Patent classifications
C
CHEMISTRY; METALLURGY
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C07
ORGANIC CHEMISTRY
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C07C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
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309/00
Sulfonic acids; Halides, esters, or anhydrides thereof
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C07C309/02
having sulfo groups bound to acyclic carbon atoms
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C07C309/23
of an unsaturated carbon skeleton containing rings other than six-membered aromatic rings
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C07C309/23

RESIST COMPOSITION AND PATTERNING PROCESS
20170108774 · 2017-04-20 · ·

A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.