The present invention relates to a process for purifying a mixture comprising MEG, MEA, EDA and DETA, and low boilers having a boiling point not higher than PIP and high boilers having a boiling point not lower than AEEA, wherein the process comprises the following steps: a) separating a mixture comprising MEG, MEA, EDA and DETA, and low boilers having a boiling point not higher than PIP and high boilers having a boiling point not lower than AEEA, into (i) a mixture A comprising EDA and the low boilers having a boiling point not higher than PIP; and (ii) a mixture B comprising MEA; and (iii) a mixture C comprising MEG, DETA and the high boilers having a boiling point not lower than AEEA; b) separating mixture C from stage a) into (i) a mixture D comprising MEG; and (ii) a mixture E comprising MEG, DETA and the high boilers having a boiling point not lower than AEEA; c) separating mixture E from stage b) either into (i) a mixture F comprising MEG and DETA; and (ii) a mixture G comprising the high boilers having a boiling point not lower than AEEA; or into (i) a mixture F comprising MEG and DETA; and (ii) a mixture G1 comprising AEEA; and (iii) a mixture G2 comprising the high boilers having a boiling point higher than AEEA; d) separating mixture F from stage c) by extractive distillation with triethylene glycol into (i) a mixture H comprising MEG; and (ii) a mixture I comprising DETA and TEG.

The present invention relates to a process for purifying a mixture comprising MEG, MEA, EDA and DETA, and low boilers having a boiling point not higher than PIP and high boilers having a boiling point not lower than AEEA, wherein the process comprises the following steps: a) separating a mixture comprising MEG, MEA, EDA and DETA, and low boilers having a boiling point not higher than PIP and high boilers having a boiling point not lower than AEEA, into (i) a mixture A comprising EDA and the low boilers having a boiling point not higher than PIP; and (ii) a mixture B comprising MEA; and (iii) a mixture C comprising MEG, DETA and the high boilers having a boiling point not lower than AEEA; b) separating mixture C from stage a) into (i) a mixture D comprising MEG; and (ii) a mixture E comprising MEG, DETA and the high boilers having a boiling point not lower than AEEA; c) separating mixture E from stage b) either into (i) a mixture F comprising MEG and DETA; and (ii) a mixture G comprising the high boilers having a boiling point not lower than AEEA; or into (i) a mixture F comprising MEG and DETA; and (ii) a mixture G1 comprising AEEA; and (iii) a mixture G2 comprising the high boilers having a boiling point higher than AEEA; d) separating mixture F from stage c) by extractive distillation with triethylene glycol into (i) a mixture H comprising MEG; and (ii) a mixture I comprising DETA and TEG.

Stable, solid triamine compositions are disclosed. The pressed, cast, extruded or other solid compositions are suitable for antimicrobial, sanitizing and disinfectant applications. Ready-to-use solutions are obtained by dissolving the solid triamine compositions with water and the methods of use thereof are particularly suitable for cleaning, disinfecting, sanitizing, rinsing and/or lubricating. Beneficially, the solid triamine compositions are at least partially neutralized, allowing activity of 90% and greater of the biocidal triamine, and provide at least substantially similar or superior performance and micro efficacy to liquid formulations.

Stable, solid triamine compositions are disclosed. The pressed, cast, extruded or other solid compositions are suitable for antimicrobial, sanitizing and disinfectant applications. Ready-to-use solutions are obtained by dissolving the solid triamine compositions with water and the methods of use thereof are particularly suitable for cleaning, disinfecting, sanitizing, rinsing and/or lubricating. Beneficially, the solid triamine compositions are at least partially neutralized, allowing activity of 90% and greater of the biocidal triamine, and provide at least substantially similar or superior performance and micro efficacy to liquid formulations.

Stable, solid triamine compositions are disclosed. The pressed, cast, extruded or other solid compositions are suitable for antimicrobial, sanitizing and disinfectant applications. Ready-to-use solutions are obtained by dissolving the solid triamine compositions with water and the methods of use thereof are particularly suitable for cleaning, disinfecting, sanitizing, rinsing and/or lubricating. Beneficially, the solid triamine compositions are at least partially neutralized, allowing activity of 90% and greater of the biocidal triamine, and provide at least substantially similar or superior performance and micro efficacy to liquid formulations.

A catalyst composition comprising at least one compound with a general formula I:

##STR00001##

wherein A is N—R.sup.3, R.sup.3 is C.sub.1-C.sub.8 linear or branched, x=0-6, n and m are each independently 1 to 6, R.sup.1 and R.sup.2 are each independently C.sub.2-C.sub.8 alkyl, and R.sup.4 and R.sup.5 are —CH.sub.3 groups; or A=O, x=0-6. n and m are each independently 1 to 6. R.sup.1 and R.sup.2 are each independently C.sub.2-C.sub.8 alkyl, and R.sup.4 and R.sup.5 are —CH.sub.3 groups; or A=O or N—R.sup.3, R.sup.3 is C.sub.1-C.sub.8 linear or branched, and N(R.sup.1-R.sup.4) and N(R.sup.2-R.sup.5) each independently represent a C.sub.3-C.sub.7 ring amine moiety of the type:

##STR00002##

Tertiary amine and quaternary ammonium compounds of Formula I and/or Formula II are provided. The present technology also provides compositions that include one or more of the compounds that may be useful for electronics processing (e.g., semiconductor processing composition), cleaning, stripping, degreasing, or a combination of two or more thereof. The compounds of Formula I and/or Formula II may be useful as a low toxicity substitute for tetramethylammonium hydroxide.

Tertiary amine and quaternary ammonium compounds of Formula I and/or Formula II are provided. The present technology also provides compositions that include one or more of the compounds that may be useful for electronics processing (e.g., semiconductor processing composition), cleaning, stripping, degreasing, or a combination of two or more thereof. The compounds of Formula I and/or Formula II may be useful as a low toxicity substitute for tetramethylammonium hydroxide.

The present disclosure pertains to a process for manufacturing ethyleneamine compounds selected from the group of ethyleneamines and hydroxyethylethyleneamines wherein the process comprises two reaction sequences.

The present disclosure pertains to a process for manufacturing ethyleneamine compounds selected from the group of ethyleneamines and hydroxyethylethyleneamines wherein the process comprises two reaction sequences.