Patent classifications
C07C309/20
AMINO-QUINONE ANTIPOLYMERANTS AND METHODS OF USING
Described are methods and composition for inhibiting polymerization of a monomer (e.g., styrene) composition using an aminated quinone antipolymerant, such as an aminated benzoquinone or aminated naphthoquinone antipolymerant having one or more secondary or tertiary amine group(s). The aminated quinone antipolymerant can be used with little or no nitroxyl group containing antipolymerant yet still provide excellent antipolymerant activity in a monomer-containing composition.
FINISHING AGENT COMPOSITION FOR TEXTILE PRODUCTS
The present invention provides a fiber modifier composed of an internal olefin sulfonate having 17 or more and 24 or less carbons.
FINISHING AGENT COMPOSITION FOR TEXTILE PRODUCTS
The present invention provides a fiber modifier composed of an internal olefin sulfonate having 17 or more and 24 or less carbons.
METHOD FOR TREATING TEXTILE PRODUCT
The present invention is a method for washing a textile product, including the following step 1 and step 2: step 1: a step of treating the textile product by contacting the textile product with treating liquid 1 obtained by mixing water and (A) an internal olefin sulfonate having 17 or more and 24 or less carbons [hereinafter, referred to as component (A)]; and step 2: a step of treating the textile product treated in step 1 by contacting the textile product with treating liquid 2 obtained by mixing water and a finishing agent composition for textile products.
Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition
A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition
A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
SALTS AND PRODRUGS OF 1-METHYL-D-TRYPTOPHAN
Presently provided are indoximod prodrug and salt compounds and pharmaceutical compositions comprising salts and prodrugs of indoximod, that produce enhanced plasma concentration and exposure to indoximod compared to direct administration of indoximod, in patients in need of treatment of immunosuppression mediated by the indoleamine-2,3-dioxygenase pathway, such as patients with cancer or chronic infectious diseases.
SALTS AND PRODRUGS OF 1-METHYL-D-TRYPTOPHAN
Presently provided are indoximod prodrug and salt compounds and pharmaceutical compositions comprising salts and prodrugs of indoximod, that produce enhanced plasma concentration and exposure to indoximod compared to direct administration of indoximod, in patients in need of treatment of immunosuppression mediated by the indoleamine-2,3-dioxygenase pathway, such as patients with cancer or chronic infectious diseases.
Internal olefin sulfonate composition
Provided are an internal olefin sulfonate composition which is capable of sufficiently enhancing foamability, foam dissipation property free from a slimy feeling during rinsing, and a feel after cleansing and subsequent drying, and a cleansing composition containing the same. The internal olefin sulfonate composition comprises (A) an internal olefin sulfonate having 16 carbon atoms and (B) an internal olefin sulfonate having 12 carbon atoms, in which a content mass ratio of the component (A) to the component (B), (A/B), is from 10/90 to 90/10.
Internal olefin sulfonate composition
Provided are an internal olefin sulfonate composition which is capable of sufficiently enhancing foamability, foam dissipation property free from a slimy feeling during rinsing, and a feel after cleansing and subsequent drying, and a cleansing composition containing the same. The internal olefin sulfonate composition comprises (A) an internal olefin sulfonate having 16 carbon atoms and (B) an internal olefin sulfonate having 12 carbon atoms, in which a content mass ratio of the component (A) to the component (B), (A/B), is from 10/90 to 90/10.