Patent classifications
C
CHEMISTRY; METALLURGY
Load children
C07
ORGANIC CHEMISTRY
Load children
C07C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
Load children
49/00
Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
Load children Filter patents View analytics View as hierarchy Open in page
C07C49/587
Unsaturated compounds containing a keto groups being part of a ring
Load children Filter patents View analytics View as hierarchy Open in page
C07C49/657
containing six-membered aromatic rings
Load children Filter patents View analytics View as hierarchy Open in page
C07C49/665
a keto group being part of a condensed ring system
Load children Filter patents View analytics View as hierarchy Open in page

C07C49/665

RESIST UNDERLAYER FILM COMPOSTION, PATTERNING PROCESS, AND COMPOUND
20170018436 · 2017-01-19 · ·

The present invention provides a resist underlayer film composition for lithography, containing a compound having an indenofluorene structure. This resist underlayer film composition is excellent in filling property, generates little outgas, and has high heat resistance.

RESIST UNDERLAYER FILM COMPOSTION, PATTERNING PROCESS, AND COMPOUND
20170018436 · 2017-01-19 · ·

The present invention provides a resist underlayer film composition for lithography, containing a compound having an indenofluorene structure. This resist underlayer film composition is excellent in filling property, generates little outgas, and has high heat resistance.