The present invention relates to a shielding compound, a method of forming a thin film using the shielding compound, a semiconductor substrate fabricated using the method, and a semiconductor device including the semiconductor substrate. According to the present invention, by providing a compound having a predetermined structure as a shielding agent, by forming a deposition layer with a uniform thickness as a shielded area on a substrate due to the difference in adsorption distribution of the shielding agent, the deposition rate of the thin film may be reduced, and the thin film growth rate may be appropriately reduced. In addition, even when forming a thin film on a substrate with a complex structure, step coverage and the thickness uniformity of a thin film may be greatly improved, and impurities may be reduced.

This fluorine-containing ether compound is a fluorine-containing ether compound represented by Formula (1). In Formula (1), X is Formula (2-1) to (2-5), and A is Formula (3-1) or (3-2). B is a perfluoropolyether chain. D has 2 to 4 polar groups, has an oxygen atom bonded to a methylene group adjacent to D, has 1 to 15 carbon atoms, and has 0 to 9 carbon atoms in a shortest distance between carbon atoms to which adjacent polar groups in D are bonded.

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The present application relates to bicyclo[2.2.1]hept-5-en-2-ol and related compounds, methods of making them, and methods of using them as flavor and fragrance ingredients in food, cosmetic, pharmaceutical, consumer, and other compositions and products.

The present application relates to bicyclo[2.2.1]hept-5-en-2-ol and related compounds, methods of making them, and methods of using them as flavor and fragrance ingredients in food, cosmetic, pharmaceutical, consumer, and other compositions and products.

Provided is a method for producing, from a carboxylic acid ester, a corresponding ether. In the method, the reaction product and catalyst can be easily separated, and a large amount of salt waste or hazardous waste is not discharged. The method for producing an ether includes reducing a carboxylic acid ester with molecular hydrogen in the presence of the following Catalyst and producing the corresponding ether, in which the C(O)O group of the carboxylic acid ester has been converted to a CH.sub.2O group: Catalyst: a catalyst in which the following M.sup.1 and M.sup.2 are supported as metal species on the following Support. M.sup.1: platinum, ruthenium, rhodium, palladium, or iridium. M.sup.2: molybdenum, rhenium, tungsten, or vanadium. Support: zirconium oxide, titanium oxide, cerium oxide, or hydroxyapatite.

Provided is a method for producing, from a carboxylic acid ester, a corresponding ether. In the method, the reaction product and catalyst can be easily separated, and a large amount of salt waste or hazardous waste is not discharged. The method for producing an ether includes reducing a carboxylic acid ester with molecular hydrogen in the presence of the following Catalyst and producing the corresponding ether, in which the C(O)O group of the carboxylic acid ester has been converted to a CH.sub.2O group: Catalyst: a catalyst in which the following M.sup.1 and M.sup.2 are supported as metal species on the following Support. M.sup.1: platinum, ruthenium, rhodium, palladium, or iridium. M.sup.2: molybdenum, rhenium, tungsten, or vanadium. Support: zirconium oxide, titanium oxide, cerium oxide, or hydroxyapatite.