The present invention provides a halogenated aniline represented by formula (I) (wherein each of X.sup.1 and X.sup.2 independently represents a chlorine atom, a bromine atom or an iodine atom), a method for producing the halogenated aniline, and other aspects.

##STR00001##

The present invention provides a halogenated aniline represented by formula (I) (wherein each of X.sup.1 and X.sup.2 independently represents a chlorine atom, a bromine atom or an iodine atom), a method for producing the halogenated aniline, and other aspects.

##STR00001##

Disclosed herein are novel iodonium analogs having anticancer and anti-inflammatory activity.

Disclosed herein are novel iodonium analogs having anticancer and anti-inflammatory activity.

The present invention refers to a crystalline 2-fluoro-3-nitrotoluene compound of formula (I):

##STR00001##

and a process for the preparation thereof. Furthermore, the present invention relates to a process for the synthesis of a compound of formula (II):

##STR00002##

or salts thereof by means of the crystalline 2-fluoro-3-nitrotoluene.

The present invention refers to a crystalline 2-fluoro-3-nitrotoluene compound of formula (I):

##STR00001##

and a process for the preparation thereof. Furthermore, the present invention relates to a process for the synthesis of a compound of formula (II):

##STR00002##

or salts thereof by means of the crystalline 2-fluoro-3-nitrotoluene.

Compounds of structure (I) are described wherein, R.sub.1, R.sub.2, R.sub.1a and R.sub.2a are independently selected from H, nitro, cyano, and an alkylsulfonyl, wherein at least two of R.sub.1, R.sub.2, R.sub.1a and R.sub.2a are independently selected from nitro, cyano, and an alkylsulfonyl, and X is not a halide, tosylate, trifluoromethylsulfonate, tetrafluoroborate, an aryl-substituted borates, hexafluorophosphate, hexafluoroarsenate, acetate, trifluoroacetate, methane sulfonate, C-2 to C-20 linear unsubstituted alkyl sulfonates, naphthalenesulfonate, and camphorsulfonate. Also described are EUV negative and positive chemically amplified photoresist compostions containing said compound and the process of using these photoresist to pattern a substrate.