C03C2218/151

SILANE COMPOUND CONTAINING PERFLUOROPOLYETHER GROUP, PREPARATION METHOD THEREFOR, SURFACE TREATMENT AGENT AND PRODUCT THEREOF
20210214495 · 2021-07-15 ·

The present invention relates to a perfluoropolyether group-containing silane compound represented by formula (1): RfX.sup.1X.sup.2NQ.sub.kT.sub.2-k (1), and a method for preparing the same. The present invention also relates to a perfluoropolyether group-containing silane compound represented by formula (2),

##STR00001##

and a method for preparing the same. The present invention also relates to a perfluoropolyether group-containing silane compound represented by formula (3),

##STR00002##

and a method for preparing the same. The perfluoropolyether group-containing silane compound of the present invention can be used for a surface treatment agent so that the substrates such as glass etc processed by the surface treatment agent are excellent in anti-fouling, anti-fingerprint, scrape resistant and abrasion resistant performances. Moreover, the preparation method of each of the compounds of the present invention is simple in process, easy to operate and implement.

ANTIREFLECTIVE MEMBER AND METHOD OF MANUFACTURE THEREFOR

Provided is an antireflective member that has a water- and oil-repellent layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellent properties, and durability. The surface of the multi-layered antireflective layer on a base material has a root-mean-square surface roughness of 0.8 nm to 2.0 nm. The water- and oil-repellent layer has a thickness of 1 to 30 nm and is a cured product of water- and oil-repellents having as principal components a fluorooxyalkylene group-containing polymer modified organosilicon compound with the numerical average molecular weight of 4,500 to 10,000 of a fluoropolymer part and/or partial hydrolysis condensate thereof.

Metal oxide film and semiconductor device

A metal oxide film includes indium, M, (M is Al, Ga, Y, or Sn), and zinc and includes a region where a peak having a diffraction intensity derived from a crystal structure is observed by X-ray diffraction in the direction perpendicular to the film surface. Moreover, a plurality of crystal parts is observed in a transmission electron microscope image in the direction perpendicular to the film surface. The proportion of a region other than the crystal parts is higher than or equal to 20% and lower than or equal to 60%.

PERFLUOROPOLYETHER COMPOUND CONTAINING CARBOXYL GROUP

The present invention relates to a carboxyl group containing perfluoropolyether compound of formula (I): RfX.sup.1X.sup.2(I). In the formula RfX.sup.1X.sup.2(I), Rf represents F(CF.sub.2).sub.m(OC.sub.4F.sub.8).sub.p(OC.sub.3F.sub.6).sub.q(OC.sub.2F.sub.4).sub.r(OCF.sub.2).sub.sOC(Z)F(CF.sub.2).sub.n, wherein p, q, r and s are each independently an integer of 0 or more and 200 or less, and the sum of p, q, r and s is at least 1; in the formula, the occurrence order and number of the respective repeating units in parentheses with the subscript p, q, r or s are arbitrary in the formula; m and n are each independently an integer of 0 or more and 30 or less, Z is F or CF.sub.3; X.sup.1 represents a divalent organic group; and X.sup.2 represents a COOH group.

COMPOUND HAVING ISOCYANURIC SKELETON AND COMPOSITION IN WHICH SAID COMPOUND IS INCLUDED

A compound represented by the following formula (1):

##STR00001##

wherein R.sup.1 is a monovalent organic group containing a polyether chain; X.sup.1 and X.sup.2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: (OC.sub.6F.sub.12).sub.m11(OC.sub.5F.sub.10).sub.m12(OC.sub.4F.sub.8).sub.m13(OC.sub.3X.sup.10.sub.6).sub.m14(OC.sub.2F.sub.4).sub.m15(OCF.sub.2).sub.m16, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X.sup.10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R.sup.1 being other than those containing a urethane bond.

Particle reduction during sputtering deposition

Described herein are apparatuses and methods for holding a substrate in a position that minimizes particle contamination of the substrate when the substrate is being coated. Along with the apparatus, processes for reducing particle reduction on substrates are provided. The articles and processes described herein are useful in making coated glass substrates, such as used in electrochromic, photochromic, or photovoltaic technologies.

PERFLUOROPOLYETHER GROUP-CONTAINING SILANE COMPOUND, PREPARATION METHOD THEREOF, SURFACE TREATMENT AGENT AND ARTICLE
20200407378 · 2020-12-31 ·

The present invention relates to a perfluoropolyether group-containing silane compound represented by formula (1): RfX.sup.1X.sup.2NQ.sub.kT.sub.2-k, (1), and a method for preparing the same. The present invention also relates to a perfluoropolyether group-containing silane compound represented by formula (2),

##STR00001##

and a method for preparing the same. The present invention also relates to a perfluoropolyether group-containing silane compound represented by formula (3),

##STR00002##

and a method for preparing the same. The perfluoropolyether group-containing silane compound of the present invention can be used for a surface treatment agent so that the substrates such as glass etc processed by the surface treatment agent are excellent in anti-fouling, anti-fingerprint, scrape resistant and abrasion resistant performances. Moreover, the preparation method of each of the compounds of the present invention is simple in process, easy to operate and implement.

Treating sulfide glass surfaces and making solid state laminate electrode assemblies

Methods for making solid-state laminate electrode assemblies include methods of forming a solid electrolyte interphase (SEI) by ion implanting nitrogen and/or phosphorous into the glass surface by ion implantation.

MASK DEVICE AND MANUFACTURING METHOD THEREOF, EVAPORATION SYSTEM
20200384497 · 2020-12-10 ·

The present disclosure provides a mask device and a manufacturing method thereof, and an evaporation system. The mask device includes a frame, strip alignment plates and a strip support plate, hollow portions are provided in the strip alignment plates, and the strip alignment plates are fixed on the frame; the strip support plate and the strip alignment plates cross each other, a plurality of welding spots are provided on the surface of the strip support plate proximal to the frame, and are welded and fixed to the frame, and the plurality of welding spots are provided in the region of the strip support plate corresponding to the hollow portions.

PROTECTIVE HOUSING FOR A SENSING DEVICE

A detection device includes (a) a LiDAR sensing device and (b) a housing enclosing the LiDAR sensing device, the housing including at least one cover lens. At least a portion of the cover lens is made of at least one glass sheet having an absorption coefficient lower than 5 m.sup.1 in the wavelength range from 750 to 1650 nm. The cover lens helps to protect the LiDAR sensing device from external degradation.