Patent classifications
C07C309/24
Indanes as PD-L1 inhibitors
Compounds represented by Formula (I) or (II): ##STR00001##
are provided herein, or a pharmaceutically acceptable salt, or a prodrug or bioisostere thereof; wherein R.sup.1, R.sup.2a, R.sup.2b, R.sup.2c, R.sup.3, R.sup.4, R.sup.5, R.sup.6a, R.sup.6b, R.sup.2a, R.sup.2b, R.sup.2c, R.sup.3, R.sup.4, R.sup.5, R.sup.6a, R.sup.6b, Y, Y, and the subscripts m and n are as defined herein.
Indanes as PD-L1 inhibitors
Compounds represented by Formula (I) or (II): ##STR00001##
are provided herein, or a pharmaceutically acceptable salt, or a prodrug or bioisostere thereof; wherein R.sup.1, R.sup.2a, R.sup.2b, R.sup.2c, R.sup.3, R.sup.4, R.sup.5, R.sup.6a, R.sup.6b, R.sup.2a, R.sup.2b, R.sup.2c, R.sup.3, R.sup.4, R.sup.5, R.sup.6a, R.sup.6b, Y, Y, and the subscripts m and n are as defined herein.
Novel Process for the Preparation of Gadolinium Complex of (4S)-4-(4-Ethoxybenzyl)-3,6,9-Tris(Carboxylatomethyl)-3,6,9-Triazaundecanedioic Acid Disodium (Gadoxetate Disodium)
The present invention discloses a novel process for the preparation of gadolinium complex of (4 S)-4-(4-Ethoxybenzyl)-3,6,9-tris(carboxylatomethyl)-3,6,9-triazaundecanedioic acid disodium of formula 1 and novel intermediates thereof.
##STR00001##
Novel Process for the Preparation of Gadolinium Complex of (4S)-4-(4-Ethoxybenzyl)-3,6,9-Tris(Carboxylatomethyl)-3,6,9-Triazaundecanedioic Acid Disodium (Gadoxetate Disodium)
The present invention discloses a novel process for the preparation of gadolinium complex of (4 S)-4-(4-Ethoxybenzyl)-3,6,9-tris(carboxylatomethyl)-3,6,9-triazaundecanedioic acid disodium of formula 1 and novel intermediates thereof.
##STR00001##
Mixed dimers from alpha-olefin sulfonic acids
Mixed dimer and mixed oligomer compositions are disclosed. The mixed dimer compositions comprise a monosulfonated cross-dimer or a salt thereof. The monosulfonated cross-dimer is a reaction product of (a) an alpha-olefin sulfonic acid (AOS acid); and (b) an unsulfonated olefin, an unsulfonated olefin precursor, or a functionalized olefin. The mixed oligomer compositions comprise a mono- or polysulfonated cross-oligomer or a salt thereof. The mono- or polysulfonated cross-oligomer is a reaction product of (a) an AOS acid; and (b) an unsulfonated diolefin or an unsulfonated diolefin precursor. Various methods for making the mixed dimer or oligomer compositions are described. Salts of the mixed dimer and oligomer compositions are useful surfactants for foams used in oilfield and other applications. The foams have improved high-temperature stability when compared with foams from AOS dimer acid salts.
Mixed dimers from alpha-olefin sulfonic acids
Mixed dimer and mixed oligomer compositions are disclosed. The mixed dimer compositions comprise a monosulfonated cross-dimer or a salt thereof. The monosulfonated cross-dimer is a reaction product of (a) an alpha-olefin sulfonic acid (AOS acid); and (b) an unsulfonated olefin, an unsulfonated olefin precursor, or a functionalized olefin. The mixed oligomer compositions comprise a mono- or polysulfonated cross-oligomer or a salt thereof. The mono- or polysulfonated cross-oligomer is a reaction product of (a) an AOS acid; and (b) an unsulfonated diolefin or an unsulfonated diolefin precursor. Various methods for making the mixed dimer or oligomer compositions are described. Salts of the mixed dimer and oligomer compositions are useful surfactants for foams used in oilfield and other applications. The foams have improved high-temperature stability when compared with foams from AOS dimer acid salts.
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATION-SENSITIVE ACID GENERATING AGENT
A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R.sup.1 represents a ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.510.sup.28 m.sup.3.
[A.sub.xMR.sup.1.sub.y](1)
METHODS, COMPOUNDS, COMPOSITIONS AND VEHICLES FOR DELIVERING 3-AMINO-1-PROPANESULFONIC ACID
The invention relates to methods, compounds, compositions and vehicles for delivering 3-amino-1-propanesulfonic acid (3APS) in a subject, preferably a human subject. The invention encompasses compound that will yield or generate 3APS, either in vitro or in vivo. Preferred compounds include amino acid prodrugs of 3APS for use, including but not limited to the prevention and treatment of Alzheimer's disease
METHODS, COMPOUNDS, COMPOSITIONS AND VEHICLES FOR DELIVERING 3-AMINO-1-PROPANESULFONIC ACID
The invention relates to methods, compounds, compositions and vehicles for delivering 3-amino-1-propanesulfonic acid (3APS) in a subject, preferably a human subject. The invention encompasses compound that will yield or generate 3APS, either in vitro or in vivo. Preferred compounds include amino acid prodrugs of 3APS for use, including but not limited to the prevention and treatment of Alzheimer's disease
Resist composition and patterning process
A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.