Patent classifications
C04B41/526
Plasma spray physical vapor deposition deposited in multilayer, multi-microstructure environmental barrier coating
An article may include a substrate defining at least one at least partially obstructed surface. The substrate includes at least one of a ceramic or a ceramic matrix composite. The article also may include a multilayer, multi-microstructure environmental barrier coating on the at least partially obstructed substrate. The multilayer, multi-microstructure environmental barrier coating includes a first layer comprising a rare earth disilicate and a substantially dense microstructure; and a second layer on the first layer. The second layer includes a columnar microstructure and at least one of a rare earth monosilicate or a thermal barrier coating composition comprising a base oxide comprising zirconia or hafnia; a primary dopant comprising ytterbia; a first co-dopant comprising samaria; and a second co-dopant comprising at least one of lutetia, scandia, ceria, gadolinia, neodymia, or europia.
Plasma spray physical vapor deposition deposited in multilayer, multi-microstructure environmental barrier coating
An article may include a substrate defining at least one at least partially obstructed surface. The substrate includes at least one of a ceramic or a ceramic matrix composite. The article also may include a multilayer, multi-microstructure environmental barrier coating on the at least partially obstructed substrate. The multilayer, multi-microstructure environmental barrier coating includes a first layer comprising a rare earth disilicate and a substantially dense microstructure; and a second layer on the first layer. The second layer includes a columnar microstructure and at least one of a rare earth monosilicate or a thermal barrier coating composition comprising a base oxide comprising zirconia or hafnia; a primary dopant comprising ytterbia; a first co-dopant comprising samaria; and a second co-dopant comprising at least one of lutetia, scandia, ceria, gadolinia, neodymia, or europia.
EROSION AND CMAS RESISTANT COATING FOR PROTECTING EBC AND CMC LAYERS AND THERMAL SPRAY COATING METHOD
An erosion and CMAS resistant coating arranged on an EBC coated substrate includes at least one porous vertically cracked (PVC) coating layer providing CTE mitigation and being disposed over the EBC coated substrate. At least one dense vertically cracked (DVC) erosion and CMAS resistant coating layer is deposited over the at least one PVC coating layer.
EROSION AND CMAS RESISTANT COATING FOR PROTECTING EBC AND CMC LAYERS AND THERMAL SPRAY COATING METHOD
An erosion and CMAS resistant coating arranged on an EBC coated substrate includes at least one porous vertically cracked (PVC) coating layer providing CTE mitigation and being disposed over the EBC coated substrate. At least one dense vertically cracked (DVC) erosion and CMAS resistant coating layer is deposited over the at least one PVC coating layer.
Thermal barrier coatings for components in high-temperature mechanical systems
An article that includes a substrate; a first layer including yttria and zirconia or hafnia, where the first layer has a columnar microstructure and includes predominately the zirconia or hafnia; a second layer on the first layer, the second layer including zirconia or hafnia, ytterbia, samaria, and at least one of lutetia, scandia, ceria, neodymia, europia, and gadolinia, where the second layer includes predominately zirconia or hafnia, and where the second layer has a columnar microstructure; and a third layer on the second layer, the third layer including zirconia or hafnia, ytterbia, samaria, and a rare earth oxide including at least one of lutetia, scandia, ceria, neodymia, europia, and gadolinia, where the third layer has a dense microstructure and has a lower porosity than the second layer.
Thermal barrier coatings for components in high-temperature mechanical systems
An article that includes a substrate; a first layer including yttria and zirconia or hafnia, where the first layer has a columnar microstructure and includes predominately the zirconia or hafnia; a second layer on the first layer, the second layer including zirconia or hafnia, ytterbia, samaria, and at least one of lutetia, scandia, ceria, neodymia, europia, and gadolinia, where the second layer includes predominately zirconia or hafnia, and where the second layer has a columnar microstructure; and a third layer on the second layer, the third layer including zirconia or hafnia, ytterbia, samaria, and a rare earth oxide including at least one of lutetia, scandia, ceria, neodymia, europia, and gadolinia, where the third layer has a dense microstructure and has a lower porosity than the second layer.
BARRIER COATINGS
An example article includes a substrate and a barrier coating on the substrate extending from an inner interface facing the substrate to an outer surface opposite the inner interface. The barrier coating includes a bulk matrix and a plurality of discrete plugs inset within the bulk matrix and dispersed across the outer surface of the barrier coating. An example technique includes forming the barrier coating on the substrate of a component.
BARRIER COATINGS
An example article includes a substrate and a barrier coating on the substrate extending from an inner interface facing the substrate to an outer surface opposite the inner interface. The barrier coating includes a bulk matrix and a plurality of discrete plugs inset within the bulk matrix and dispersed across the outer surface of the barrier coating. An example technique includes forming the barrier coating on the substrate of a component.
PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY
The present invention relates to a new process for manufacturing a silicon carbide (SiC) coated body by depositing SiC in a chemical vapor deposition method using dimethyldichlorosilane (DMS) as the silane source on a graphite substrate. A further aspect of the present invention relates to the new silicon carbide coated body, which can be obtained by the new process of the present invention, and to the use thereof for manufacturing articles for high temperature applications, susceptors and reactors, semiconductor materials, and wafer.
PROCESS FOR MANUFACTURING A SILICON CARBIDE COATED BODY
The present invention relates to a new process for manufacturing a silicon carbide (SiC) coated body by depositing SiC in a chemical vapor deposition method using dimethyldichlorosilane (DMS) as the silane source on a graphite substrate. A further aspect of the present invention relates to the new silicon carbide coated body, which can be obtained by the new process of the present invention, and to the use thereof for manufacturing articles for high temperature applications, susceptors and reactors, semiconductor materials, and wafer.