Patent classifications
C07C321/30
Polymerization process of polyarylene sulfide
A method for preparing a polyarylene sulfide includes reacting a methyl 4-(arylthio)aryl sulfoxide compound with sulfuric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid or trifluoromethanesulfonic acid to obtain a polysulfonium intermediate; and demethylating the polysulfonium intermediate to obtain a polyarylene sulfide, wherein the polysulfonium intermediate is demethylated with aqueous HCl, HBr, or HI.
Polymerization process of polyarylene sulfide
A method for preparing a polyarylene sulfide includes reacting a methyl 4-(arylthio)aryl sulfoxide compound with sulfuric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid or trifluoromethanesulfonic acid to obtain a polysulfonium intermediate; and demethylating the polysulfonium intermediate to obtain a polyarylene sulfide, wherein the polysulfonium intermediate is demethylated with aqueous HCl, HBr, or HI.
PHTHALONITRILE COMPOUND
The present application can provide a phthalonitrile compound and a use thereof. The present application can provide a phthalonitrile compound capable of forming a phthalonitrile resin by self-curing or of serving as a curing agent after being mixed with another phthalonitrile compound, and a use of the phthalonitrile compound. The phthalonitrile compound can form a phthalonitrile resin by rapid self-curing even at a low temperature and does not create any defects resulting from the use of a conventional curing agent. Also, the phthalonitrile compound can be applied as a curing agent after being mixed with another compound, in which case, even if the content of the compound applied as a curing agent increases, the total content of the phthalonitrile resin obtained does not decrease, and thus a resin exhibiting an excellent degree of cure can be provided.
PHTHALONITRILE COMPOUND
The present application can provide a phthalonitrile compound and a use thereof. The present application can provide a phthalonitrile compound capable of forming a phthalonitrile resin by self-curing or of serving as a curing agent after being mixed with another phthalonitrile compound, and a use of the phthalonitrile compound. The phthalonitrile compound can form a phthalonitrile resin by rapid self-curing even at a low temperature and does not create any defects resulting from the use of a conventional curing agent. Also, the phthalonitrile compound can be applied as a curing agent after being mixed with another compound, in which case, even if the content of the compound applied as a curing agent increases, the total content of the phthalonitrile resin obtained does not decrease, and thus a resin exhibiting an excellent degree of cure can be provided.
ANTHRANILIC ACID ESTER COMPOUND OR SALT THEREOF, AGRICULTURAL AND HORTICULTURAL MICROBICIDE COMPRISING THE COMPOUND, AND METHOD FOR USING THE MICROBICIDE
In crop production in the fields of agriculture, horticulture and the like, the damage caused by diseases etc. is still immense, and diseases resistant to existing microbicides have emerged. Under such circumstances, the development of novel agricultural and horticultural microbicides is desired.
The present invention provides an anthranilic acid ester compound represented by the general formula (1):
##STR00001## (wherein A.sup.1, A.sup.3 and A.sup.4 each represent a CH group, A.sup.2 represents a C-haloalkyl group, R.sup.1 represents an alkyl group, R.sup.3 represents a hydrogen atom or an acyl group, R.sup.4, R.sup.5 and R.sup.7 each represent a hydrogen atom, R.sup.6 represents a haloalkyl group, Z represents an alkyl group, and m represents 0, 1 or 2), or a salt thereof, an agricultural and horticultural microbicide comprising the compound or a salt thereof as an active ingredient, and a method for using the microbicide.
MODULATORS OF A POTASSIUM CHANNEL AND OF TRPV1 CHANNEL AND USES THEREOF
Compounds represented by Formula I:
##STR00001##
wherein A, B, W, V, Z, Ra, Rb, n and m are as defined in the instant specification, or by Formula Ia, Ib, III, IV or V, as defined in the instant specification, and uses thereof in modulating an activity of a voltage-dependent potassium channel and/or a TRPV1 channel and in treating a medical condition associated with an activity of these channels, such as medical conditions associated with neuronal hyper-excitability, are provided.
MODULATORS OF A POTASSIUM CHANNEL AND OF TRPV1 CHANNEL AND USES THEREOF
Compounds represented by Formula I:
##STR00001##
wherein A, B, W, V, Z, Ra, Rb, n and m are as defined in the instant specification, or by Formula Ia, Ib, III, IV or V, as defined in the instant specification, and uses thereof in modulating an activity of a voltage-dependent potassium channel and/or a TRPV1 channel and in treating a medical condition associated with an activity of these channels, such as medical conditions associated with neuronal hyper-excitability, are provided.
Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
A compound represented by the following formula (1). ##STR00001##
The compound can be used as a film forming material for lithography or an optical component forming material. A resin may also be obtained using this compound as a monomer, a composition, a method for forming a resist pattern, a method for forming an insulating film, a method for forming a circuit pattern, and a method for purifying the above compound or resin.
Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
A compound represented by the following formula (1). ##STR00001##
The compound can be used as a film forming material for lithography or an optical component forming material. A resin may also be obtained using this compound as a monomer, a composition, a method for forming a resist pattern, a method for forming an insulating film, a method for forming a circuit pattern, and a method for purifying the above compound or resin.
Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image
A photoacid-generating compound has the structure ##STR00001##
where R.sup.1, R.sup.2, R.sup.3, R.sup.4, Q, and X are defined herein. The photoacid-generating compound can be used as a component of a photoresist composition, or as a monomer incorporated into a polymer useful in a photoresist composition. The photoacid-generating compound provides a desired balance of solubility and line width roughness.