A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R.sup.1, R.sup.2, and R.sup.3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X.sup.1, X.sup.2, and X.sup.3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R.sup.4 represents a hydrocarbon group having 1 to 20 carbon atoms and R.sup.5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R.sup.4 and R.sup.5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R.sup.4 and R.sup.5 bond; n is 0 or 1; A.sup.− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R.sup.7)CO—.

##STR00001##

The present disclosure provides 1) an enantiomerically purified compound SRR G-1, or a derivative thereof, including specific crystal forms, salts and co-crystals that modulates G protein-coupled estrogen receptor activity, 2) pharmaceutical and cosmetic compositions comprising an enantiomerically purified SRR G-1, or a derivative thereof, and 3) methods of treating or preventing disease states and conditions and cosmetic conditions mediated through these receptors and related methods thereof in humans and animals.

A radiation-sensitive resin composition includes: a resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds represented by formulae (1) to (3), provided that the compound represented by formula (1) and the compound represented by formula (3) within the scope of the compound represented by formula (2) are excluded. In the formulae (1) to (3), R.sup.1, R.sup.2 and R.sup.3 are each independently a group having a cyclic structure; X.sup.11, X.sup.12, X.sup.21, X.sup.22, X.sup.31 and X.sup.32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, provided that both X.sup.11 and X.sup.12, both X.sup.21 and X.sup.22, and both X.sup.31 and X.sup.32 are not a hydrogen atom, respectively. ##STR00001##

A radiation-sensitive resin composition includes: a resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds represented by formulae (1) to (3), provided that the compound represented by formula (1) and the compound represented by formula (3) within the scope of the compound represented by formula (2) are excluded. In the formulae (1) to (3), R.sup.1, R.sup.2 and R.sup.3 are each independently a group having a cyclic structure; X.sup.11, X.sup.12, X.sup.21, X.sup.22, X.sup.31 and X.sup.32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, provided that both X.sup.11 and X.sup.12, both X.sup.21 and X.sup.22, and both X.sup.31 and X.sup.32 are not a hydrogen atom, respectively. ##STR00001##

LSD derivative compounds and polymorphs thereof, methods for their synthesis, compositions and treatment of diseases and disorders are described herein, the compounds having the structure of Formula I:

##STR00001##

including pharmaceutically acceptable salts, hydrates, solvates, tautomers, enantiomers, diastereomers, racemates, polymorphs or combinations thereof; wherein: R.sup.1 to R.sup.14 are each independently selected from H, or a substituted or unsubstituted hydrocarbon group and X is selected from a halo group.

A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R.sup.1-R.sup.3 are each independently a group having a cyclic structure. X.sup.11-X.sup.32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of X.sup.11 or X.sup.12, at least one of X.sup.21 or X.sup.22, and at least one of X.sup.31 or X.sup.32 are not a hydrogen atom, respectively. A.sup.11-A.sup.32 are each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

##STR00001##

A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R.sup.1-R.sup.3 are each independently a group having a cyclic structure. X.sup.11-X.sup.32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of X.sup.11 or X.sup.12, at least one of X.sup.21 or X.sup.22, and at least one of X.sup.31 or X.sup.32 are not a hydrogen atom, respectively. A.sup.11-A.sup.32 are each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

##STR00001##

Disclosed are stemospironine salts of Formula 1: wherein HX represents HCl, HBr, L-tartaric acid, D-tartaric acid, sulfuric acid, (+)-(1S)-10-camphorsulfonic acid, ethanesulfonic acid and ethane-1,2-disulfonic acid. This invention also provides crystalline polymorph forms of the compound of Formula 1 wherein HX is HCl, stemospironine hydrochloride. This invention also provides a new crystalline form of the compound of Formula 2, stemospironine free base: Also disclosed are compositions containing one or more compounds of Formula 1, methods for controlling cough comprising administering a therapeutically effective amount of a compound of Formula 1, and methods for preparing compounds of Formula 1. Also disclosed is a method for preparing crystalline stemospironine hydrochloride polymorph Form II from stemospironine hydrochloride polymorph Form I. ##STR00001##

Disclosed are stemospironine salts of Formula 1: wherein HX represents HCl, HBr, L-tartaric acid, D-tartaric acid, sulfuric acid, (+)-(1S)-10-camphorsulfonic acid, ethanesulfonic acid and ethane-1,2-disulfonic acid. This invention also provides crystalline polymorph forms of the compound of Formula 1 wherein HX is HCl, stemospironine hydrochloride. This invention also provides a new crystalline form of the compound of Formula 2, stemospironine free base: Also disclosed are compositions containing one or more compounds of Formula 1, methods for controlling cough comprising administering a therapeutically effective amount of a compound of Formula 1, and methods for preparing compounds of Formula 1. Also disclosed is a method for preparing crystalline stemospironine hydrochloride polymorph Form II from stemospironine hydrochloride polymorph Form I. ##STR00001##

The present disclosure provides 1) an enantiomerically purified compound SRR G-1, or a derivative thereof, including specific crystal forms, salts and co-crystals that modulates G protein-coupled estrogen receptor activity, 2) pharmaceutical and cosmetic compositions comprising an enantiomerically purified SRR G-1, or a derivative thereof, and 3) methods of treating or preventing disease states and conditions and cosmetic conditions mediated through these receptors and related methods thereof in humans and animals.