Patent classifications
C07C41/54
ODOROUS ACETALS OF ETHYL VANILLIN AND ETHYL VANILLIN DERIVATIVES
The present invention relates to new odorous acetals which are useful as fragrance or flavor materials in particular in providing vanilla and spicy notes with a natural impression resembling vanilla absolute.
Method for producing reduced halide compound having undergone reduction of carbon-carbon unsaturated bond
A halide compound having one or more carbon-carbon unsaturated bonds is catalytically reduced with substantially no dehalogenation to produce a reduced halide compound in which at least one of the one or more unsaturated bonds is reduced. Specifically provided is a method for producing a reduced halide compound including steps of: reacting a nickel compound, a zinc compound, and a borohydride compound in a solvent to obtain a reduction catalyst; and subjecting a halide compound having one or more carbon-carbon unsaturated bonds to catalytic reduction in the presence of the reduction catalyst to reduce at least one of the one or more carbon-carbon unsaturated bonds to thereby obtain a reduced halide compound.
Method for producing reduced halide compound having undergone reduction of carbon-carbon unsaturated bond
A halide compound having one or more carbon-carbon unsaturated bonds is catalytically reduced with substantially no dehalogenation to produce a reduced halide compound in which at least one of the one or more unsaturated bonds is reduced. Specifically provided is a method for producing a reduced halide compound including steps of: reacting a nickel compound, a zinc compound, and a borohydride compound in a solvent to obtain a reduction catalyst; and subjecting a halide compound having one or more carbon-carbon unsaturated bonds to catalytic reduction in the presence of the reduction catalyst to reduce at least one of the one or more carbon-carbon unsaturated bonds to thereby obtain a reduced halide compound.
ACETAL COMPOUND, ADDITIVE INCLUDING THE COMPOUND, AND RESIST COMPOSITION INCLUDING THE COMPOUND
The present invention provides: an acetal compound represented by the following general formula (1):
##STR00001##
wherein R.sup.1 represents an alkyl group having from 1 to 12 carbon atoms, a cycloalkyl group having from 5 to 12 carbon atoms or an acyl group having from 1 to 12 carbon atoms; n represents an integer from 1 to 5; m represents an integer from 2 to 4; and Ar represents a residue obtained by removing a hydrogen atom(s) from the hydroxyl groups of a polyhydric phenol having a valence of m; and a resist composition for forming a thick resist film, including the same.
ACETAL COMPOUND, ADDITIVE INCLUDING THE COMPOUND, AND RESIST COMPOSITION INCLUDING THE COMPOUND
The present invention provides: an acetal compound represented by the following general formula (1):
##STR00001##
wherein R.sup.1 represents an alkyl group having from 1 to 12 carbon atoms, a cycloalkyl group having from 5 to 12 carbon atoms or an acyl group having from 1 to 12 carbon atoms; n represents an integer from 1 to 5; m represents an integer from 2 to 4; and Ar represents a residue obtained by removing a hydrogen atom(s) from the hydroxyl groups of a polyhydric phenol having a valence of m; and a resist composition for forming a thick resist film, including the same.
ACETAL COMPOUND, ADDITIVE INCLUDING THE COMPOUND, AND RESIST COMPOSITION INCLUDING THE COMPOUND
The present invention provides: an acetal compound represented by the following general formula (1):
##STR00001##
wherein R.sup.1 represents an alkyl group having from 1 to 12 carbon atoms, a cycloalkyl group having from 5 to 12 carbon atoms or an acyl group having from 1 to 12 carbon atoms; n represents an integer from 1 to 5; m represents an integer from 2 to 4; and Ar represents a residue obtained by removing a hydrogen atom(s) from the hydroxyl groups of a polyhydric phenol having a valence of m; and a resist composition for forming a thick resist film, including the same.
METHOD FOR PRODUCING REDUCED HALIDE COMPOUND HAVING UNDERGONE REDUCTION OF CARBON-CARBON UNSATURATED BOND
A halide compound having one or more carbon-carbon unsaturated bonds is catalytically reduced with substantially no dehalogenation to produce a reduced halide compound in which at least one of the one or more unsaturated bonds is reduced. Specifically provided is a method for producing a reduced halide compound including steps of: reacting a nickel compound, a zinc compound, and a borohydride compound in a solvent to obtain a reduction catalyst; and subjecting a halide compound having one or more carbon-carbon unsaturated bonds to catalytic reduction in the presence of the reduction catalyst to reduce at least one of the one or more carbon-carbon unsaturated bonds to thereby obtain a reduced halide compound.
METHOD FOR PRODUCING REDUCED HALIDE COMPOUND HAVING UNDERGONE REDUCTION OF CARBON-CARBON UNSATURATED BOND
A halide compound having one or more carbon-carbon unsaturated bonds is catalytically reduced with substantially no dehalogenation to produce a reduced halide compound in which at least one of the one or more unsaturated bonds is reduced. Specifically provided is a method for producing a reduced halide compound including steps of: reacting a nickel compound, a zinc compound, and a borohydride compound in a solvent to obtain a reduction catalyst; and subjecting a halide compound having one or more carbon-carbon unsaturated bonds to catalytic reduction in the presence of the reduction catalyst to reduce at least one of the one or more carbon-carbon unsaturated bonds to thereby obtain a reduced halide compound.
Method for producing halogenated acrylic acid derivative
To provide a novel method for producing a halogenated acrylic acid derivative. A compound represented by the formula (1): ##STR00001##
(wherein each of R.sup.1 and R.sup.2 which are independent of each other, is a hydrogen atom or a monovalent group essentially containing a carbon atom, or R.sup.1 and R.sup.2 together form a ring, R.sup.3 is a monovalent group capable of being desorbed by R.sup.3OH removal reaction, and each of R.sup.4 and R.sup.5 which are independent of each other, is a hydrogen atom or a monovalent group essentially containing a carbon atom) and having a boiling point of at most 500 C., is subjected to R.sup.3OH removal reaction in a vapor phase in the presence of a solid catalyst to obtain an ethene derivative represented by the formula (2): ##STR00002##
the ethene derivative represented by the formula (2) and a halogenated methane represented by the formula (3):
CHXYZ(3)
(wherein each of X, Y and Z which are independent of one another, is a halogen atom) are reacted in the presence of a basic compound and a phase transfer catalyst, to obtain a cyclopropane derivative represented by the formula (4): ##STR00003##
and the cyclopropane derivative represented by the formula (4) is reacted by heating in a liquid phase or in a vapor phase to obtain a halogenated acrylic acid ester derivative represented by the formula (5): ##STR00004##
Method for producing halogenated acrylic acid derivative
To provide a novel method for producing a halogenated acrylic acid derivative. A compound represented by the formula (1): ##STR00001##
(wherein each of R.sup.1 and R.sup.2 which are independent of each other, is a hydrogen atom or a monovalent group essentially containing a carbon atom, or R.sup.1 and R.sup.2 together form a ring, R.sup.3 is a monovalent group capable of being desorbed by R.sup.3OH removal reaction, and each of R.sup.4 and R.sup.5 which are independent of each other, is a hydrogen atom or a monovalent group essentially containing a carbon atom) and having a boiling point of at most 500 C., is subjected to R.sup.3OH removal reaction in a vapor phase in the presence of a solid catalyst to obtain an ethene derivative represented by the formula (2): ##STR00002##
the ethene derivative represented by the formula (2) and a halogenated methane represented by the formula (3):
CHXYZ(3)
(wherein each of X, Y and Z which are independent of one another, is a halogen atom) are reacted in the presence of a basic compound and a phase transfer catalyst, to obtain a cyclopropane derivative represented by the formula (4): ##STR00003##
and the cyclopropane derivative represented by the formula (4) is reacted by heating in a liquid phase or in a vapor phase to obtain a halogenated acrylic acid ester derivative represented by the formula (5): ##STR00004##