A compound for forming an organic film shown by the formula (1A),

R(X).sub.m1 (1A)

wherein R represents a single bond or an organic group having 1 to 50 carbon atoms; X represents a group shown by formula (1B); and ml represents an integer satisfying 2m110,

##STR00001##

wherein X.sup.2 represents a divalent organic group having 1 to 10 carbon atoms; n1 represents 0 or 1; n2 represents 1 or 2; X.sup.3 represents a group shown by the formula (1C); and n5 represents 0, 1, or 2,

##STR00002##

wherein R.sup.10 represents a hydrogen atom or a saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms, wherein a hydrogen atom of the benzene ring in formula (1C) may be substituted with a methyl group or methoxy group. This compound for forming an organic film can provide organic film composition having good dry etching resistance, heat resistance to 400 C. or higher, high filling and planarizing properties.

A compound for forming an organic film shown by the formula (1A),

R(X).sub.m1 (1A)

wherein R represents a single bond or an organic group having 1 to 50 carbon atoms; X represents a group shown by formula (1B); and ml represents an integer satisfying 2m110,

##STR00001##

wherein X.sup.2 represents a divalent organic group having 1 to 10 carbon atoms; n1 represents 0 or 1; n2 represents 1 or 2; X.sup.3 represents a group shown by the formula (1C); and n5 represents 0, 1, or 2,

##STR00002##

wherein R.sup.10 represents a hydrogen atom or a saturated or unsaturated hydrocarbon group having 1 to 10 carbon atoms, wherein a hydrogen atom of the benzene ring in formula (1C) may be substituted with a methyl group or methoxy group. This compound for forming an organic film can provide organic film composition having good dry etching resistance, heat resistance to 400 C. or higher, high filling and planarizing properties.

A polyphenylene ether oligomer and a polyphenylene ether oligomer are provided. The polyphenylene ether oligomer has a structure represented by Formula (I):

##STR00001##

wherein each R.sup.1 can be independently hydrogen, C.sub.1-6 alkyl group, or phenyl group; each R.sup.2 can be independently hydrogen, C.sub.1-6 alkyl group, or phenyl group; a:(a+b) is from 0.05:1 to 1:1; n:(a+b) is from 0.05:1 to 5:1; Q can be

##STR00002##

m can be 0 or an integer from 1 to 4; Ra can be C.sub.1-6 alkylene group; Rb can be C.sub.1-6 alkylene group; each X is independently hydrogen, acryloyl group, allyl group, vinylbenzyl group, epoxypropyl group, methacryloyl group, propargyl group, or cyanol group; and wherein the polyphenylene ether oligomer can have a number average molecular weight from 400 to 2,000.

A polyphenylene ether oligomer and a polyphenylene ether oligomer are provided. The polyphenylene ether oligomer has a structure represented by Formula (I):

##STR00001##

wherein each R.sup.1 can be independently hydrogen, C.sub.1-6 alkyl group, or phenyl group; each R.sup.2 can be independently hydrogen, C.sub.1-6 alkyl group, or phenyl group; a:(a+b) is from 0.05:1 to 1:1; n:(a+b) is from 0.05:1 to 5:1; Q can be

##STR00002##

m can be 0 or an integer from 1 to 4; Ra can be C.sub.1-6 alkylene group; Rb can be C.sub.1-6 alkylene group; each X is independently hydrogen, acryloyl group, allyl group, vinylbenzyl group, epoxypropyl group, methacryloyl group, propargyl group, or cyanol group; and wherein the polyphenylene ether oligomer can have a number average molecular weight from 400 to 2,000.

The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1):

##STR00001##

wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1):

##STR00001##

wherein, each R.sup.0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

Provided herein is a compound which is particularly suitable for use as a cannabinoid, as an emulsifier for a cannabinoid, in a formulation comprising the compound and in a method of treatment using the compound. The compound is defined by the General Formula: ##STR00001##
wherein: R.sup.1-R.sup.10 are independently selected from H or an alkyl of 1-10 carbons; alkenyl of up to 10 carbons; or groups on adjacent carbons may be taken together to form an alkene; R.sup.11 and R.sup.12 are independently H or (CH.sub.2CHR.sup.16O).sub.xR.sup.17 with the proviso that at least one of R.sup.11 or R.sup.12 represents (CH.sub.2CHR.sup.16O).sub.xR.sup.17; R.sup.11 and R.sup.10 may be taken together to represent C(R.sup.19).sup.2; R.sup.13-R.sup.15 independently represent H or an alkyl of 1-8 carbons; each R.sup.16 independently represents H or an alkyl of 1-3 carbons; each R.sup.17 independently represents H, an alkyl or substituted alkyl of 1-22 carbons, aryl or substituted aryl or the ester of an acid; each R.sup.19 independently represents H or an alkyl of 1-5 carbons; and each x is independently an integer of 1-100.

Provided herein is a compound which is particularly suitable for use as a cannabinoid, as an emulsifier for a cannabinoid, in a formulation comprising the compound and in a method of treatment using the compound. The compound is defined by the General Formula: ##STR00001##
wherein: R.sup.1-R.sup.10 are independently selected from H or an alkyl of 1-10 carbons; alkenyl of up to 10 carbons; or groups on adjacent carbons may be taken together to form an alkene; R.sup.11 and R.sup.12 are independently H or (CH.sub.2CHR.sup.16O).sub.xR.sup.17 with the proviso that at least one of R.sup.11 or R.sup.12 represents (CH.sub.2CHR.sup.16O).sub.xR.sup.17; R.sup.11 and R.sup.10 may be taken together to represent C(R.sup.19).sup.2; R.sup.13-R.sup.15 independently represent H or an alkyl of 1-8 carbons; each R.sup.16 independently represents H or an alkyl of 1-3 carbons; each R.sup.17 independently represents H, an alkyl or substituted alkyl of 1-22 carbons, aryl or substituted aryl or the ester of an acid; each R.sup.19 independently represents H or an alkyl of 1-5 carbons; and each x is independently an integer of 1-100.

The invention relates to a method and intermediate compounds for the preparation of menaquinone MK-7. The method for the preparation of menaquinone MK-7 is characterized in that, it comprises coupling of a compound of formula (11) with a compound of formula (17) in the presence of a base, to obtain a compound of formula (18), which is subjected to desulfonylation reaction in the presence of a palladium catalyst, to obtain a compound of formula (19), which is subjected to oxidation reaction, to obtain menaquinone MK-7. The invention also relates to compound (8), preferably in a crystalline form, which is a convenient intermediate compound for the preparation of menaquinone MK-7.

The invention relates to a method and intermediate compounds for the preparation of menaquinone MK-7. The method for the preparation of menaquinone MK-7 is characterized in that, it comprises coupling of a compound of formula (11) with a compound of formula (17) in the presence of a base, to obtain a compound of formula (18), which is subjected to desulfonylation reaction in the presence of a palladium catalyst, to obtain a compound of formula (19), which is subjected to oxidation reaction, to obtain menaquinone MK-7. The invention also relates to compound (8), preferably in a crystalline form, which is a convenient intermediate compound for the preparation of menaquinone MK-7.