Patent classifications
C03C2218/115
CURVED SUBSTRATE WITH FILM, METHOD FOR PRODUCING THE SAME, AND IMAGE DISPLAY DEVICE
A curved substrate with a film includes a substrate having a first main surface, a second main surface and an end surface, and an antiglare film provided on the first main surface. The substrate has a flat portion and a bent portion. A value obtained by dividing a reflected-image diffusibility index value R of the bent portion by the sum of the reflected-image diffusibility index value R of the bent portion and a reflected-image diffusibility index value R of the flat portion is 0.3 or higher and 0.8 or less.
POROUS GLASS ATOMIZATION CORE, PRODUCTION METHOD THEREFOR AND ELECTRONIC ATOMIZER
A production method for a porous glass atomization core includes: S1: producing porous glass by: scheme one: a production method for the porous glass including: mixing glass powder, a fiber component, a pore-forming agent, and an additive phase to produce a green body, and performing debinding and sintering to obtain the porous glass; or scheme two: a production method for the porous glass including: mixing glass powder, a fiber component, and a pore-forming agent to produce a green body, and performing debinding and sintering to obtain the porous glass; and S2: using the porous glass as a substrate, and arranging a heating unit on the substrate.
Methods of forming an antireflective layer on a complex substrate and complex substrates having the antireflective layer
Described herein are antireflective layers, methods for forming antireflective layers, and structures including antireflective layers. Methods are included for forming a durable antireflective layer on the surface of a substrate, wherein the substrate has a complex three-dimensional shape, wherein the durable antireflective layer comprises a uniform monolayer of silica nanoparticles interconnected by SiO.sub.2, a uniform monolayer of silica nanoparticles bonded to the surface of the substrate, or a combination thereof.
Methods for forming an electrodeposited coating over a coated substrate and articles made thereby
A coated article includes a non-conductive substrate, such as glass. At least one conductive coating is formed over at least a portion of the substrate, such as by chemical vapor deposition or physical vapor deposition. The conductive coating can be a functional coating and can have a thickness in the range of greater than 0 to less than 25,000 , such as less than 10,000 . At least one polymeric coating is electrodeposited over at least a portion of the conductive coating.
ANTIGLARE FILM-COATED SUBSTRATE, METHOD FOR ITS PRODUCTION, AND ARTICLE
To provide a production method capable of producing an antiglare film-coated substrate having excellent antiglare performance in a short time, an antiglare film-coated substrate having excellent antiglare performance, and an article provided with the substrate. A method for producing an antiglare film-coated substrate 1 comprising a substrate 3 and an antiglare film 5 formed on the substrate 3, characterized by comprising a step of preparing a coating composition comprising at least one of a silica precursor (A) and particles (C), and a liquid medium (B), wherein the liquid medium (B) contains a liquid medium (B1) having a boiling point of at most 150 C. in an amount of at least 86 mass % based on the total amount of the liquid medium (B), a step of electrically charging and spraying the coating composition by using an electrostatic coating apparatus having an electrostatic coating gun having a rotary atomizing head, to apply it on the substrate 3 to form a coating film, and a step of firing the coating film to form an antiglare film 5.
BIAS-FREE DRIVEN ION ASSISTED PHOTOELECTROCHEMICAL WASTEWATER TREATMENT SYSTEM AND METHOD
A bias-free driven ion-based photoelectrochemical wastewater treatment system and method is disclosed. Through an ion-coupled photogenerated electron-assisted photocatalytic oxidation-reduction pathway, the system achieves efficient treatment of high-salinity wastewater. The system employs electron-ion receptor materials as the counter electrode, providing reaction sites to drive the coupling of photogenerated electrons and cation transfer. Additionally, the voltage generated by the system directly drives hole oxidation to produce strong oxidizing free radicals. Furthermore, this ion-based photoelectrochemical system demonstrates excellent degradation performance in high-concentration chloride media. This indicates that, in addition to cations (such as Na+) helping to accelerate the electron transfer rate, the presence of Cl further enables efficient and sustainable wastewater treatment. The concept proposed in this invention emphasizes the potential for using abundant sodium chloride in seawater as an inexpensive additive for wastewater treatment.
METHODS OF FORMING AN ANTIREFLECTIVE LAYER ON A COMPLEX SUBSTRATE AND COMPLEX SUBSTRATES HAVING THE ANTIREFLECTIVE LAYER
Described herein are antireflective layers, methods for forming antireflective layers, and structures including antireflective layers. Methods are included for forming a durable antireflective layer on the surface of a substrate, wherein the substrate has a complex three-dimensional shape, wherein the durable antireflective layer comprises a uniform monolayer of silica nanoparticles interconnected by SiO.sub.2, a uniform monolayer of silica nanoparticles bonded to the surface of the substrate, or a combination thereof.
METHOD FOR MANUFACTURING WIRING SUBSTRATE
A method for manufacturing a wiring substrate includes preparing a glass substrate having one or more product areas formed on surface, and forming a build-up part including conductor layers and insulating layers on the surface of the substrate across the product areas. The product areas have a rectangular shape with each side in range of 80 mm to 240 mm, the forming the build-up part includes alternately laminating three or more conductor layers and three or more insulating layers such that each insulating layer has elongation rate of 7% or more, the laminating the conductor layers includes forming a resist layer having a resist pattern and forming a conductor pattern including wirings according to the pattern such that the wirings have minimum width of 2 m or less and minimum inter-wiring distance of 2 m or less, and the forming the resist includes exposing the resist by direct imaging exposure.
GLASS METALLIZATION PROCESS FOR THROUGH GLASS VIAS WITH HIGH ASPECT RATIO
The present invention relates to a glass metallization process for through glass vias with a high aspect ratio. The process includes a single-sided coating step, a bonding step, a drilling step, a pre-lubricating step and a metallization step; or a drilling step, a single-sided coating step, a bonding step, a pre-lubricating step and a metallization step. Since the walls of the first and second glass substrates, the first and second seed layers and a bonding layer at the vias have undergone a pre-lubricating process, it is easy for the growth of the metal material during the electroplating process. Also, the metal material grows outward from a center of the stacked structure of the first and second glass substrates to completely fill the vias, thereby being able to be applied to vias with a higher aspect ratio without creating air gaps, making the electroplating process simpler and improving the electroplating yield.
ELECTRODEPOSITION SMART WINDOW WITH IMPROVED LIGHT BLOCKING EFFICIENCY
An electrodeposition smart window exhibits superior light blocking efficiency compared to conventional smart windows, thereby enabling a significant change in light transmittance even with a small current, and is thus highly advantageous in terms of energy efficiency.