Disclosed herein are systems, methods, and apparatus for forming low emissivity panels. In some embodiments, a partially fabricated panel may be provided that includes a substrate, a reflective layer formed over the substrate, and a barrier layer formed over the reflective layer such that the reflective layer is formed between the substrate and the barrier layer. The barrier layer may include a partially oxidized alloy of three or more metals. A first interface layer may be formed over the barrier layer. A top dielectric layer may be formed over the first interface layer. The top dielectric layer may be formed using reactive sputtering in an oxygen containing environment. The first interface layer may prevent further oxidation of the partially oxidized alloy of the three or more metals when forming the top dielectric layer. A second interface layer may be formed over the top dielectric layer.

Certain example embodiments of this invention relate to insulating glass (IG) units including three substantially parallel spaced apart glass substrates, wherein at least two of the surfaces include low-emissivity (low-E) coatings and at least some of the non-low E coated surfaces have antireflective (AR) coatings disposed thereon. In certain example embodiments, low-E coatings are provided on the second and fifth surfaces of the IG unit, and each internal surface of the IG unit that does not support a low-E coating does support an AR coating. Additional AR coatings may be provided on one or both of the outermost surfaces in certain example embodiments. In some cases, the center substrate need not be heat treated because of the reduced absorption enabled by providing the low-E coatings on the two outermost substrates, as well as the reduced heat accumulation in the center lite itself and in the two adjacent spacers.

A laminate includes: a near infrared light absorbing layer that includes a near infrared absorbing colorant; and a color filter layer that is arranged adjacent to the near infrared light absorbing layer in a thickness direction and includes a chromatic colorant, in which in at least one of the near infrared light absorbing layer or the color filter layer, a content of a compound in which an acid group selected from a sulfo group, a phosphate group, or a carboxyl group is bonded to a colorant skeleton is 0.1 to 99.9 mass % with respect to a total mass of compounds having a colorant skeleton.

Certain example embodiments relate to a coated article including at least one infrared (IR) reflecting layer of a material such as silver or the like in a low-E coating, and methods of making the same. In certain cases, at least one layer of the coating is of or includes nickel and/or titanium (e.g., Ni.sub.xTi.sub.yO.sub.z). The provision of a layer including nickel titanium and/or an oxide thereof may permit a layer to be used that has good adhesion to the IR reflecting layer, and reduced absorption of visible light (resulting in a coated article with a higher visible transmission). When a layer including nickel titanium oxide is provided directly over and/or under the IR reflecting layer (e.g., as a barrier layer), this may result in improved chemical and mechanical durability. Thus, visible transmission may be improved if desired, without compromising durability; or, durability may simply be increased.

A preparation method for a high-refractive index hydrogenated silicon film, a high-refractive index hydrogenated silicon film, a light filtering lamination and a light filtering piece. The method includes: (a) by magnetic controlled Si target sputtering, Si deposits on a base body, forming a silicon film, which (b) forms an oxygenic hydrogenated silicon film in environment of active hydrogen and active oxygen, the amount of active oxygen accounts for 4%-99% of the total amount of active hydrogen and active oxygen, or, a nitric hydrogenated silicon film in environment of active hydrogen and active nitrogen, the amount of active nitrogen accounts for 5%-20% of the total amount of active hydrogen and active nitrogen. Sputtering and reactions are separately conducted, Si first deposits on the base body by magnetic controlled Si target sputtering, and then plasmas of active hydrogen and active oxygen/nitrogen react with silicon for oxygenic or nitric SiH.

An ellipsometry system detects and/or identifies significant corrosion on glass, such as on soda-lime-silica based float glass. In certain example embodiments, there is provided a method and/or system using ellipsometry to detect and/or identify significant corrosion on soda-lime-silica based glass, so that such significantly corroded glass can be identified and not coated with a low-E coating and/or not used in applications where optical appearance is important. The ellipsometry system may be part of, or used in connection with, a sputtering apparatus/system for sputter-depositing low-E coatings on glass, so that whether to pass a piece of glass to the sputtering apparatus/system is based on whether significant corrosion is detected on the glass.

A substrate is coated on one face with a thin-films stack having reflection properties in the infrared and/or in solar radiation including a single metallic functional layer, based on silver or on a metal alloy containing silver, and two antireflection coatings. The coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflection coatings. At least one of the antireflection coatings includes an intermediate layer including zinc oxide Zn.sub.1O.sub.1+x with 0.05<x<0.3 and having a physical thickness of between 0.5 nm and 20 nm, or between 2.5 nm and 10 nm.

Certain example embodiments of this invention relate to insulating glass (IG) units including three substantially parallel spaced apart glass substrates, wherein at least two of the surfaces include low-emissivity (low-E) coatings and at least some of the non-low E coated surfaces have antireflective (AR) coatings disposed thereon. In certain example embodiments, low-E coatings are provided on the second and fifth surfaces of the IG unit, and each internal surface of the IG unit that does not support a low-E coating does support an AR coating. Additional AR coatings may be provided on one or both of the outermost surfaces in certain example embodiments. In some cases, the center substrate need not be heat treated because of the reduced absorption enabled by providing the low-E coatings on the two outermost substrates, as well as the reduced heat accumulation in the center lite itself and in the two adjacent spacers.

A process for obtaining a material includes a substrate coated with a photocatalytic coating, the process including depositing on the substrate, by sputtering, a stack of thin layers successively including a first layer of titanium metal having a thickness of from 1 to 3 nm, an intermediate layer of at least partially oxidized titanium having a thickness of from 0.5 to 5 nm, and a second layer of titanium metal having a thickness of from 2 to 5 nm; and oxidizing the stack, with the aid of a heat treatment by laser radiation, wherein the stack is in contact with an oxidizing atmosphere.

To provide a glass substrate with an antireflection film, which employs glass having high refractive index and which has excellent strength, and an optical member comprising it. A glass substrate with an antireflection film, comprising a glass substrate which consists of glass having refractive index (n.sub.d) of from 1.68 to 2.00 and which has plate thickness of from 0.01 to 2 mm, and an antireflection film formed on at least one principal plane of the glass substrate.