C07C41/38

Methods for preparing and purifying environmentally compatible detergents

The invention provides methods for preparing and purifying compounds which can be used as environmentally compatible detergents, and compounds obtainable by such methods.

Methods for preparing and purifying environmentally compatible detergents

The invention provides methods for preparing and purifying compounds which can be used as environmentally compatible detergents, and compounds obtainable by such methods.

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

The present invention provides a compound represented by following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R.sup.2 to R.sup.5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R.sup.1 to R.sup.5 represents a group including an iodine atom and at least one R.sup.4 and/or at least one R.sup.5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m.sup.2 and m.sup.3 independently represents an integer of 0 to 8, each of m.sup.4 and m.sup.5 independently represents an integer of 0 to 9, provided that m.sup.4 and m.sup.5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p.sup.2 to p.sup.5 independently represents an integer of 0 to 2.

Method of producing solution composition containing monoetherified product, solution composition, and method of producing polymerizable compound
10633319 · 2020-04-28 · ·

Provided is a method of efficiently producing a solution composition containing a monoetherified product (III) using a hydroquinone compound (I) and a hydroxyl group-containing etherifying agent (II). The method of producing a solution composition includes: a step (1) of reacting a hydroquinone compound (I) and a hydroxyl group-containing etherifying agent (II) in a two-phase system including an alkaline aqueous solution and a hydrophobic ether solvent, and in the absence of a phase transfer catalyst and a hydrophilic organic solvent; and a step (2) of separating and removing an aqueous phase of a two-phase reaction liquid by liquid separation, and washing an organic phase using an aqueous solution containing a neutral inorganic salt and a hydroxide of an alkali metal, or the like.

Method of producing solution composition containing monoetherified product, solution composition, and method of producing polymerizable compound
10633319 · 2020-04-28 · ·

Provided is a method of efficiently producing a solution composition containing a monoetherified product (III) using a hydroquinone compound (I) and a hydroxyl group-containing etherifying agent (II). The method of producing a solution composition includes: a step (1) of reacting a hydroquinone compound (I) and a hydroxyl group-containing etherifying agent (II) in a two-phase system including an alkaline aqueous solution and a hydrophobic ether solvent, and in the absence of a phase transfer catalyst and a hydrophilic organic solvent; and a step (2) of separating and removing an aqueous phase of a two-phase reaction liquid by liquid separation, and washing an organic phase using an aqueous solution containing a neutral inorganic salt and a hydroxide of an alkali metal, or the like.

Method of producing solution composition containing monoetherified product, solution composition, and method of producing polymerizable compound
10633319 · 2020-04-28 · ·

Provided is a method of efficiently producing a solution composition containing a monoetherified product (III) using a hydroquinone compound (I) and a hydroxyl group-containing etherifying agent (II). The method of producing a solution composition includes: a step (1) of reacting a hydroquinone compound (I) and a hydroxyl group-containing etherifying agent (II) in a two-phase system including an alkaline aqueous solution and a hydrophobic ether solvent, and in the absence of a phase transfer catalyst and a hydrophilic organic solvent; and a step (2) of separating and removing an aqueous phase of a two-phase reaction liquid by liquid separation, and washing an organic phase using an aqueous solution containing a neutral inorganic salt and a hydroxide of an alkali metal, or the like.

Compound and method for producing same

A compound represented by the following formula (1): ##STR00001## wherein R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms; R.sup.2 to R.sup.5 are each independently a linear, branched, or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a group in which a hydrogen atom of a hydroxy group is replaced with a vinylphenylmethyl group, a group selected from the group consisting of groups represented by the following formula (A), a thiol group, or a hydroxy group, wherein at least one of the R.sup.2 to the R.sup.5 is a group selected from a group represented by the formula (A); m.sup.2 and m.sup.3 are each independently an integer of 0 to 8; m.sup.4 and m.sup.5 are each independently an integer of 0 to 9, provided that m.sup.2, m.sup.3, m.sup.4, and m.sup.5 are not 0 at the same time; n is an integer of 1 to 4; and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2: ##STR00002##

Compound and method for producing same

A compound represented by the following formula (1): ##STR00001## wherein R.sup.1 is a 2n-valent group having 1 to 60 carbon atoms; R.sup.2 to R.sup.5 are each independently a linear, branched, or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a group in which a hydrogen atom of a hydroxy group is replaced with a vinylphenylmethyl group, a group selected from the group consisting of groups represented by the following formula (A), a thiol group, or a hydroxy group, wherein at least one of the R.sup.2 to the R.sup.5 is a group selected from a group represented by the formula (A); m.sup.2 and m.sup.3 are each independently an integer of 0 to 8; m.sup.4 and m.sup.5 are each independently an integer of 0 to 9, provided that m.sup.2, m.sup.3, m.sup.4, and m.sup.5 are not 0 at the same time; n is an integer of 1 to 4; and p.sup.2 to p.sup.5 are each independently an integer of 0 to 2: ##STR00002##