An insulating glass (IG) window unit including first and second glass substrates that are spaced apart from each other. At least one of the glass substrate has a triple silver low-emissivity (low-E) coating on one major side thereof, and a dielectric coating for improving angular stability on the other major side thereof.

Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

The invention relates to a scattering and conductive anti-reflection surface, comprising a continuous electrically conductive material of variable thickness deposited on a textured surface so as to render the assembly anti-reflective and scattering.

An insulating glass (IG) window unit including first and second glass substrates that are spaced apart from each other. At least one of the glass substrate has a triple silver low-emissivity (low-E) coating on one major side thereof, and a dielectric coating for improving angular stability on the other major side thereof.

A glass plate includes a first surface provided with a first film; and a second surface provided with a second film and opposite to the first surface. Each of the first film and the second film includes mainly tin oxide and has a sheet resistance value of 20 / or less. When film thicknesses of the first and second films are .sub.1 nm and .sub.2 nm respectively, and when, in the glass plate, a haze value measured from the first surface side for a configuration provided with the first film only is H.sub.1 (%), and a haze value measured from the second surface side for a configuration provided with the second film only is H.sub.2 (%), a value of .sub.1 divided by H.sub.1 is 500 or more but 1200 or less, and a value of .sub.2 divided by H.sub.2 is 300 or more but 750 or less.

The low-reflection coating of the present invention is adapted to be provided on at least one principal surface of a substrate. The low-reflection coating is a porous film having a thickness of 80 to 800 nm, the porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 600 nm; and a binder containing silica as a main component and containing a hydrophobic group, the fine silica particles being bound by the binder. The low-reflection coating contains 35 to 70 mass % of the fine silica particles, 25 to 64 mass % of the silica of the binder, and 0.2 to 10 mass % of the hydrophobic group of the binder. The low-reflection coating produces a transmittance gain of 1.5% or more when provided on the substrate.

The invention provides low-emissivity coatings that are highly reflective of infrared radiation. The coating includes three infrared-reflection film regions, which may each comprise silver.

Low-emissivity coatings that are highly reflective to infrared-radiation. The coating includes three infrared-reflection film regions, which may each include silver.

A low-emissivity (low-E) coating includes first and second infrared (IR) reflecting layers of or including a material such as silver. The coating includes a bottom dielectric portion including a layer of or including silicon zirconium oxynitride, and a center dielectric portion including a layer of or including zinc stannate. The coating is configured to realize a combination of desirable visible transmission, consistent and low emissivity values, thermal stability upon optional heat treatment such as thermal tempering, desirable U-value, desirable LSG value, and desirable coloration and/or reflectivity values to be achieved. In certain example embodiments, an absorber layer sandwiched between a pair of dielectric layers may be provided in. Coated articles herein may be used in the context of insulating glass (IG) window units, or in other suitable applications such as monolithic window applications, laminated windows, and/or the like.

The present invention provides a lamination system comprising a substrate and a highly reflective layer, which is formed on the substrate and has a reflective index of 2.0 or greater and a thickness of 70 nm or less.