The present invention provides a lamination system comprising a substrate and a highly reflective layer, which is formed on the substrate and has a reflective index of 2.0 or greater and a thickness of 70 nm or less.

A process for the manufacture of a heat strengthened glass substrate, includes the application of a temporary layer including a polymer on a glass substrate including a glass sheet, then the application to the glass substrate coated with the temporary layer of a treatment for the heat strengthening of the glass including heating, leading to the removal of the temporary layer, and then cooling by blowing of air through nozzles. The glass substrate thus obtained exhibits a reduced level of iridescences.

A laminated glass for a window, comprising: a first glass sheet layer comprising a first main surface to face an outside of the window and a second main surface facing other layers; a second glass sheet layer comprising a third main surface facing other layers and a fourth main glass surface to face a room side; an IR-reflective coating layer, comprising at least one silver layer, on a whole area of at least one of the second and third main surfaces; a first intermediate polymer film layer between the first and the second glass sheet layers; and a sealant on all the way through an edge portion of the IR-reflective coating layer.

Provided is an optical member which includes: a substrate; and a laminated structure including two or more kinds of layers having different materials which are disposed on the substrate, in which the number of layers constituting the laminated structure is 10 or more, the maximum layer thickness of the layers constituting the laminated structure is 8 nm or less, and the minimum transmittance in a wavelength range of 400 nm to 800 nm or in a wavelength range of 6 m to 12 m is 10% or more.

Coated articles include two or more functional infrared (IR) reflecting layers optionally sandwiched between at least dielectric layers. The dielectric layers may be of or including silicon nitride or the like. At least one of the IR reflecting layers is of or including titanium nitride (e.g., TiN) and at least another of the IR reflecting layers is of or including indium-tin-oxide (ITO).

Insulated glazing units comprising first and second sheets of glazing material with a low pressure space there between are described. The major surface of the second sheet of glazing material not facing the low pressure space has a low emissivity coating comprising at least one layer of fluorine doped tin oxide thereon. There is a first anti-iridescence coating between the low emissivity coating and the second sheet of glazing material. Also described are insulated glazing units comprising three (first, second and third) sheets of glazing material with a low pressure space between first and second sheets of glazing material, and a second space between the first and third sheets of glazing material. There is a low emissivity coating on one or both major surfaces facing the low pressure space. The third sheet of glazing material has a low emissivity coating on both opposed major surfaces thereof.

Certain example embodiments of this invention relate to techniques for converting sputter-deposited TiNx or TiOxNy layers into TiOx layers via activation with electromagnetic radiation. An intermediate layer including TiOxNy, 0<y1 is formed on a substrate. The intermediate layer is exposed to the radiation, which is preferentially absorbed by the intermediate layer in an amount sufficient to heat the intermediate layer to a temperature of 500-650 degrees C. while keeping the substrate at a significantly lower temperature. A flash light operated with a series of millisecond or sub-millisecond length pulses may be used in this regard. The converting removes nitrogen from, and introduces oxygen into, the intermediate layer, causing the layer to expand beyond its initial thickness. At least some of the final layer may have an anatase phase, and it may be photocatalytic. These layers may be used in low-maintenance glass, antireflective, and/or other applications.

There is provided a carrier-attached metal foil in which the metal layer is less likely to be released at the ends of the carrier-attached metal foil or in the cutting place(s) of a downsized carrier-attached metal foil, and moreover a decrease in the strength of the carrier is effectively suppressed. This carrier-attached metal foil includes a carrier; a release layer provided on the carrier; and a metal layer having a thickness of 0.01 m or more and 4.0 m or less provided on the release layer. The carrier has a flat region having a developed interfacial area ratio Sdr of less than 5%, and an uneven region having a developed interfacial area ratio Sdr of 5% or more and 39% or less, on at least a surface on the metal layer side, and the uneven region is provided in a linear pattern surrounding the flat region.

Apparatus for depositing one or more variable interference filters onto one or more substrates comprises a vacuum chamber, at least one magnetron sputtering device and at least one movable mount for supporting the one or more substrates within the vacuum chamber. The at least one magnetron sputtering device is configured to sputter material from a sputtering target towards in the mount, thereby defining a sputtering zone within the vacuum chamber. At least one static sputtering mask is located between the sputtering target and the mount. The at least one static sputtering mask is configured such that, when each substrate is moved through the sputtering zone on the at least one movable mount, a layer of material having a non-uniform thickness is deposited on each said substrate.

A substrate having a coating is disclosed. The coating is formed of a plurality of layers. A base layer of the plurality of layers includes an alloy, and at least two additional layers include silver. A coating for a substrate is also disclosed. A method of coating a substrate is further disclosed.