Provided is a radiative cooling device that provides coloration of the radiative surface while maximally avoiding reduction in its radiative cooling performance due to absorption of solar light. An infrared radiative layer for radiating infrared light from a radiative surface and a light reflective layer disposed on the side opposite to the presence side of the radiative surface of the infrared radiative layer are provided in a mutually stacked state. The light reflective layer is arranged such that a first metal layer made of silver or silver alloy and having a thickness equal to or greater than 10 nm and equal to or less than 100 nm, a transparent dielectric layer and a second metal layer reflecting light transmitted through the first metal layer and the transparent dielectric layer are stacked in this order on the side closer to the infrared radiative layer. The transparent dielectric layer has a thickness that causes a resonance wavelength of the light reflective layer to be a wavelength included in wavelengths equal to or greater than 400 nm and equal to or less than 800 nm.

A coated glass pane and a method of preparing same comprising at least the following layers in sequence: a glass substrate; a lower anti-reflection layer, a silver-based functional layer; a barrier layer; an upper dielectric layer; and a topmost dielectric layer which comprises an oxide of zinc (Zn), tin (Sn) and zirconium (Zr); and wherein the amount of zirconium in the topmost dielectric layer comprises at least 10 atomic percent zirconium.

Methods of bonding substrates are provided, including forming a thin film of a metal oxide on a bonding surface of both or either of a pair of substrates, at least one of which is a transparent substrate, and contacting the bonding surfaces of the pair of substrates with each other via the thin film of the metal oxide.

A transparent substrate provided with a multi-layered coating is provided, the coating including the following in an order from the substrate: a first dielectric film including one or more dielectric layers, a first metallic protective layer, a first metallic layer having an infrared (IR) reflection characteristic, a second metallic protective layer, a second dielectric film including two or more dielectric layers, a third metallic protective layer, a second metallic layer having an infrared (IR) reflection characteristic, a fourth metallic protective layer, and a third dielectric film D3 including one or more dielectric layers, wherein the dielectric layer includes a metal oxide, a metal nitride, or a metal oxynitride, the metallic layer is silver (Ag) or a silver (Ag)-containing metal alloy, a normal emissivity is 2.0% or less, and a difference between a coated surface reflectance and an uncoated surface reflectance is 21% or more.

A coated article is provided with a low-emissivity (low-E) coating on a glass substrate. The low-E coating includes an infrared (IR) reflecting layer between at least a pair of dielectric layers. The IR reflecting layer may be of silver or the like. The coating is designed so as to provide a highly transparent coated article that is thermally stable upon optional heat treatment and which can be made to have a low emissivity in a consistent manner. The coating is designed to have improved IR reflecting layer quality, and thus reduced tolerances with respect to manufacturability of desired emissivity values. The coated article may be used in monolithic window applications, IG window applications, or the like.

A glass carrier-attached copper foil is provided that can achieve a desired circuit mounting board that reduces separation of a copper layer at the cut edge even if the copper foil is downsized to dimensions enabling mount of a circuit, and has an intended circuit pattern with a fine pitch. The glass carrier-attached copper foil includes a glass carrier, a release layer, and a copper layer with a thickness of 0.1 to 3.0 m. The glass carrier has, at least on its surface having the copper layer thereon, a plurality of flat regions each having a maximum height Rz of less than 1.0 m as measured in accordance with JIS B 0601-2001 and a rough region having a maximum height Rz of 1.0 to 30.0 m as measured in accordance with JIS B 0601-2001. The rough region has a pattern of lines that define the flat regions.

A color conversion element includes: a phosphor layer that includes at least one type of phosphor; a reflecting layer stacked on the phosphor layer; a substrate disposed in a position opposite to the reflecting layer; a joining portion interposed between the reflecting layer and the substrate for joining the reflecting layer and the substrate; and an absorbing portion disposed above a principal surface of the substrate closer to the joining portion. The absorbing portion is covered with the joining portion and absorbs laser light having a wavelength that excites the phosphor.

A method of fabricating a semiconductor device, which includes a separation step and has a high yield, is provided. A metal layer is formed over a substrate, fluorine is supplied to the metal layer, and the metal layer is then oxidized, whereby a metal compound layer is formed. A functional layer is formed over the metal compound layer, heat treatment is performed on the metal compound layer, and the functional layer is separated from the substrate with use of the metal compound layer. By performing first plasma treatment using a gas containing fluorine, fluorine can be supplied to the metal layer. By performing second plasma treatment using a gas containing oxygen, the metal layer supplied with fluorine can be oxidized.

The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.

An article having a nanostructured surface and a method of making the same are described. The article can include a substrate and a nanostructured layer bonded to the substrate. The nanostructured layer can include a plurality of spaced apart nanostructured features comprising a contiguous, protrusive material and the nanostructured features can be sufficiently small that the nanostructured layer is optically transparent. A surface of the nanostructured features can be coated with a continuous hydrophobic coating. The method can include providing a substrate; depositing a film on the substrate; decomposing the film to form a decomposed film; and etching the decomposed film to form the nanostructured layer.