C04B2235/9669

Plasma Etching Apparatus Component for Manufacturing Semiconductor Comprising Composite Sintered Body and Manufacturing Method Therefor

Provided is a plasma etching apparatus component for manufacturing a semiconductor characterized by including a composite sintered body which contains 30 vol % to 70 vol % of yttria (Y.sub.2O.sub.3) and 30 vol % to 70 vol % of magnesia (MgO) and having plasma resistance.

The plasma etching apparatus component for manufacturing a semiconductor provided in one aspect of the present invention has excellent corrosion resistance to plasma, and may have good corrosion resistance to plasma even when the composite sintered body is sintered at a relatively low relative density. In addition, the composite sintered body has a small crystal grain size and a small increase in surface roughness after etching, so that there is an effect that contaminant particles may be reduced. Furthermore, the plasma etching apparatus component for manufacturing a semiconductor has excellent strength compared to a typical plasma-resistant material, is inexpensive, and is excellent in terms of economic feasibility and utilization.

Member for plasma processing apparatus, plasma processing apparatus with the same and method for using sintered body

A member for a plasma processing apparatus has a tungsten carbide phase, and a sub-phase including at least one selected from the group consisting of phase I to IV, and phase V, in which the phase I is a carbide phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase II is a nitride phase containing, as a constituent element, at least one of the elements of Group IV, V, and VI of the periodic table excluding W, the phase III is a carbonitride phase containing, as a constituent element, at least one of the elements of Group IV, Group V, and Group VI of the periodic table excluding W, the phase IV is a carbon phase, the phase V is a composite carbide phase which is represented by a formula W.sub.xM.sub.yC.sub.z.

Refractory ceramic batch and method for producing a refractory ceramic product

This invention relates to a refractory ceramic batch and to a method for producing a refractory ceramic product.

Corrosion-resistant components and methods of making
11376822 · 2022-07-05 · ·

A corrosion-resistant component configured for use with a semiconductor processing reactor, the corrosion-resistant component comprising: a) a ceramic insulating substrate; and, b) a white corrosion-resistant non-porous outer layer associated with the ceramic insulating substrate, the white corrosion-resistant non-porous outer layer having a thickness of at least 50 μm, a porosity of at most 1%, and a composition comprising at least 15% by weight of a rare earth compound based on total weight of the corrosion-resistant non-porous layer; and, c) an L* value of at least 90 as measured on a planar surface of the white corrosion-resistant non-porous outer layer. Methods of making are also disclosed.

Environmental barrier

A powder formed of fused particles. More than 95% by number of the feed particles exhibiting a circularity of greater than or equal to 0.85. The powder contains more than 88% of a silicate of one or more elements chosen from Zr, Hf, Y, Ce, Sc, In, La, Gd, Nd, Sm, Dy, Er, Yb, Eu, Pr, Ho and Ta, less than 10% of a dopant, as percentage by weight based on the oxides. The powder has a median particle size D.sub.50 of less than 15 μm, a 90 percentile particle size, D.sub.90, of less than 30 μm, and a size dispersion index (D.sub.90-D.sub.10)/D.sub.10 of less than 2. The powder has a relative density of greater than 90%. The D.sub.n percentiles of the powder are the particle sizes corresponding to the percentages, by number, of n %, on the cumulative distribution curve of the size of the particles of the powder. The particle sizes are classified in increasing order.

METHOD OF MAKING A REFRACTORY ARTICLE
20220234961 · 2022-07-28 ·

A method of making a refractory article is provided. The method includes: a) mixing a binder system, a refractory charge, and a second colloidal binder to form an aqueous slurry; b) casting the aqueous slurry into a mold; c) subjecting the mold containing the aqueous slurry to a temperature that is lower than a slurry casting temperature for a time sufficient to form a green strength article; and d) firing the green strength article at a temperature of at least 450° C. for a time sufficient to achieve thermal homogeneity, thereby forming a refractory article. Refractory articles made in accordance with the method have a unique combination of pore structure and mechanical properties.

Hot repair material of refractory materials

A hot repair material of refractory materials is provided and includes main materials and binding agents. The main materials include silicon carbide powders with six different particle sizes and a mass ratio according to particle sizes from large to small is 8:5:8:15:8:10. The binding agents include silicon nitride powders, a sodium silicate powder, an aluminum phosphate powder, a furfuryl alcohol, a silicone resin powder, a silica sol powder, an aluminum sol powder, a silicon oxide micronized powder, a vanadium oxide powder, a silicon powder, a borax and a rare earth oxide micronized powder, and a corresponding mass ratio is 20:10:4:1:5:1:1:2:0.5:0.5:0.5:0.5. The silicon carbide powders in the main materials have a good synergistic effect to improve strength of the repair material. The binding agents include low-, medium- and high-temperature binding agents for a full range of temperatures, so the repair material could gain strength continuously without a collapse temperature.

Alumina sintered body, method for manufacturing the same, and part for semiconductor manufacturing apparatus

An alumina sintered body comprising 0.01 to 1.0 mass % of one or more types selected from Ta, Nb, and V in terms of oxide thereof. The alumina sintered body may further comprise 0.01 to 1.0 mass % of Mg in terms of Mg oxide. It is particularly preferable that the alumina sintered body has an alumina purity of 99% or more. An alumina sintered body having low dielectric loss as compared with that in related art can therefore be produced at low cost.

PROTECTIVE COATING FOR MUFFLE IN OPTICAL FIBER DRAW FURNACE
20220106221 · 2022-04-07 ·

A muffle for an optical fiber draw furnace. The muffle including an inner surface and an outer surface, the inner surface forming an inner cavity. A protective coating is disposed on the inner surface, the protective coating having a melting point of about 1850° C. or greater. Furthermore, an absolute difference between a coefficient of thermal expansion of the protective coating and a coefficient of thermal expansion of a material of the muffle is 2.0 ppm/° C. or less over a temperature range from 25° C. to 1000° C.

Method of making waterproof magnesium oxychloride refractory brick by fly ash from municipal solid waste incineration
11279655 · 2022-03-22 · ·

The invention discloses a method of making waterproof magnesium oxychloride refractory brick using fly ash from municipal solid waste incineration (MSWFA). The solidification and stabilization of heavy metals in MSWFA is achieved by the chemical action of a sulfur-containing compound and a physical wrapping of a geopolymer. The large amount of chloride ions in MSWFA is also reused in the manufacture of magnesium oxychloride refractory brick, which requires a high chlorine environment. This method, with the inclusion of the geopolymer, also produces refractory brick exhibiting improved water resistance relative to traditional magnesium oxychloride refractory brick, thereby allowing the improved magnesium oxychloride refractory brick to be used in a wider range of applications.