Patent classifications
C07C309/27
Salts of an epidermal growth factor receptor kinase inhibitor
The present invention provides a salt form and compositions thereof, which are useful as an inhibitor of EGFR kinases and which exhibits desirable characteristics for the same.
Compositions and methods for treating and preventing neurodegenerative disorders
Compounds, pharmaceutical compositions, methods and kits are described for treating or preventing neurodegenerative diseases such as Alzheimer's disease.
Compositions and methods for treating and preventing neurodegenerative disorders
Compounds, pharmaceutical compositions, methods and kits are described for treating or preventing neurodegenerative diseases such as Alzheimer's disease.
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTO-DEGRADABLE BASE
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L.sup.1 represents an ester group, CONR.sup.3, a (thio)ether group, or a sulfonyl group. R.sup.4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R.sup.5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R.sup.5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R.sup.5s. L.sup.2 represents a single bond or a divalent linking group.
##STR00001##
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTO-DEGRADABLE BASE
A radiation-sensitive composition contains a polymer having an acid-releasable group, and a compound (Q) represented by formula (1). In the formula (1), L.sup.1 represents an ester group, CONR.sup.3, a (thio)ether group, or a sulfonyl group. R.sup.4 represents a hydrogen atom, a substituted or unsubstituted C1 to C20 monovalent hydrocarbon group, a halogen atom, a hydroxy group, or a nitro group. R.sup.5 represents a C1 to C20 monovalent hydrocarbon group, a C1 to C20 monovalent halogenated hydrocarbon group, or a halogen atom, and optionally two R.sup.5s taken together represent an alicyclic structure together with the carbon atom(s) between the two R.sup.5s. L.sup.2 represents a single bond or a divalent linking group.
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SALTS OF AN EPIDERMAL GROWTH FACTOR RECEPTOR KINASE INHIBITOR
The present invention provides a salt form and compositions thereof, which are useful as an inhibitor of EGFR kinases and which exhibits desirable characteristics for the same.
SALTS OF AN EPIDERMAL GROWTH FACTOR RECEPTOR KINASE INHIBITOR
The present invention provides a salt form and compositions thereof, which are useful as an inhibitor of EGFR kinases and which exhibits desirable characteristics for the same.
Salts of an epidermal growth factor receptor kinase inhibitor
The present invention provides a salt form and compositions thereof, which are useful as an inhibitor of EGFR kinases and which exhibits desirable characteristics for the same.
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit (I) which includes an acid-dissociable group; and a solvent. W is a cyclic structure having 3 to 40 ring members formed together with the two carbon atoms; a formula between the two carbon atoms below represents a single bond or a double bond, , A is one of groups represented by formulae (A-1) to (A-7); R.sup.1 is a monovalent organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a carboxy group, a hydroxy group, an amino group, a halogen atom, or a thiol group, when there are a plurality of R.sup.1s, the plurality of R.sup.1s are same as or different from each other; m.sub.1 is an integer of 0 to 4; and Z.sup.+ is a monovalent radiation-sensitive onium cation.
##STR00001##
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND
A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit (I) which includes an acid-dissociable group; and a solvent. W is a cyclic structure having 3 to 40 ring members formed together with the two carbon atoms; a formula between the two carbon atoms below represents a single bond or a double bond, , A is one of groups represented by formulae (A-1) to (A-7); R.sup.1 is a monovalent organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a carboxy group, a hydroxy group, an amino group, a halogen atom, or a thiol group, when there are a plurality of R.sup.1s, the plurality of R.sup.1s are same as or different from each other; m.sub.1 is an integer of 0 to 4; and Z.sup.+ is a monovalent radiation-sensitive onium cation.
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