Described herein are various articles that have anti-reflection properties, along with methods for their manufacture and use. The anti-reflection properties are imparted by way of an integral anti-reflection component on a surface of the articles. The articles exhibit a specular reflectance that is less than or equal to about 85 percent of a specular reflectance of the glass substrate alone when measured at wavelengths of about 450 nanometers to about 750 nanometers. The article may also exhibit a specular reflectance of less than 4 percent across the same spectrum.

Embodiments of a article including include a substrate and a patterned coating are provided. In one or more embodiments, when a strain is applied to the article, the article exhibits a failure strain of 0.5% or greater. Patterned coating may include a particulate coating or may include a discontinuous coating. The patterned coating of some embodiments may cover about 20% to about 75% of the surface area of the substrate. Methods for forming such articles are also provided.

A translucent structure includes a translucent substrate and an antireflection layer provided on a visible side of the translucent substrate so that reflectivity of the translucent structure based on an SCI method is 3% or less. A visible-side outermost surface of the translucent structure includes a concave and convex structure as follows. The concave and convex structure includes a first convex portion and a second convex portion. The first convex portion has a diameter exceeding 10 m and 185 m or less in a specific section, and a specific maximum height is 0.2 to 8 m. The second convex portion has a diameter exceeding 1 m in a specific section, the number thereof is 0.0001 to 1.2 per 1 m.sup.2, and a specific average height thereof is 0.1 to 8 m.

A glass wafer having a first major surface, a second major surface that is parallel to and opposite of the first major surface, a thickness between the first major surface and the second major surface, and an annular edge portion that extends from an outermost diameter of the glass wafer toward the geometrical center of the glass wafer. The glass wafer has a diameter from greater than or equal to 175 mm to less than or equal to 325 mm and a thickness of less than 0.350 mm. A width of the edge portion is less than 10 mm.

Provided is a manufacturing method for a thin phosphor glass plate by which a thin phosphor glass plate can be more certainly produced. A manufacturing method includes the steps of: preparing a phosphor glass base material 21 having a first principal surface 21a and a second principal surface 21b opposed to each other; placing the phosphor glass base material 21 on a stage 22 and fixing the second principal surface 21b onto the stage 22; and polishing the first principal surface 21a of the phosphor glass base material 21 with a polishing member 23 including an abrasive layer 24.

The coated glass sheet of the present invention includes: a glass sheet; and a coating film provided on at least one principal surface of the glass sheet. The coating film includes a dense layer and a porous layer. The dense layer is positioned between the porous layer and the glass sheet.

The invention provides a dust repellant and anti-reflective inorganic coating and the method for preparing the coating. The dust repellant and anti-reflective inorganic coating includes nano-porous silica (SiO.sub.2) network of about 5 nm to about 35 nm and is characterized by cracks. The method of preparing the dust repellant and anti-reflective inorganic coating on a substrate includes mixing of aqueous SiO.sub.2 solution with a solvent. The aqueous SiO.sub.2 solution with the solvent is stirred to form a solution. The solution is coated on the substrate to form a film on the surface of the substrate. Thereafter, the film is annealed by heating the film to a temperature of about 500 C. to about 700 C. within a period of about 2 minutes to about 2 hours. Finally, the film is allowed to cool down.

Curable film-forming sol-gel compositions that are essentially free of inorganic oxide particles are provided. The compositions contain: a tetraalkoxysilane; a solvent component; and non-oxide particles, and further contain either i) a mineral acid or ii) an epoxy functional trialkoxysilane and a metal-containing catalyst. Coated articles demonstrating antiglare properties are also provided, comprising: (a) a substrate having at least one surface; and (b) a cured film-forming composition applied thereon, formed from a curable sol-gel composition comprising a silane and non-oxide particles. A method of forming an antiglare coating on a substrate is also provided. The method comprises: (a) applying a curable film-forming sol-gel composition on at least one surface of the substrate to form a coated substrate; and (b) subjecting the coated substrate to thermal conditions for a time sufficient to effect cure of the sol-gel composition and form a coated substrate with a sol-gel network layer having anti-glare properties.

Provided is a fireproof glue solution matrix and a preparation method thereof and a fireproof glue solution and a preparation method thereof. The fireproof glue solution matrix comprises silicon dioxide and also comprises a lubricating substance, wherein the lubricating substance is a copolymer of aromatic olefin and/or acrylic ester. The fireproof glue solution comprises the fireproof glue solution matrix. The fireproof glue solution prepared by the present invention has a viscosity of only 50-1000 cp, and is suitable for preparing laminated fireproof glass with a fireproof layer of thickness of less than 1 mm. In addition, the fireproof layer made of the fireproof glue solution has advantages of good fireproof and heat-insulating properties, high in hardness, high transmittance and good ultraviolet resistance performance.

The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.