A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R.sup.1-R.sup.3 are each independently a group having a cyclic structure. X.sup.11-X.sup.32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of X.sup.11 or X.sup.12, at least one of X.sup.21 or X.sup.22, and at least one of X.sup.31 or X.sup.32 are not a hydrogen atom, respectively. A.sup.11-A.sup.32 are each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

##STR00001##

A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R.sup.1-R.sup.3 are each independently a group having a cyclic structure. X.sup.11-X.sup.32 are each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of X.sup.11 or X.sup.12, at least one of X.sup.21 or X.sup.22, and at least one of X.sup.31 or X.sup.32 are not a hydrogen atom, respectively. A.sup.11-A.sup.32 are each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

##STR00001##

The present invention relates to an improved, efficient, scalable process to prepare intermediate compounds, such as compound 5M, having the structure

##STR00001##

useful for the synthesis of compounds that target KRAS G12C mutations, such as

##STR00002##

The present invention relates to an improved, efficient, scalable process to prepare intermediate compounds, such as compound 5M, having the structure

##STR00001##

useful for the synthesis of compounds that target KRAS G12C mutations, such as

##STR00002##

This disclosure is directed, at least in part, to GPR40 agonists useful for the treatment of conditions or disorders involving the gut-brain axis. In some embodiments, the GPR40 agonists are gut-restricted compounds. In some embodiments, the GPR40 agonists are full agonists or partial agonists. In some embodiments, the condition or disorder is a metabolic disorder, such as diabetes, obesity, nonalcoholic steatohepatitis (NASH), or a nutritional disorder such as short bowel syndrome.

This disclosure is directed, at least in part, to GPR40 agonists useful for the treatment of conditions or disorders involving the gut-brain axis. In some embodiments, the GPR40 agonists are gut-restricted compounds. In some embodiments, the GPR40 agonists are full agonists or partial agonists. In some embodiments, the condition or disorder is a metabolic disorder, such as diabetes, obesity, nonalcoholic steatohepatitis (NASH), or a nutritional disorder such as short bowel syndrome.

The present invention relates to an improved, efficient, scalable process to prepare intermediate compounds, such as compound 5M, having the structure ##STR00001##
useful for the synthesis of compounds that target KRAS G12C mutations, such as ##STR00002##

The present invention relates to an improved, efficient, scalable process to prepare intermediate compounds, such as compound 5M, having the structure ##STR00001##
useful for the synthesis of compounds that target KRAS G12C mutations, such as ##STR00002##

An object of the present invention is to provide a highly practical electrolyte solution which has high oxidation resistance and enables dissolution-precipitation of magnesium to proceed repeatedly and stably.

The present invention relates to an electrolyte solution for a magnesium battery comprising a mixture of a compound represented by the general formula [1], a Lewis acid or a compound represented by the general formula [4], and a solvent; an electrochemical device containing the electrolyte solution; and a compound represented by the general formula [1].

##STR00001##

[In the general formula [1], X.sup.1 represents a halogeno group, and R.sup.1 represents an alkyl group having 1 to 10 carbon atoms, which may have a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 represents a halogeno group); a haloalkyl group having 1 to 10 carbon atoms, which may have a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 is the same as described above); an aryl group having 6 to 14 carbon atoms, which may have an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogeno group, or a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 is the same as described above); or a biphenyl group which may have a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 is the same as described above).]

Mg[N(SO.sub.2R.sup.4).sub.2].sub.2   [4]

(In the general formula [4], four R.sup.4's each independently represent an alkyl group having 1 to 6 carbon atoms, a perfluoroalkyl group having 1 to 6 carbon atoms, a phenyl group, or a perfluorophenyl group.)

An object of the present invention is to provide a highly practical electrolyte solution which has high oxidation resistance and enables dissolution-precipitation of magnesium to proceed repeatedly and stably.

The present invention relates to an electrolyte solution for a magnesium battery comprising a mixture of a compound represented by the general formula [1], a Lewis acid or a compound represented by the general formula [4], and a solvent; an electrochemical device containing the electrolyte solution; and a compound represented by the general formula [1].

##STR00001##

[In the general formula [1], X.sup.1 represents a halogeno group, and R.sup.1 represents an alkyl group having 1 to 10 carbon atoms, which may have a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 represents a halogeno group); a haloalkyl group having 1 to 10 carbon atoms, which may have a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 is the same as described above); an aryl group having 6 to 14 carbon atoms, which may have an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogeno group, or a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 is the same as described above); or a biphenyl group which may have a group represented by —SO.sub.3MgX.sup.2 (X.sup.2 is the same as described above).]

Mg[N(SO.sub.2R.sup.4).sub.2].sub.2   [4]

(In the general formula [4], four R.sup.4's each independently represent an alkyl group having 1 to 6 carbon atoms, a perfluoroalkyl group having 1 to 6 carbon atoms, a phenyl group, or a perfluorophenyl group.)