A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating fluorobenzenesulfonic acid bonded to iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a sulfonium or iodonium salt capable of generating sulfonic acid bonded to iodized benzene ring offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a quencher in the form of an iodonium salt capable of generating fluorobenzoic acid bonded to iodized benzene offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a quencher in the form of an iodonium salt capable of generating fluorobenzoic acid bonded to iodized benzene offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

Disclosed is a chemical process of preparing dehydrohedione from Hedione via -chlorination and elimination steps. The process can be conducted in a one-pot process or in a continuous reactor system. Accordingly, a simple and cost effective process of preparing cis-Hedione enriched products is developed through reduction of dehydrohedione in the presence of a chiral catalyst system.

Disclosed is a chemical process of preparing dehydrohedione from Hedione via -chlorination and elimination steps. The process can be conducted in a one-pot process or in a continuous reactor system. Accordingly, a simple and cost effective process of preparing cis-Hedione enriched products is developed through reduction of dehydrohedione in the presence of a chiral catalyst system.

To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid excellent in chemical resistance, an article having a surface layer excellent in chemical resistance and a method for producing it, and a method for producing a fluorinated ether compound excellent in chemical resistance. A fluorinated ether compound which has a first partial structure represented by the following formula (1) and a second partial structure represented by the following formula (2), and which has at least five first partial structures, or has at least two second partial structures:
OR.sup.f12(1)
OR.sup.f13(2)
wherein R.sup.f12 is a C.sub.1-6 fluoroalkylene group, and R.sup.f13 is a group having a fluorinated cyclic structure which may have a hetero atom.

A living radical polymerization initiator represented by the following: ##STR00001##
wherein, R.sup.1 represents an aromatic, an alkylcarbonyl, an alkoxycarbonyl, an aminocarbonyl, an alkylaminocarbonyl, a dialkylaminocarbonyl, an arylcarbonyl, an alkylsulfonyl, an aryl sulfonyl or combinations thereof; R.sup.2, R.sup.3, R.sup.4 and R.sup.5 are a hydrogen, an aliphatic, an aromatic, an alkylcarbonyl, an alkoxycarbonyl, an aminocarbonyl, an alkylaminocarbonyl, a dialkylaminocarbonyl, an arylcarbonyl, a carboxy, an alkylsulfonyl or an aryl sulfonyl; X and Y are a halogen; m and n are an integer of 1 or more, and ##STR00002## are non-symmetrical so that X and Y have different reactivities to initiate a living radical polymerization.