A polyphenylene ether oligomer and a polyphenylene ether oligomer are provided. The polyphenylene ether oligomer has a structure represented by Formula (I): ##STR00001## wherein each R.sup.1 can be independently hydrogen, C.sub.1-6 alkyl group, or phenyl group; each R.sup.2 can be independently hydrogen, C.sub.1-6 alkyl group, or phenyl group; a:(a+b) is from 0.05:1 to 1:1; n:(a+b) is from 0.05:1 to 5:1; Q can be ##STR00002##
m can be 0 or an integer from 1 to 4; Ra can be C.sub.1-6 alkylene group; Rb can be C.sub.1-6 alkylene group; each X is independently hydrogen, acryloyl group, allyl group, vinylbenzyl group, epoxypropyl group, methacryloyl group, propargyl group, or cyanol group; and wherein the polyphenylene ether oligomer can have a number average molecular weight from 400 to 2,000.

The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): ##STR00001##
wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): ##STR00001##
wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

The present disclosure relates to HIF-2? inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2? scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.

The present disclosure relates to HIF-2? inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2? scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.

The present invention relates to compounds according to formula (I) and to heat-curable compositions based on polymaleimide resin systems comprising such compounds as co-monomers: wherein R.sup.1 is hydrogen or an alkenylphenoxy group, R.sup.2 is an alkenylphenoxy group, and R.sup.3 is hydrogen or an alkyl group with 1 to 4 carbon atoms. The present invention also relates to cross-linked resins obtainable by curing such compositions. Compounds of the present invention can be used amongst others in fields like structural adhesives, matrix resins for fiber prepregs, molding compounds, as well as structural and/or electrical composites. ##STR00001##

The present invention relates to compounds according to formula (I) and to heat-curable compositions based on polymaleimide resin systems comprising such compounds as co-monomers: wherein R.sup.1 is hydrogen or an alkenylphenoxy group, R.sup.2 is an alkenylphenoxy group, and R.sup.3 is hydrogen or an alkyl group with 1 to 4 carbon atoms. The present invention also relates to cross-linked resins obtainable by curing such compositions. Compounds of the present invention can be used amongst others in fields like structural adhesives, matrix resins for fiber prepregs, molding compounds, as well as structural and/or electrical composites. ##STR00001##

Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):

##STR00001##

wherein: R.sup.1 is each independently H, C.sub.1-30 alkyl, or C.sub.3-30 cycloalkyl; Ar.sup.1 is an aromatic ring or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar.sup.1 is substituted or unsubstituted; Ar.sup.2 is an aromatic ring chosen from a 6-membered carbocyclic aromatic ring, a 5- or 6-membered heteroaromatic ring, or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar.sup.2 optionally comprises a fused cyclic imide moiety, a fused oxazole moiety, a fused imidazole moiety, or a fused thiazole moiety, and wherein Ar.sup.2 is substituted or unsubstituted; Y.sup.1 is a single covalent bond, or is selected from O, C(O), C(O)O, S, S(O).sub.2, N(R.sup.2), C(O)N(R.sup.2), C(O)N(R.sup.2)C(O), (CH.sub.2).sub.y, or a combination thereof, wherein R.sup.2 is H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, C.sub.5-30 aryl, C(O)R.sup.3, or S(O).sub.2R.sup.3, wherein R.sup.3 is chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, and C.sub.5-30 aryl, and y is an integer from 1 to 6; x is an integer from 2 to 5; and * denotes a binding site to a part of the curable compound other than the group represented by formula (1), provided that no two

##STR00002##

groups are in an ortho position to each other on Ar.sup.1, wherein ** denotes the point of attachment to an aromatic ring carbon of Ar.sup.1; and
a solvent.

Photoresist underlayer compositions, comprising: a curable compound comprising a group of the following formula (1):

##STR00001##

wherein: R.sup.1 is each independently H, C.sub.1-30 alkyl, or C.sub.3-30 cycloalkyl; Ar.sup.1 is an aromatic ring or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar.sup.1 is substituted or unsubstituted; Ar.sup.2 is an aromatic ring chosen from a 6-membered carbocyclic aromatic ring, a 5- or 6-membered heteroaromatic ring, or a fused aromatic ring system having from 5 to 30 carbon atoms, wherein Ar.sup.2 optionally comprises a fused cyclic imide moiety, a fused oxazole moiety, a fused imidazole moiety, or a fused thiazole moiety, and wherein Ar.sup.2 is substituted or unsubstituted; Y.sup.1 is a single covalent bond, or is selected from O, C(O), C(O)O, S, S(O).sub.2, N(R.sup.2), C(O)N(R.sup.2), C(O)N(R.sup.2)C(O), (CH.sub.2).sub.y, or a combination thereof, wherein R.sup.2 is H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, C.sub.5-30 aryl, C(O)R.sup.3, or S(O).sub.2R.sup.3, wherein R.sup.3 is chosen from H, C.sub.1-10 alkyl, C.sub.2-10 unsaturated hydrocarbyl, and C.sub.5-30 aryl, and y is an integer from 1 to 6; x is an integer from 2 to 5; and * denotes a binding site to a part of the curable compound other than the group represented by formula (1), provided that no two

##STR00002##

groups are in an ortho position to each other on Ar.sup.1, wherein ** denotes the point of attachment to an aromatic ring carbon of Ar.sup.1; and
a solvent.

The present disclosure relates to HIF-2? inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2? scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.