A novel onium salt and a resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition is reduced in acid diffusion and improved in exposure latitude, MEF, and LWR.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a morpholino group offers dimensional stability on PPD and a satisfactory resolution.

A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a morpholino group offers dimensional stability on PPD and a satisfactory resolution.

A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Mixed dimer and mixed oligomer compositions are disclosed. The mixed dimer compositions comprise a monosulfonated cross-dimer or a salt thereof. The monosulfonated cross-dimer is a reaction product of (a) an alpha-olefin sulfonic acid (AOS acid); and (b) an unsulfonated olefin, an unsulfonated olefin precursor, or a functionalized olefin. The mixed oligomer compositions comprise a mono- or polysulfonated cross-oligomer or a salt thereof. The mono- or polysulfonated cross-oligomer is a reaction product of (a) an AOS acid; and (b) an unsulfonated diolefin or an unsulfonated diolefin precursor. Various methods for making the mixed dimer or oligomer compositions are described. Salts of the mixed dimer and oligomer compositions are useful surfactants for foams used in oilfield and other applications. The foams have improved high-temperature stability when compared with foams from AOS dimer acid salts.

Mixed dimer and mixed oligomer compositions are disclosed. The mixed dimer compositions comprise a monosulfonated cross-dimer or a salt thereof. The monosulfonated cross-dimer is a reaction product of (a) an alpha-olefin sulfonic acid (AOS acid); and (b) an unsulfonated olefin, an unsulfonated olefin precursor, or a functionalized olefin. The mixed oligomer compositions comprise a mono- or polysulfonated cross-oligomer or a salt thereof. The mono- or polysulfonated cross-oligomer is a reaction product of (a) an AOS acid; and (b) an unsulfonated diolefin or an unsulfonated diolefin precursor. Various methods for making the mixed dimer or oligomer compositions are described. Salts of the mixed dimer and oligomer compositions are useful surfactants for foams used in oilfield and other applications. The foams have improved high-temperature stability when compared with foams from AOS dimer acid salts.

Compounds, pharmaceutical compositions, methods and kits are described for treating or preventing neurodegenerative diseases such as Alzheimer's disease.

Compounds, pharmaceutical compositions, methods and kits are described for treating or preventing neurodegenerative diseases such as Alzheimer's disease.

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.