C07C311/09

Resist composition and patterning process
11733608 · 2023-08-22 · ·

A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone. ##STR00001##

Resist composition and patterning process
11733608 · 2023-08-22 · ·

A resist composition comprising a base polymer and a quencher containing an onium salt of iodized benzene ring-containing fluorosulfonamide offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone. ##STR00001##

ANTIOXIDANT INFLAMMATION MODULATORS: OLEANOLIC ACID DERIVATIVES WITH AMINO AND OTHER MODIFICATIONS AT C-17

This invention provides, but is not limited to, novel oleanolic acid derivatives having the formula:

##STR00001##

wherein the variables are defined herein. Also provided are pharmaceutical compositions, kits and articles of manufacture comprising such compounds, methods and intermediates useful for making the compounds, and methods of using the compounds and compositions.

SUBSTITUTED HALOALKYL SULFONANILIDE HERBICIDES

Disclosed are compounds of Formula 1, all stereoisomers, N-oxides, and salts thereof,

##STR00001##

wherein G is CONR.sup.5R.sup.6 or selected from

##STR00002## and R.sup.1 through R.sup.18, R.sup.f and G are as defined in the Disclosure.

Also disclosed are compositions containing the compounds of Formula 1 and methods for controlling undesired vegetation comprising contacting the undesired vegetation or its environment with an effective amount of a compound or a composition of the invention.

Processes for producing high-purity N,N-dialkyl perfluoroalkylsulfonamide

Processes for producing a N,N-dialkyl perfluoroalkyl-sulfonamide product of the formula R.sub.f—S(O).sub.2—NR.sub.aR.sub.b (I) in which R.sub.f represents fully or partially fluorinated alkyl groups with carbon 1 to 12 and R.sub.a and R.sub.b represents linear or branched or cyclic alkyl, alkene or alkyne groups with carbon 1 to 12, wherein R.sub.a=R.sub.b or R.sub.a≠R.sub.b. In some embodiments, a reaction proceeds by contacting a perfluoroalkylsulfonyl halide of the formula: X—S(O).sub.2—R.sub.f, (II), in which X represents F, Cl, Br or I, with dialkylamine of the formula HNR.sub.aR.sub.b, under conditions sufficient to produce the desired N,N-dialkyl perfluoroalkylsulfonamide product of Formula I. In some embodiments, the reaction is carried out using a solvent of Formula I.

Processes for producing high-purity N,N-dialkyl perfluoroalkylsulfonamide

Processes for producing a N,N-dialkyl perfluoroalkyl-sulfonamide product of the formula R.sub.f—S(O).sub.2—NR.sub.aR.sub.b (I) in which R.sub.f represents fully or partially fluorinated alkyl groups with carbon 1 to 12 and R.sub.a and R.sub.b represents linear or branched or cyclic alkyl, alkene or alkyne groups with carbon 1 to 12, wherein R.sub.a=R.sub.b or R.sub.a≠R.sub.b. In some embodiments, a reaction proceeds by contacting a perfluoroalkylsulfonyl halide of the formula: X—S(O).sub.2—R.sub.f, (II), in which X represents F, Cl, Br or I, with dialkylamine of the formula HNR.sub.aR.sub.b, under conditions sufficient to produce the desired N,N-dialkyl perfluoroalkylsulfonamide product of Formula I. In some embodiments, the reaction is carried out using a solvent of Formula I.

Processes for producing high-purity N,N-dialkyl perfluoroalkylsulfonamide

Processes for producing a N,N-dialkyl perfluoroalkyl-sulfonamide product of the formula R.sub.f—S(O).sub.2—NR.sub.aR.sub.b (I) in which R.sub.f represents fully or partially fluorinated alkyl groups with carbon 1 to 12 and R.sub.a and R.sub.b represents linear or branched or cyclic alkyl, alkene or alkyne groups with carbon 1 to 12, wherein R.sub.a=R.sub.b or R.sub.a≠R.sub.b. In some embodiments, a reaction proceeds by contacting a perfluoroalkylsulfonyl halide of the formula: X—S(O).sub.2—R.sub.f, (II), in which X represents F, Cl, Br or I, with dialkylamine of the formula HNR.sub.aR.sub.b, under conditions sufficient to produce the desired N,N-dialkyl perfluoroalkylsulfonamide product of Formula I. In some embodiments, the reaction is carried out using a solvent of Formula I.

ARYL AND PYRIDYL AMIDE PESTICIDES AND COMPOSITIONS THEREOF

The subject matter described herein is directed to compounds, synergistic compositions, and methods for repelling arthropods, such as insects. The compositions comprise aryl and pyridyl-type compounds. The compounds demonstrate strong vapor and topical repellency when applied alone and in synergistic compositions.

ASYMMETRIC ELECTROLYTE SALTS AND BATTERIES INCORPORATING SUCH SALTS

The present technology is directed to fluorinated alkylsulfonamide electrolyte salts with high solubility, conductivity, and electrochemical stability as well as batteries incorporating fluorinated alkylsulfonamide salts. In any aspect and/or embodiment herein of the present technology, the battery may include a separator disposed between the cathode and the anode. The separator may be a porous paper, porous ceramic, or porous polymer separator.

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).