Compositions and methods for inhibiting the DNA repair protein complex, ERCC1-XPF, and methods to enhance clinical responses to anticancer drugs that interact with DNA such as cisplatin, and to overcome drug resistance due to DNA repair mechanisms, are described.

Lactamium based ionic liquids are described. They comprise at least one of: the reaction product of a lactam compound having a formula (IV) ##STR00001## wherein n is 1, 2 or 4 to 8, and a Brøsted acid HX; or a Brøsted acid HX, where X is a halide, and a metal halide; where the reaction product is p-toluenesulfonate, halide, or the halometallate; or the reaction product of a lactam compound having a formula (V) ##STR00002## wherein the ring has at least C—C one double bond, and n is 1 to 8, and a Brøsted acid HX; or a Brøsted acid HX, where X is a halide, and a metal halide; or the reaction product of a lactam compound having a formula (VI) ##STR00003## wherein n is 1 to 8, m is 1 to 8, and the rings can be saturated or unsaturated; and a Brøsted acid HX; or a Brøsted acid HX, where X is a halide, and a metal halide.

Lactamium based ionic liquids are described. They comprise at least one of: the reaction product of a lactam compound having a formula (IV) ##STR00001## wherein n is 1, 2 or 4 to 8, and a Brøsted acid HX; or a Brøsted acid HX, where X is a halide, and a metal halide; where the reaction product is p-toluenesulfonate, halide, or the halometallate; or the reaction product of a lactam compound having a formula (V) ##STR00002## wherein the ring has at least C—C one double bond, and n is 1 to 8, and a Brøsted acid HX; or a Brøsted acid HX, where X is a halide, and a metal halide; or the reaction product of a lactam compound having a formula (VI) ##STR00003## wherein n is 1 to 8, m is 1 to 8, and the rings can be saturated or unsaturated; and a Brøsted acid HX; or a Brøsted acid HX, where X is a halide, and a metal halide.

A method for the manufacture of a sulfonated phenol for use as a cumene hydroperoxide decomposition catalyst can comprise: combining phenol and a sulfonating agent at a first temperature that is 1° C. to 15° C. higher than a melting temperature of the phenol, to form a reaction mixture at the first temperature; reducing the first temperature of the reaction mixture to a second temperature that is 10 to 40° C. lower than the first temperature; and forming the sulfonated phenol at the second temperature.

A method for the manufacture of a sulfonated phenol for use as a cumene hydroperoxide decomposition catalyst can comprise: combining phenol and a sulfonating agent at a first temperature that is 1° C. to 15° C. higher than a melting temperature of the phenol, to form a reaction mixture at the first temperature; reducing the first temperature of the reaction mixture to a second temperature that is 10 to 40° C. lower than the first temperature; and forming the sulfonated phenol at the second temperature.

The invention relates to a compound or a salt thereof of formula [1],

##STR00001##

a fungicidal composition containing the compound or a salt thereof, a method for controlling plant disease occurring from phytopathogenic microorganism including the step of applying the fungicidal composition and a production method of the compound.

Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1).

[In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

##STR00001##

Provided are: a non-ionic photoacid generator containing a sulfonate compound having a high photosensitivity to i lines, exhibiting excellent heat-resistance stability, and exhibiting excellent solubility in a hydrophobic material; and a resin composition for photolithography containing the same. The present invention is a sulfonate compound characterized by being represented by general formula (1).

[In formula (1), R1 represents an aryl group having 6 to 18 carbon atoms or a heterocyclic hydrocarbon group having 4 to 20 carbon atoms. R2 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, or an aryl group having 6 to 18 carbon atoms. R3 represents a hydrocarbon group having 1 to 18 carbon atoms (in which some or all hydrogen atoms may be substituted with fluorine).]

##STR00001##

The invention relates to an overall enantio-specific synthesis of 4-chlorokynurenine compounds, in particular L-4-chlorokynurenine, with improved yields. Large-scale syntheses are disclosed. The invention also relates to novel intermediates in the synthesis of L-4-chlorokynurenine.

The invention relates to an overall enantio-specific synthesis of 4-chlorokynurenine compounds, in particular L-4-chlorokynurenine, with improved yields. Large-scale syntheses are disclosed. The invention also relates to novel intermediates in the synthesis of L-4-chlorokynurenine.