeated, or are performed in parallel. In the hydrogen-loading step, hydrogen is loaded into a glass member containing B.sub.2O.sub.3 and has a content of GeO.sub.2 less than 10% by mass fraction based on an oxide. In the laser irradiation step, a femtosecond laser beam having a repetition frequency of 10 kHz or higher is condensed and emitted into the glass member into which the hydrogen is loaded, and a light-induced change in refractive index is caused in the glass member. In the light condensing point movement step, a light condensing point position of the femtosecond laser beam is moved relative to the glass member.
Bromine-doped optical fiber
Bromine doping of silica glass is demonstrated. Bromine doping can be achieved with SiBr.sub.4 as a precursor. Bromine doping can occur during heating, consolidation or sintering of a porous silica glass body. Doping concentrations of bromine increase with increasing pressure of the doping precursor and can be modeled with a power law equation in which doping concentration is proportional to the square root of the pressure of the doping precursor. Bromine is an updopant in silica and the relative refractive index of silica increases approximately linearly with doping concentration. Bromine can be used as a dopant for optical fibers and can be incorporated in the core and/or cladding regions. Core doping concentrations of bromine are sufficient to permit use of undoped silica as an inner cladding material in fibers having a trench in the refractive index profile. Co-doping of silica glass with bromine and chlorine is also demonstrated.
HALOGEN-DOPED SILICA PREFORMS FOR OPTICAL FIBERS
Preparation of halogen-doped silica is described. The preparation includes doping silica with high halogen concentration and sintering halogen-doped silica to a closed-pore state in a gas-phase environment that has a low partial pressure of impermeable gases. Impermeable gases are difficult to remove from halogen-doped fiber preforms and lead to defects in optical fibers drawn from the preforms. A low partial pressure of impermeable gases in the sintering environment leads to a low concentration of impermeable gases and a low density of gas-phase voids in densified halogen-doped silica. Preforms with fewer defects result.
PROCESS OF FABRICATION OF ERBIUM AND YTTERBIUM-CO-DOPED MULTI-ELEMENTS SILICA GLASS BASED CLADDING-PUMPED FIBER
The present application provides a process of fabrication of erbium and ytterbium-co-doped multielements silica glass based cladding-pumped fiber for use as a highly efficient high power optical amplifier.
HIGH CHLORINE CONTENT LOW ATTENUATION OPTICAL FIBER
An optical fiber having a core comprising silica and greater than 1.5 wt % chlorine and less than 0.5 wt % F, said core having a refractive index .sub.1MAX, and an inner cladding region having refractive index .sub.2MIN surrounding the core, where .sub.1MAX>.sub.2MIN.