Provided is a silicon carbide-tantalum carbide composite having excellent durability. A silicon carbide-tantalum carbide composite (1) includes: a body (10) whose surface layer is at least partly formed of a first silicon carbide layer (12); a tantalum carbide layer (20); and a second silicon carbide layer (13). The tantalum carbide layer (20) is disposed over the first silicon carbide layer (12). The second silicon carbide layer (13) is interposed between the tantalum carbide layer (20) and the first silicon carbide layer (12). The second silicon carbide layer (13) has a C/Si composition ratio of not less than 1.2 as measured by X-ray photoelectron spectroscopy. The second silicon carbide layer (13) has a peak intensity ratio G/D of not less than 1.0 between the G-band and D-band of carbon as measured by Raman spectroscopy.

Provided is a silicon carbide-tantalum carbide composite having excellent durability. A silicon carbide-tantalum carbide composite (1) includes: a body (10) whose surface layer is at least partly formed of a first silicon carbide layer (12); a tantalum carbide layer (20); and a second silicon carbide layer (13). The tantalum carbide layer (20) is disposed over the first silicon carbide layer (12). The second silicon carbide layer (13) is interposed between the tantalum carbide layer (20) and the first silicon carbide layer (12). The second silicon carbide layer (13) has a C/Si composition ratio of not less than 1.2 as measured by X-ray photoelectron spectroscopy. The second silicon carbide layer (13) has a peak intensity ratio G/D of not less than 1.0 between the G-band and D-band of carbon as measured by Raman spectroscopy.

Provided are halogen-free coatings, and methods for making and using such halogen-free coatings, for water and oil protection or repellants, which coatings control and/or eliminate the effect of humidity and oily substances on one or more of a variety of surfaces. These coatings and methods exhibit minimal toxicity to humans, non-human animals, including pets, and the environment more generally. The presently-disclosed coatings, which do not contain a halogen component, may be suitably employed, for example, on monuments, textiles, metals, stone, ceramic, wood, or other surface.

Provided are halogen-free coatings, and methods for making and using such halogen-free coatings, for water and oil protection or repellants, which coatings control and/or eliminate the effect of humidity and oily substances on one or more of a variety of surfaces. These coatings and methods exhibit minimal toxicity to humans, non-human animals, including pets, and the environment more generally. The presently-disclosed coatings, which do not contain a halogen component, may be suitably employed, for example, on monuments, textiles, metals, stone, ceramic, wood, or other surface.

A carbon/carbon brake disk is provided. The carbon/carbon brake disk may comprise a carbon fiber, wherein the carbon fiber is formed into a fibrous network, wherein the fibrous network comprises carbon deposited therein. The carbon fiber may undergo a FHT process, wherein micro-cracks are disposed in the carbon fiber. In various embodiments, the micro-cracks may be at least partially filled with un-heat-treated carbon via a final CVD process, wherein the final CVD process is performed at a temperature in the range of up to about 1,000° C. (1,832° F.) for a duration in the range from about 20 hours to about 100 hours. In various embodiments, the un-heat-treated carbon may be configured to prevent oxygen, moisture, and/or oxidation protection systems (OPS) chemicals from penetrating the carbon/carbon brake disk. In various embodiments, the final CVI/CVD process may be configured to increase the wear life of the carbon/carbon brake disk.

The present invention relates to a chemical vapor deposition chamber article. The present invention further relates to a method of processing an article of a chemical vapor deposition chamber for manufacturing semiconductor components, as well as chemical vapor deposition chamber article obtained through such a method. In a first aspect of the invention, there is provided, a chemical vapor deposition chamber article such as a wafer carrier, for manufacturing semiconductor components, said chamber article having a body and a surface comprised of silicon carbide, characterized in that said surface is provided with a protective layer at least on parts of said surface which are subject to parasitic deposition during said manufacturing of said semiconductor components in said chamber, and wherein said protective layer comprises an oxidized surface.

The present invention relates to a chemical vapor deposition chamber article. The present invention further relates to a method of processing an article of a chemical vapor deposition chamber for manufacturing semiconductor components, as well as chemical vapor deposition chamber article obtained through such a method. In a first aspect of the invention, there is provided, a chemical vapor deposition chamber article such as a wafer carrier, for manufacturing semiconductor components, said chamber article having a body and a surface comprised of silicon carbide, characterized in that said surface is provided with a protective layer at least on parts of said surface which are subject to parasitic deposition during said manufacturing of said semiconductor components in said chamber, and wherein said protective layer comprises an oxidized surface.

Porous, electrically conductive ceramic foams incorporating continuous self-assembled graphene networks are described. The disclosed approach uses interfacial trapping to spontaneously exfoliate and assemble pristine graphite, not graphite oxide, in a ceramic sol-gel. The composite foams display electrical conductivity and joule heating, with anticipated applications as, for example, catalyst supports, thermoelectrics, and porous electrodes.

A method for depositing a decorative and/or functional layer on at least a portion of a surface of a finished or semi-finished article made of a non-conductive ceramic material, this deposition method includes the following operations: subjecting the at least a portion of the surface of the article to a carburising or nitriding treatment during which carbon, respectively nitrogen atoms, diffuse in the at least a portion of the surface of the article, then depositing, by galvanic growth of a metallic material, the decorative and/or functional layer on at least a portion of the surface of the article which has undergone the carburising or nitriding treatment.

The present disclosure provides a method for coating a composite structure, comprising forming a first slurry by combining a first pre-slurry composition with a first carrier fluid, applying the first slurry on a surface of the composite structure, and heating the composite structure to a temperature sufficient to form a base layer on the composite structure. The first pre-slurry composition may comprise a first phosphate glass composition and a low coefficient of thermal expansion material, wherein the low coefficient of thermal expansion material is a material with a coefficient of thermal expansion of less than 10×10.sup.−6° C..sup.−1.