A preparation method includes the following steps: Step (1): pressing and then drying body powder to form a green brick; Step (2): applying a ground coat on the surface of the green brick; Step (3): inkjet-printing a pattern on the surface of the green brick having the ground coat, and applying an isolation glaze; Step (4): applying a fully polished glaze on the surface of the green brick having the isolation glaze; and Step (5): drying, firing, and polishing the green brick having the fully polished glaze to obtain a hard wear-resistant polished glazed ceramic tile. The phase composition of the fired fully polished glaze is as follows: 10 to 20 percent by weight of corundum, 20 to 30 percent by weight of hyalophane, 0.5 to 1.0 percent by weight of hematite, and 50 to 68 percent by weight of amorphous phase.

In one example, a method for forming an environmental barrier coating (EBC) and/or abradable coating on a substrate. The method may include depositing a coating on a ceramic or ceramic matrix composite (CMC) substrate to form an as-deposited coating, wherein the coating includes at least one of an environmental barrier coating (EBC) and an abradable coating. The method further comprises heat treating the as-deposited coating at or above a first temperature for a first period of time following the deposition of the as-deposited coating on the substrate, wherein heat treating the as-deposited coating includes heating the as-deposited coating to or above the first temperature at a controlled rate. The heat treatment may be configured to at least one of decrease the open pores and/or microcracks of the heat-treated coating compared to the as-deposited coating or control a grain size of the heat-treated coating.

A component for use in a semiconductor processing chamber is provided. A component body of a dielectric material has a semiconductor processing facing surface. A coating of a dielectric material is on at least the semiconductor processing facing surface, wherein the dielectric material of the component body has a same stoichiometry as the dielectric material of the coating.

Systems and methods for forming an oxidation protection system on a composite structure are provided. In various embodiments, the oxidation protection system comprises a boron-glass layer formed on the composite substrate and a silicon-glass layer formed over the boron-glass layer. Each of the boron-glass layer and the silicon-glass layer includes a glass former.

A gas turbine engine article includes a substrate and a silicate-resistant barrier coating disposed on the substrate. The silicate-resistant barrier coating is composed of a refractory matrix and a calcium aluminosilicate additive (CAS additive) dispersed in the refractory matrix.

A method to produce a ceramic matrix composite with controlled surface characteristics includes: applying a scrim ply to a surface of a fiber preform, where the fiber preform includes silicon carbide fibers coated with boron nitride; infiltrating the fiber preform and the scrim ply with a slurry, thereby forming an impregnated ply on an impregnated fiber preform; infiltrating the impregnated fiber preform and the impregnated ply with a melt comprising silicon, and then cooling, thereby forming a ceramic matrix composite having a ceramic surface layer thereon, where the ceramic surface layer has a predetermined thickness and is devoid of boron; machining or grit blasting the ceramic surface layer to form an intermediate layer suitable for coating; and depositing an environmental barrier coating on the intermediate layer. Thus, a ceramic matrix composite coated with the environmental barrier coating is formed with the intermediate layer in between.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

A coating fabrication method includes providing engineered granules and thermally consolidating the engineered granules on a substrate to form a silicate-resistant barrier coating. Each of the engineered granules is an aggregate of at least one refractory matrix region and at least one calcium aluminosilicate additive region (CAS additive region) attached with the at least one refractory matrix region. In the thermal consolidation, the refractory matrix region from the engineered granules form grains of a refractory matrix of the silicate-resistant barrier coating and the CAS additive region from the engineered granules form CAS additives that are dispersed in grain boundaries between the grains.

An article for high temperature service is presented herein. One embodiment is an article including a substrate having a silicon-bearing ceramic matrix composite; and a layer disposed over the substrate, wherein the layer includes silicon and a dopant, the dopant including aluminum. In another embodiment, the article includes a ceramic matrix composite substrate, wherein the composite includes a silicon-bearing ceramic and a dopant, the dopant including aluminum; a bond coat disposed over the substrate, where the bond coat includes elemental silicon, a silicon alloy, a silicide, or combinations including any of the aforementioned; and a coating disposed over the bond coat, the coating including a silicate (such as an aluminosilicate or rare earth silicate), yttria-stabilized zirconia, or a combination including any of the aforementioned.