Provided is an optical film (composite tungsten oxide film containing cesium, tungsten, and oxygen), a sputtering target, and a method of producing an optical film by which film formation conditions can be easily obtained. An optical film of the present invention has transmissivity in a visible wavelength band, has absorbance in a near-infrared wavelength band, and has radio wave transparency, characterized in that the optical film comprises cesium, tungsten, and oxygen, and a refractive index n and an extinction coefficient k of the optical film at each of wavelengths [300 nm, 350 nm, 400 nm, 450 nm, . . . , 1700 nm] specified at 50 nm intervals in a wavelength region from 300 nm to 1700 nm are set respectively within specified numerical ranges.

An antireflection structure comprising a transparent substrate having a plurality of holes with U-shaped or V-shaped cross-sectional shapes perpendicular to a flat surface portion and a metal oxide film disposed on the surface portion of the transparent substrate and in the space portions formed in an upward direction from the bottom portions of holes in the transparent substrate, wherein the average diameter of the openings of the holes is 50 nm to 300 nm, the average distance between the center points of openings of the adjacent holes is 100 nm to 400 nm, and the depth of each hole from the surface portion of the substrate is 80 nm to 250 nm; and the thickness of the metal oxide film disposed in each of the space portions increases as the depth of each of the holes becomes larger, thereby reducing the difference in depth between the holes from the uppermost surface portion of the metal oxide film disposed on the surface portion to the surface portions of the metal oxide films in the space portions.

The present disclosure relates to products and methods for modifying the reflection of a light source in a fireplace and other products.

A material includes a transparent substrate coated with a stack of thin layers acting on infrared radiation including at least one functional layer. The stack includes a protective coating deposited above at least a part of the functional layer. The protective coating includes at least one lower protective layer based on titanium and zirconium, these two metals being in the metal, oxidized or nitrided form, and at least one upper protective layer of carbon, within which layer the carbon atoms are essentially in an sp.sup.2 hybridization state, located above the layer based on titanium and zirconium.

Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): ##STR00001##
(wherein R.sup.1 is a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; R.sup.2 is a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.

The present disclosure provides a glass substrate to which water repellency that is not lost by a heat treatment is imparted. Provided is a water-repellent-film-attached glass article including a glass substrate and a water-repellent film on the glass substrate. The water-repellent film includes cerium oxide, a contact angle of water on a surface of the water-repellent film is 75° or greater, and the contact angle is 75° or greater after the glass article is exposed to a thermal treatment at 760° C. for 4 minutes.

The invention relates to a glass substrate for chemical strengthening where a surface is coated by magnetron sputtering with a temporary thin film that reduces the extent of ion exchange upon chemical strengthening and where the temporary thin film can be removed after the chemical strengthening by treatment with an etchant solution. Other embodiments relate to a method for making a chemically strengthened glass substrate with controlled curvature comprising: providing a substrate with opposed surfaces that are durable to a given etchant solution, forming a temporary thin film upon at least part of a surface of the glass substrate, chemically strengthening the glass substrate bearing the temporary thin film, and removing the temporary thin film after said chemical strengthening with said etchant solution. The thickness of the temporary thin film is chosen such that a controlled curvature is obtained upon chemical strengthening.

Described are thermochromic materials. Described thermochromic materials include materials comprising vanadium (IV) oxide and a solid component obtained from a precursor having film-forming properties. Also described are preparation methods for thermochromic materials.

A material includes a glass sheet coated on at least part of one of its faces with a stack of thin layers, the stack being coated on at least part of its surface with an enamel layer including zinc and less than 5% by weight of bismuth oxide, the stack further including, in contact with the enamel layer, a layer, called contact layer, which is based on an oxide, the physical thickness of the contact layer being at least 5 nm.

The present invention relates to a transparent substrate comprising a multiple layer coating stack and the use of same in the manufacture of a double glazing unit, wherein the multiple layer coating stack comprises, n functional metal layer, m; and n plus 1 (n+1) dielectric layer, d, wherein the dielectric layers are positioned before and after each functional metal layer, and wherein n is the total number of functional metal layer in the stack counted from the substrate and is greater than or equal to 3; and wherein each dielectric layer comprises one or more layers, characterized in that the geometrical layer thickness of each functional metal layer in the coating stack Gm, is greater than the geometrical layer thickness of each functional metal layer appearing before it in the multiple layer coating stack, that is, Gmi+1>Gm.sub.i wherein i is the position of the functional metal layer in the coating stack counted from the substrate, and wherein for each dielectric layer d located before and after each functional metal layer m, the optical layer thickness of each dielectric layer (opln) is greater than or equal to the optical layer thickness of the dielectric layer (opln−1) positioned before it in the coating stack with the proviso that: twice the optical layer thickness of the first dielectric layer (opl.sub.1) in the coating stack, is less than the optical layer thickness of the second dielectric layer (opl.sub.2) in the coating stack, that is, (2×opl.sub.1)<opl.sub.2; and twice the optical layer thickness of the last dielectric layer (opl.sub.n+1) in the coating stack, is greater than the thickness of the optical layer thickness of the penultimate dielectric layer (opl.sub.n), that is, (opl.sub.n)<(opl.sub.n+1)×2.