A polyether compound which is as shown in Formula (I), wherein R.sub.1 is a polyether backbone of the polyether polyol; R.sub.2 is hydrogen or C.sub.1C.sub.5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage. ##STR00001##

A polyether compound which is as shown in Formula (I), wherein R.sub.1 is a polyether backbone of the polyether polyol; R.sub.2 is hydrogen or C.sub.1C.sub.5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage. ##STR00001##