C07C309/20

POLYMORPHIC COMPOUNDS AND USES THEREOF

The present invention provides freebase and salt forms, and compositions and methods thereof, useful for treating various conditions, in which aldehyde toxicity is implicated in the pathogenesis, by the administration of small molecule therapeutics acting as a scavenger for toxic aldehydes.

Resist composition, patterning process, and barium, cesium and cerium salts

A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of -fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

Resist composition, patterning process, and barium, cesium and cerium salts

A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of -fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

ALPHA-OLEFIN SULFONIC DIMER ACID PROCESS

Methods of making an alpha-olefin sulfonic dimer acid (AOS dimer acid) are disclosed. In one method, an alpha-olefin is sulfonated, preferably with sulfur trioxide, to produce a mixture comprising an alpha-olefin sulfonic acid (AOS acid) and sulfur dioxide. This mixture is then heated while purging sulfur dioxide and hydrogen sulfide from the reactor to produce an AOS dimer acid composition. In another method, the AOS acid mixture is treated to remove sulfur dioxide and is then heated to produce an AOS dimer acid composition. With either method, the resulting AOS dimer acid composition has at least a 30% decrease in the level of elemental sulfur when compared with that of an AOS dimer acid composition prepared by a similar process in the absence of any active removal of sulfur dioxide or hydrogen sulfide. AOS dimer acid compositions and salts of the AOS dimer acids, which are useful surfactants for oilfield and other applications, are also disclosed.

ALPHA-OLEFIN SULFONIC DIMER ACID PROCESS

Methods of making an alpha-olefin sulfonic dimer acid (AOS dimer acid) are disclosed. In one method, an alpha-olefin is sulfonated, preferably with sulfur trioxide, to produce a mixture comprising an alpha-olefin sulfonic acid (AOS acid) and sulfur dioxide. This mixture is then heated while purging sulfur dioxide and hydrogen sulfide from the reactor to produce an AOS dimer acid composition. In another method, the AOS acid mixture is treated to remove sulfur dioxide and is then heated to produce an AOS dimer acid composition. With either method, the resulting AOS dimer acid composition has at least a 30% decrease in the level of elemental sulfur when compared with that of an AOS dimer acid composition prepared by a similar process in the absence of any active removal of sulfur dioxide or hydrogen sulfide. AOS dimer acid compositions and salts of the AOS dimer acids, which are useful surfactants for oilfield and other applications, are also disclosed.

Sulfonium compound, resist composition, and patterning process

A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.

Sulfonium compound, resist composition, and patterning process

A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.

SALTS AND PRODRUGS OF 1-METHYL-D-TRYPTOPHAN

Presently provided are indoximod prodrug and salt compounds and pharmaceutical compositions comprising salts and prodrugs of indoximod, that produce enhanced plasma concentration and exposure to indoximod compared to direct administration of indoximod, in patients in need of treatment of immunosuppression mediated by the indoleamine-2,3-dioxygenase pathway, such as patients with cancer or chronic infectious diseases.

SALTS AND PRODRUGS OF 1-METHYL-D-TRYPTOPHAN

Presently provided are indoximod prodrug and salt compounds and pharmaceutical compositions comprising salts and prodrugs of indoximod, that produce enhanced plasma concentration and exposure to indoximod compared to direct administration of indoximod, in patients in need of treatment of immunosuppression mediated by the indoleamine-2,3-dioxygenase pathway, such as patients with cancer or chronic infectious diseases.

Method for producing olefin
09968914 · 2018-05-15 · ·

The present invention relates to a process for producing olefins, including the step of subjecting an alcohol having not less than 8 and not more than 22 carbon atoms to dehydration reaction in the presence of a solid acid catalyst, in which the solid acid catalyst includes aluminum oxide and an oxide of an element having an electronegativity higher than that of aluminum which is supported on the aluminum oxide.