A composition for forming film having wrinkle structure and a method of forming the film are disclosed. The composition includes photo-curable agent and photoinitiator dissolved in the photo-curable agent. The cut off wavelength of light transmittance of the photo-curable agent is greater than the cut off wavelength of light absorbance of the photoinitiator. Photo-cured thin film is formed at the upper portion of composition layer at an initial time period of irradiation. By subsequent contraction, the photo-cured thin film forms wrinkles. The wrinkle structure is controlled by the relation of the cut off wavelength of light transmittance of the photo-curable agent and the cut off wavelength of light absorbance of the photoinitiator, the photo-curing rate of the composition and the thickness of the composition layer, and the photoinitiator concentration, etc., before photo-curing. The film may increase the emission efficiency of LED and OLED and the sensing effect of sensor.

An optical element comprises an antireflective layer that is disposed on and in contact with a substrate. The antireflective layer has a refractive index of greater than 1 to less than 1.41 and has a pore size ranging from greater than 0 to less than 300 nm. The antireflective layer includes an outermost surface having a water contact angle ranging from greater than or equal to 70 to less than or equal to 120 as determined using ASTM 5946-04.

An antifouling structure of the present invention includes a microporous layer and an antifouling liquid on a base. The microporous layer includes a liquid retaining portion that is formed at a surface part of the microporous layer, and a liquid ejecting portion that is formed at an inner part of the microporous layer and has a lower affinity for the antifouling liquid than the liquid retaining portion. The film thickness of the liquid retaining portion is within the range of 1/100 to 1/50 of the liquid ejecting portion, where T is the film thickness of the liquid ejecting portion.

A coated glass substrate is disclosed as well as a method of making the coated glass substrate. The coated glass substrate contains a glass substrate and a coating containing a hybrid network comprising at least two oxides. The coating exhibits a coefficient of friction of less than 0. 12 when measured according to ASTM D7027. The coating exhibits a critical scratch load of at least about 10 kg as measured according to ASTM test C1624-05.

A process of forming a mixed metal oxide solid is provided. The process includes the steps of obtaining a precursor composition comprising at least two metal or metalloid-containing compounds, the metal or metalloid of the at least two compounds being different, one from the other; and allowing the at least two metal or metalloid-containing compounds of the precursor composition to at least partially react by hydrolysis and/or condensation. The at least two metal or metalloid-containing compounds may have different points of zero charge (PZC). Further material or articles comprising a substrate or material coated with or otherwise in physical connection to the mixed metal oxide solid formed according to the process are also provided.

The present invention relates to silicon coated metal microparticles in which at least a part of a surface of a metal microparticle composed of at least one of metal elements or metalloid elements is coated with silicon, wherein the silicon coated metal microparticles are a product obtained by a reduction treatment of silicon compound coated precursor microparticles in which at least a part of a surface of a precursor microparticle containing a precursor of the metal microparticles is coated with a silicon compound, or silicon doped precursor microparticles containing a precursor of the metal microparticles. Because it is possible particularly to strictly control a particle diameter of the silicon compound coated metal microparticle by controlling conditions of the reduction treatment, design of a more appropriate composition can become facilitated, compared with a conventional composition, in terms of diversified usages and desired properties of silicon compound coated metal microparticles.

The present invention relates to a method for manufacturing a thin film of nanomaterial, the method comprising forming a non-precipitating dispersion solution of nano-particles in a solvent, centrifuging the dispersion solution at a controlled temperature, pressure, and centrifugation velocity and using a combination of centrifugal/centripetal force, hydrodynamic friction force, and weak interactive forces (Van der Waals and similar) in centrifuging manner to form a thin film over the substrate.

Provided is a laminate that can be implemented with a wide processing margin and without adhesive residue or damage to a semiconductor element in the transfer of the semiconductor element using laser light of various wavelengths. The laminate is obtained by laminating a substrate 1 having laser permeability, a resin film 1 and a resin film 2 in this order, wherein the light absorbance of the resin film 1 calculated for a film thickness of 1.0 ?m at any wavelength of 200 nm to 1100 nm is 0.4-5.0, and the adhesive strength of the surface of the resin film 2 on the side opposite that of the resin film 1 side is 0.02-0.3 N/cm.

The present invention provides a low-alkali or alkali-free glass for laser processing, the glass reducing occurrence of laser irradiation-induced cracks and allowing formation of circular through holes. The present invention relates to the glass for laser processing, the glass having a glass composition including, in mol %: 45.0%SiO.sub.270.0%; 2.0%B.sub.2O.sub.320.0%; 3.0%Al.sub.2O.sub.320.0%; 0%ZnO9.0%; and (I) 0.1%CuO2.0% and 0%TiO.sub.215.0%; or (II) 0.1%TiO.sub.2<5.0% and 0%CuO<0.1%, wherein, in the case of (II), a metal oxide serving as a coloring component is further included, a relationship of 0Li.sub.2O+Na.sub.2O+K.sub.2O<2.0% is satisfied, either of principal surfaces of the glass has a layer containing fine particles, and the fine particles have an average particle diameter of 10 nm or more and less than 1.0 m.

The present invention relates to silicon-compound-coated fine metal particles, with which surfaces of fine metal particles, composed of at least one type of metal element or metalloid element, are at least partially coated with a silicon compound and a ratio of SiOH bonds contained in the silicon-compound-coated fine metal particles is controlled to be 0.1% or more and 70% or less. By the present invention, silicon-compound-coated fine metal particles that are controlled in dispersibility and other properties can be provided by controlling the ratio of SiOH bonds or the ratio of SiOH bonds/SiO bonds contained in the silicon-compound-coated fine metal particles. By controlling the ratio of SiOH bonds or the ratio of SiOH bonds/SiO bonds, a composition that is more appropriate for diversifying applications and targeted properties of silicon-compound-coated fine metal particles than was conventionally possible can be designed easily.