The present disclosure relates salts of fenofibric acid with berberine or its analogues, their crystalline forms, their preparation methods, and their uses, wherein the salts comprise fenofibric acid as anion and berberine or its analogues as cation. The disclosed salts of fenofibric acid with berberine or its analogues are free of unnecessary cation or anion, such as choline cation in a fenofibric acid salt with choline and chloride ion in a chloride salt of berberine or its analogs, and thus free of side effects caused by such cation or anion, including instability caused by choline and digesting system irritation caused by high acidity caused by the chloride salt of berberine analogs.

The present disclosure relates salts of fenofibric acid with berberine or its analogues, their crystalline forms, their preparation methods, and their uses, wherein the salts comprise fenofibric acid as anion and berberine or its analogues as cation. The disclosed salts of fenofibric acid with berberine or its analogues are free of unnecessary cation or anion, such as choline cation in a fenofibric acid salt with choline and chloride ion in a chloride salt of berberine or its analogs, and thus free of side effects caused by such cation or anion, including instability caused by choline and digesting system irritation caused by high acidity caused by the chloride salt of berberine analogs.

The present disclosure provides compositions for in vivo imaging of hydrogen peroxide; and methods for detecting hydrogen peroxide in vivo. The compositions and methods find use in various diagnostic applications, which are also provided.

The present disclosure provides compositions for in vivo imaging of hydrogen peroxide; and methods for detecting hydrogen peroxide in vivo. The compositions and methods find use in various diagnostic applications, which are also provided.

A resist composition containing a resin component whose solubility in a development solution changes under the action of the acid and a compound represented by General Formula (d0). In the formula, Ar is an aromatic ring; Xd is an iodine atom, a fluorine atom, a bromine atom or a fluorinated alkyl group; Rd is a substituent; nd is an integer of 1 or more as long as the valence allows, and md is an integer of 0 or more as long as the valence allows; Ld is a single bond or a divalent linking group; m is an integer of 1 or more, and M.sup.m+ is an m-valent cation

##STR00001##

A resist composition containing a resin component whose solubility in a development solution changes under the action of the acid and a compound represented by General Formula (d0). In the formula, Ar is an aromatic ring; Xd is an iodine atom, a fluorine atom, a bromine atom or a fluorinated alkyl group; Rd is a substituent; nd is an integer of 1 or more as long as the valence allows, and md is an integer of 0 or more as long as the valence allows; Ld is a single bond or a divalent linking group; m is an integer of 1 or more, and M.sup.m+ is an m-valent cation

##STR00001##